• Journal of the Korean Vacuum Society
• /
• v.12 no.2
• /
• pp.112-117
• /
• 2003

MgO films is widely used in plasma display panel (PDP) technology. In this work, structural and optical properties of the MgO films deposited by e-beam evaporation, reactive magnetron sputtering, which are commercially used, and arc deposition were compared. MgO thin films were deposited on glass substrates by vacuum arc deposition equipment using a magnesium metal target at various oxygen gas flows. In order to investigate the packing density by ellipsometer, to measure reasonable erosion-rates of the MgO protective layers, we introduced an acceleration test method, namely, Ar+ ion beam induced erosion test. Also, XPS and UV test were adopted to examine the effect of the moisture on the optical transmittance of the MgO protective layers, which showed that these of MgO films by arc deposition method sustained more 90% and were insensitive to effect of the moisture. XRD and AFM have been also used to study behaviors of the structure and surface morphology.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.80-81
• /
• 2012

Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

• Proceedings of the KIEE Conference
• /
• 2004.07c
• /
• pp.1924-1926
• /
• 2004

여러 그룹의 연구 결과로서 고밀도 유도결합 플라즈마원 유체 수송 시뮬레이션을 위해 다양한 경계 조건을 포함한 여러 가지 모델이 제시되어 왔다. 본 연구에서는 가능한 모델들과 경계 조건을 설정하여 FDM(finite difference method), up wind scheme, power-law scheme, die1ectric relaxation scheme[1]을 기반으로한 1차원 시뮬레이션을 통해 정확성과 수치 해석적 안정성 및 효율성 연에서 비교, 검토하였다.

• Journal of The Korean Astronomical Society
• /
• v.36 no.spc1
• /
• pp.49-54
• /
• 2003

We introduce the two-dimensional spectral observations of solar flares using the Solar Tower Tele-scope of Nanjing University, China. In particular, we introduce three typical events and the methods used to analyze the data. (1) The flare of November 11, 1998, which is a limb flare. We derive the temperature and density within the flaring loop using non-LTE calculations. The results show that the loop top may be hotter and denser than other parts of the loop, which may be a result of magnetic reconnect ion above the loop. (2) The flare of March 10, 2001, which is a white-light flare that shows an emission enhancement at the near infrared continuum. We propose a model of non-thermal electron beam heating plus backwarming to interpret the observations. (3) The flare of September 29, 2002, which shows unusual line asymmetries at one flare kernel. The line asymmetries are caused by an upward moving plasma that is accelerated and heated during the flare development.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2010.06a
• /
• pp.340-340
• /
• 2010

본 연구에서는 유도결합형 플라즈마(ICP)를 이용하여, HBr/Ar 가스의 조성비 변화에 따른 Pb(Zr,Ti)$O_3$ 박막에 대한 식각특성을 연구 하였다. PZT박막의 식각속도와 Oxide($SiO_2$), Photo resister(PR)에 대한 식각선택비를 추출하였으며, 식각 메카니즘을 규명하기 위하여 optical emission spectroscopy(OES)와 double Langmuir prove(DLP) 이용하여 라디칼 특성변화와 이온 전류밀도(Ion current density)를 측정하였다.

• Corrosion Science and Technology
• /
• v.5 no.1
• /
• pp.15-22
• /
• 2006

The introduction of two-grid inside a conventional process system produces a reactive coating deposition and increases metal ion ratio in the plasma, resulting in denser and smoother films. The corrosion behaviors of TiN coatings were investigated by electrochemical methods, such as potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) in deaerated 3.5% NaCl solution. Electrochemical tests were used to evaluate the effect of microstructure on the corrosion behavior of TiN coatings exposed to a corrosive environment. The crystal structure of the coatings was examined by X-ray diffractometry (XRD) and the microstructure of the coatings was investigated by scanning electron microscopy (SEM) and transmission electron spectroscopy (TEM). In the potentiodynamic polarization test and EIS measurement, the corrosion current density of TiN deposited by two grid-attached magnetron sputtering was lower than TiN deposited by conventional magnetron type and also presented higher Rct values during 240 h immersion time. It is attributed to the formation of a dense microstructure, which promotes the compactness of coatings and yields lower porosity.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2009.10a
• /
• pp.24-27
• /
• 2009

A hybrid model has been developed which adopts a fluid model for electrons and a particle-in-cell (PIC) model for ions. Using the hybrid simulation, the discharge characteristics are investigated with the diagnostics for the electric field and the wall charge profile, density distributions of charged and excited particles, distributions of ultraviolet lights on phosphor, and the visible lights emitted from the PDP cell. Also, energy and angle distributions of the ions at the MgO protective layer are obtained for the analysis of material effect. The comparison of hybrid simulation results with experimental results as well as that with the conventional fluid simulation shows that the new model is more adequate for the simulation of PDP cells.

• Korean Journal of Materials Research
• /
• v.26 no.10
• /
• pp.513-520
• /
• 2016

The effect of NaOH concentration on the properties of electrolytic plasma processing (EPP) coating formed on AZ61A Mg alloy is studied. Various types of EPP were employed on magnesium alloy AZ61A in a silicate bath with different concentrations of NaOH additive. Analysis of the composition and structure of the coating layers was carried out using an X-ray diffractometer (XRD) and a scanning electron microscope (SEM). The results showed that the oxide coating layer mainly consisted of MgO and $Mg_2SiO_4$; its porosity and thickness were highly dependent on the NaOH concentration. The Vickers hardness was over 900 HV for all the coatings. The oxide layer with 3 g/l of NaOH concentration exhibited the highest hardness value (1220 HV) and the lowest wear rate. Potentiodynamic testing of the 3 g/l NaOH concentration showed that this concentration had the highest corrosion resistance value of $2.04{\times}10^5{\Omega}cm^2$; however, the corrosion current density value of $5.80{\times}10^{-7}A/cm^2$ was the lowest such value.

• Journal of the Korean institute of surface engineering
• /
• v.47 no.3
• /
• pp.109-115
• /
• 2014

High power impulse magnetron sputtering (HIPIMS), also known as the technology is called peak power density in a short period, you can get high, so high ionization sputtering rate can make. Higher ionization of sputtered species to a variety of coating materials conventional in the field of improving the characteristics and self-assisted ion thin film deposition process, which contributes to a superior being. HIPIMS at the same power, but the deposition speed is slow in comparison with DC disadvantages. Since recently as a replacement for HIPIMS modulated pulse power (MPP) has been developed. This ionization rate of the sputtered species can increase the deposition rate is lowered and at the same time to overcome the problems to be reported. The differences between the MPP and the HIPIMS is a simple single pulse with a HIPIMS whereas, MPP is 3 ms in pulse length is adjustable, with the full set of multi-pulses within the pulse period and the pulse is applied can be micro advantages. In this experiment, $In_2O_3$ : $SnO_2$ composition ratio of 9 : 1 wt% target was used, Ar : $O_2$ flow rate ratio is 4.8 to 13.0% of the rate of deposition was carried out at room temperature. Ar 40 sccm and the flow rate of $O_2$ and then fixed 2 ~ 6 sccm was compared against that. The thickness of the thin film deposition is fixed at 60 nm, when the partial pressure of oxygen at 9.1%, the specific resistance value of $4.565{\times}10^{-4}{\Omega}cm$, transmittance 86.6%, mobility $32.29cm^2/Vs$ to obtain the value.

• International Journal of Aeronautical and Space Sciences
• /
• v.3 no.1
• /
• pp.61-73
• /
• 2002

This paper addresses the conceptual design results of the HAUSAT-1 (Hankuk Aviation University SATellite-1), developed by Space System Research Lab. of Hankuk Aviation Univ., which is a new generation picosatellite. This project has been funded by Korean Government for the purpose of developing the space core technology. This is the first attempt at the level of university in Korea to develop the satellite weighing less than 1kg and accelerates opportunities with low construction, low launch cost space experiment platforms. The purpose of the HAUSAT-1 project is to offer graduate and undergraduate students great opportunities to be able to understand the design process of satellite development as a team member. Its mission objectives are to track its position by the GPS receiver system, to deploy the thin film solar cell panel to generate extra power, and to measure plasma density and temperature with the plasma sensor. The HAUSAT-1 will orbit at the altitude of 650 km with 65 degree inclination angle with 12 months of design mission life. It is planned to be launched on November 2003 by Russian launch vehicle "Dnepr".