Comparison of characteristics of MgO films deposited by vacuum arc method with other methods.

진공아크 증착법과 다른 공정에 의해 증착된 MgO 박막 특성 비교

  • Published : 2003.06.01

Abstract

MgO films is widely used in plasma display panel (PDP) technology. In this work, structural and optical properties of the MgO films deposited by e-beam evaporation, reactive magnetron sputtering, which are commercially used, and arc deposition were compared. MgO thin films were deposited on glass substrates by vacuum arc deposition equipment using a magnesium metal target at various oxygen gas flows. In order to investigate the packing density by ellipsometer, to measure reasonable erosion-rates of the MgO protective layers, we introduced an acceleration test method, namely, Ar+ ion beam induced erosion test. Also, XPS and UV test were adopted to examine the effect of the moisture on the optical transmittance of the MgO protective layers, which showed that these of MgO films by arc deposition method sustained more 90% and were insensitive to effect of the moisture. XRD and AFM have been also used to study behaviors of the structure and surface morphology.

MgO 박막은 PDP(plasma display panels)분야에서 널리 사용되어 왔다. 본 연구에서는, 기존에 사용되고 있는 e-beam evaporation, reactive magnetron sputtering법과 arc deposition법으로 MgO 보호막을 증착하여 구조적 · 광학적 특성을 비교하였다. 반응 가스인 산소 가스의 유입량을 변화시켜 Mg metal target을 이용하여 vacuum arc deposition equipment 의해 유리 기판 위에 증착하였다. Ellipsometer를 이용하여 치밀도를 측정하고, MgO보호막의 마모율(erosion rate)를 측정하기 위해 가속 실험 방법을 도입, Ar+ 이온빔에 의한 erosion test를 시행하여 내마모성을 알아보았다. 또한, XPS와 UV test를 사용하여 MgO보호막의 광투과도에 미치는 수분의 영향을 조사한 결과, arc evaporation 법이 광투과도 90%이상을 유지하여 수분의 영향에 둔감한 것을 알 수 있었다. 한편, XRD와 AFM을 이용하여 MgO 박막의 구조와 표면 형상에 대해 조사하였다.

Keywords

References

  1. IEEE Trans. Electron Devices v.22 B.W.Byrum,Jr. https://doi.org/10.1109/T-ED.1975.18204
  2. IEEE Trans. Electron Devices v.23 T.Ugrade;T.lemori;M.Osawa;N.Nakayama;I.Morita https://doi.org/10.1109/T-ED.1976.18397
  3. Thin Solid Films v.355;356 S.J.Rho;S.M.Jeong;H.K.Baik;K.M.Song
  4. Thin Solid Films v.57 M.Harris;H.A.Macleod;S.Ogura;E.Pelletier;B.Vidal https://doi.org/10.1016/0040-6090(79)90425-5
  5. Vacuum v.61 R.H.Kim;Y.H.Kim;J.W.Park https://doi.org/10.1016/S0042-207X(00)00431-0
  6. Thin Solid Films v.89 D.E.Aspnes https://doi.org/10.1016/0040-6090(82)90590-9
  7. Thin Solid Films v.376 R.H.KimY.H.Kim;J.W.Park https://doi.org/10.1016/S0040-6090(00)01184-6
  8. SID 91 Digest H.Uchiike;S.Harada
  9. SID 92 Digest K.Machda;H.Uchiike;H.Sadaki
  10. J. Vac. Sci. Technol v.A17 C.Y.Son;J.H.Cho;J.W.Park
  11. IMID 02 Digest J.H.Lee;J.H.Eun;S.Y.Park;S.G.Kim;H.J.Kim