• Title/Summary/Keyword: plasma flow

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Optimization of Corrosion Properties of Ti/TiO2/IrO2-RuO2 Electrodes via Taguchi Method (Taguchi법을 이용한 Ti/TiO2/IrO2-RuO2전극의 부식특성 최적화)

  • 이득용;채경선;최형기;예경환;안중홍;송요승
    • Journal of the Korean Ceramic Society
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    • v.39 no.6
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    • pp.582-588
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    • 2002
  • IrO$_2$-RuO$_2$ films were deposited on plasma sprayed TiO$_2$ buffer layer above Ti metal by sol-gel and dip-coating method. Organic vehicle (ethyl cellulose and $\alpha$-terpineol) and glass frit were added to improve adherence of the coatings. Taguchi method and L$_{18}$ (2$^1$$\times$3$^{7}$ ) orthogonal arrays were evalvated in terms of current density to determine the optimal combination of levels of factors that best satisfy the bigger is better quality characteristic. The observed conditions were as fellows: ethyl cellulose (100 cp), drying temperature and time (17$0^{\circ}C$,20 min), heat treatment temperature and time (75$0^{\circ}C$,10 min), the weight ratio of IrO$_2$-RuO/powders to glass frit (99:5), final heat treatment time (120 min) and flow rate of air (5 sccm), respectively. ANOVA analysis suggested that the influence of the factors within $\alpha$= 0.1 was significant with a 90% confidence level.

Effect of Jeseupwiryeongtang-gagam on Atopic Dermatitis-like Skin NC/Nga Mouse Induced by Dermatophagoides Farinae Crude Extract (제습위령탕가감이 집 먼지 진드기 추출물로 유도된 NC/Nga mouse의 아토피 피부염에 미치는 영향)

  • Na, Dong-Gyu;Han, Jae-Kyung;Kim, Yun-Hee
    • The Journal of Pediatrics of Korean Medicine
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    • v.22 no.2
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    • pp.81-114
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    • 2008
  • Objectives : The purpose of this study is to investigate the effect of Jeseupwiryeongtang-gagam(JWTG) on atopic dermatitis by in vivo experiment using NC/Nga atopic dermatitis mouse, which has histological and clinical similarities to the atopic dermatitis of human. Methods : To investigate the effect of JWTG on AD, we evaluated atopic dermatitis-like skin lesions by clinical skin index and analyzed immunological parameters in peripheral blood mononuclear cells(PBMCs), splenocytes, draining lymph node(DLN) and performed skin histology in ears and dorsal skin of atopic dermatitis-like skin NC/Nga mouse in vivo. Results and Conclusions : In vivo, clinical skin severity score were significantly lower in JWTG group than control group. IgE, IL-6, $TNF-{\alpha}$, IgM, IgG2a and IgG2b levels in serum were decreased remarkably in JWTG group than control group and $IFN-{\gamma}$ production, secreted in Th1 cell were increased by JWTG. After experiment ended, we analyzed immunological cells ($CD3^+$, $CD19^+$, $CD4^+$, $CD8^+$, $CD3^+$$CD69^+$, $CD4^+$$CD25^+$ and $CD49b^+$) by flow cytometry. It resulted that total absolute number of $CD3^+$, $CD19^+$, $CD4^+$ and $CD8^+$ cells were recovered as normal and $CD3^+$$CD69^+$ were decreased significantly compared with control group in isolated DLN and PBMCs from NC/Nga mouse and total absolute number of $Gr-1^+$, $CD11b^+$ and $CD3^+$ in dorsal skin of NC/Nga mouse were decreased by JWTG. We analyzed ear, DLN, and neck-back skin after biopsy and dyeing by hematoxyline/eosin(H&E) and toluidine staining (mast cells marker) and obtained results that JWTG were effective to histological symptoms (dermal and epidermal thickening, hyperkeratosis and inflammatory cell infiltration). Ear thickness was decreased significantly than the control group and the size of inflammatory lymphocytes cells(ILC) and plasma cells(PC) in DLN were also decreased.

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Validation of a HPLC MS/MS Method for Determination of Doxorubicin in Mouse Serum and its Small Tissues (마우스 혈장과 조직에서의 doxorubicin 측정 HPLC-MS/MS 방법)

  • Park, Jung-Sun;Kim, Hye-Kyung;Lee, Hye-Won;Lee, Mi-Hyun;Kim, Hyun-Gi;Chae, Soo-Wan;Chae, Han-Jung
    • Korean Journal of Clinical Pharmacy
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    • v.16 no.1
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    • pp.23-27
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    • 2006
  • Doxorubicin (DXR) is a type of anti-cancer drug called an 'anthracycline glycoside', It works by impairing DNA synthesis, a crucial feature of cell division, and thus is able to target rapidly dividing cells. Doxorubicin is a very serious anti-cancer medication with definite potential to do great harm as well as great good. A liquid chromatography-tandem mass spectroscopy (LC-MS/MS) method was developed to identify and quantify DXR in small-volume biological samples. After the addition of internal standard (IS, $5{\mu}L\;of\;1{\mu}M/ml$ daunorubicin methanol solution) into the serum sample, the drug and IS were extracted by methanol. Following vortex for a 1min and centrifugation at 15,000g for 10 min the organic phase was transferred and evaporated under a vacuum. The residue was reconstituted with $350{\mu}L$ of mobile phase and $10{\mu}L$ was injected into C18 column with mobile phase composed of 0.05M ammonium acetate (0.1 M acetic acid adjusted to pH 3.5) and acetonitrile (40:60, v/v). The flow rate was kept constant at $350{\mu}L/min$. The ions were quantified in the multiple reaction mode (MRM), using positive ions, on a triple quadrupole mass spectrometer. The lower limits of quantification for Doxorubicin in plasma and small tissues were approximately 0.5 ng/mL and 0.5 ng/mL respectively. Intra- and inter-assay accuracy (% of nominal concentration) and precision (% CV) for all analytes were within 15%, respectively.

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Construction and Assembly of KSTAR Current Leads and the Helium Control System (KSTAR 전류인입선 및 헬륨냉매 제어시스템 제작 및 설치)

  • Song, N.H.;Woo, I.S.;Lee, Y.J.;Kwag, S.W.;Bang, E.N.;Lee, K.S.;Kim, J.S.;Jang, Y.B.;Park, H.T.;Hong, J.S.;Park, Y.M.;Kim, Y.S.;Choi, C.H.
    • Journal of the Korean Vacuum Society
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    • v.16 no.5
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    • pp.388-396
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    • 2007
  • KSTAR (Korea Superconducting Tokamak Advanced Research) current lead system (CLS) has a role to interconnect magnet power supply (MPS) in room temperature (300 K) and superconducting (SC) bus-line, electrically. For the first plasma experiments, it should be assembled 4 current leads (CL) on toroidal field (TF) current lead box (CLB) and 14 leads on poloidal field (PF) CLB. Two current leads, with the design currents 17.5 kA, and SC bus-lines are connected in parallel to supply 35 kA DC currents on TF magnet. Whereas, it could supply $20\;{\sim}\;26\;kA$ to each pairs of PF magnets during more than 350 s. At the cold terminals of the leads, there are joined SC bus-lines and it was constructed helium coolant control system, aside from main tokamak system, to protect heat flux through current leads and enhanced Joule heat due to supplied currents. Throughout the establishment processes, it was tested the high vacuum pumping, helium leak of the helium lines and hardwares mounted between the helium lines, flow controls for CL, and liquid nitrogen cool-down of possible parts (current leads, CL helium lines, and thermal shield helium lines for CLB), for the accomplishment of the required performances.

Process Optimization of PECVD SiO2 Thin Film Using SiH4/O2 Gas Mixture

  • Ha, Tae-Min;Son, Seung-Nam;Lee, Jun-Yong;Hong, Sang-Jeen
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.434-435
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    • 2012
  • Plasma enhanced chemical vapor deposition (PECVD) silicon dioxide thin films have many applications in semiconductor manufacturing such as inter-level dielectric and gate dielectric metal oxide semiconductor field effect transistors (MOSFETs). Fundamental chemical reaction for the formation of SiO2 includes SiH4 and O2, but mixture of SiH4 and N2O is preferable because of lower hydrogen concentration in the deposited film [1]. It is also known that binding energy of N-N is higher than that of N-O, so the particle generation by molecular reaction can be reduced by reducing reactive nitrogen during the deposition process. However, nitrous oxide (N2O) gives rise to nitric oxide (NO) on reaction with oxygen atoms, which in turn reacts with ozone. NO became a greenhouse gas which is naturally occurred regulating of stratospheric ozone. In fact, it takes global warming effect about 300 times higher than carbon dioxide (CO2). Industries regard that N2O is inevitable for their device fabrication; however, it is worthwhile to develop a marginable nitrous oxide free process for university lab classes considering educational and environmental purpose. In this paper, we developed environmental friendly and material cost efficient SiO2 deposition process by substituting N2O with O2 targeting university hands-on laboratory course. Experiment was performed by two level statistical design of experiment (DOE) with three process parameters including RF power, susceptor temperature, and oxygen gas flow. Responses of interests to optimize the process were deposition rate, film uniformity, surface roughness, and electrical dielectric property. We observed some power like particle formation on wafer in some experiment, and we postulate that the thermal and electrical energy to dissociate gas molecule was relatively lower than other runs. However, we were able to find a marginable process region with less than 3% uniformity requirement in our process optimization goal. Surface roughness measured by atomic force microscopy (AFM) presented some evidence of the agglomeration of silane related particles, and the result was still satisfactory for the purpose of this research. This newly developed SiO2 deposition process is currently under verification with repeated experimental run on 4 inches wafer, and it will be adopted to Semiconductor Material and Process course offered in the Department of Electronic Engineering at Myongji University from spring semester in 2012.

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Vortical Etching Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Depending on Ar/Cl$_2$ Ratios and RF/DC Power Densities (SrBi$_2$Ta$_2$O$_9$ 박막에 있어서 Ar/C1$_2$가스의 비율 및 RF/DC Power Density의 변화에 따른 수직 식각의 특성연구)

  • 황광명;이창우;김성일;김용태;권영석;심선일
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.49-53
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    • 2001
  • Vortical etching experiments of ($SrBi_2Ta_2O_9$)/Si thin films have been performed by using the inductively coupled plasma reactive ion etching (ICP-ME) apparatus. The purposes of these experiments are to get the effective area of vertical surface. Because this technology is very important to get good qualities of ferroelectric gate structure, capacitor and the minimum parasitic effects related to the excellent performances of the FRAM (Ferroelectric Random Access Memory) device. The reacting gases were Ar and $Cl_2$gases, and various $Ar/C1_2$flow ratios were used. The etching experiments were carried out at various RF powers such as 700, 700, 500W and at various DC powers such as 200, 150, 100, 50W, respectively. The maximum etch rate of $SrBi_2Ta_2O_9$/Si thin films was 1050 A/min at the $Ar/C1_2$ gas ratio of 20/16, RF power of 700 W and DC power of 200 W. From the SEM (scanning electron microscopy) image of the SBT thin films, the wall angle was as good as about $82^{\circ}$.

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Effects of Dietary Supplement of Probiotics on Growth and Blood Assay of Rockfish Sebastes schlegeli (생균제 첨가사료가 조피볼락 Sebastes schlegeli의 성장 및 혈액성분에 미치는 영향)

  • Park, Sang-Hyun;Wang, Soon-Young;Han, Kyung-Nam
    • Journal of Aquaculture
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    • v.21 no.1
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    • pp.1-6
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    • 2008
  • We determined the effects of dietary supplements for lactic acid bacteria(LAB) such as Lactobacillus brevis(Lb) and Lactobacillus plantarum(Lp) in juvenile rockfish Sebastes schlegeli cultured in flow-through system for 10 weeks. The experimental diets contained $10^4cfu/g,\;10^6cfu/g\;and\;10^8cfu/g$ level each LAB(Lb-4, Lb-6, Lb-8 or Lp-4, Lp-6, Lp-8), respectively. The effects of LAB supplementation was determined by various factor such as weight gain(WG), specific growth rate(SGR), feeding efficiency(FE) and blood assay. For rearing experiment, Lp-8 treatment had significantly high growth rate than control diet treatment. However, all Lb treatment had no significance effect with control diet treatment. In case of the blood assay, hematocrit(Ht) and hemoglobin(Hb) of fish were not affected by LAB supplemental levels. On the other hand, total cholesterol in plasma of Lb-8, Lp-6 and Lp-8 treatments were significantly low than the control diet treatment. We verified the influence of LAB which was originated from species specificity and amount in diet. Consequently, the dietary supplementation as $10^8cfu/g$ level of L. plantarum could be of help for growth enhancement to the juvenile rockfish.

Deposition Characteristics of Lead Titanate Films on $RuO_2$ and Pt Substrates Fabricated by Chemical Vapor Deposition ($RuO_2$ 및 Pt 기판에서 $PbTiO_3$박막의 화학기상 증착특성에 관한 연구)

  • Jeong, Su-Ok;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.10 no.4
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    • pp.282-289
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    • 2000
  • $PbTiO_3$ films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition(ECR-PECVD). Deposition characteristics of $PbTiO_3$films on $RuO_2$ and Pt substrates were investigated with varying the flow rate of metalorganic source and substrate temperature. The residence time of Pb-oxide molecules in much longer on $RuO_2$ than on Pt substrate, while the perovskite nucleation is more difficult on $RuO_2$ than on Pt substrate. Therefore, the process conditions to obtain the single perovskite $PbTiO_3$ phase are more restricted on $RuO_2$ than on Pt substrates. An introduction of Ti-oxide seed layer increases perovskite nucleation density and thus enlarges the process window to obtain the single perovkite phase. The introduction of Ti-oxide seed layer make the PZT film that Ti-components of $PbTiO_3$ are partially substituted with Zr atoms have single perovskite phase for the wide range of Zr/(Zr+Ti) concentration ratios.

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The Fundamental Studies and Development of Modified Electrothermal Vaporization Hollow Cathode Glow Discharge Cell (개선된 전열증기화 속빈음극관 글로우 방전셀의 기초연구 및 개발)

  • Lee, Seong-Hun;Cho, Won-Bo;Jeong, Jong-Pil;Choi, Woo-Chang;Kim, Kyu-Whan;Woo, Jeong-Su;Lee, Chang-Su;Kang, Dong-Hyun;Lee, Sang-Chun
    • Analytical Science and Technology
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    • v.15 no.6
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    • pp.514-520
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    • 2002
  • The electrothermal vaporization (ETV) hollow cathode glow discharge atomic emission spectrometer for analysis of liquid sample has been developed and characterized. This system has improved the sample introduction method of electrothermal vaporization and the hollow cathode glow discharge. The sample introduction method was possible to provide high analyte transport efficiency to the plasma by helix coil made of tungsten material. In addition, small volume samples (<$30{\mu}{\ell}$) could be used. The system has glow discharge cell with special design for improvement of precision. The effect of discharge parameters such as discharge power, gas flow rate has been studied to find optimum condition. The emitted light was effectively carried into detector by fiber optic cable in UV region. The calibration curve of Pb, Cd were obtained with 3 samples.

Fabrication of Large Area Transmission Electro-Absorption Modulator with High Uniformity Backside Etching

  • Lee, Soo Kyung;Na, Byung Hoon;Choi, Hee Ju;Ju, Gun Wu;Jeon, Jin Myeong;Cho, Yong Chul;Park, Yong Hwa;Park, Chang Young;Lee, Yong Tak
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.220-220
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    • 2013
  • Surface-normal transmission electro-absorption modulator (EAM) are attractive for high-definition (HD) three-dimensional (3D) imaging application due to its features such as small system volume and simple epitaxial structure [1,2]. However, EAM in order to be used for HD 3D imaging system requires uniform modulation performance over large area. To achieve highly uniform modulation performance of EAM at the operating wavelength of 850 nm, it is extremely important to remove the GaAs substrate over large area since GaAs material has high absorption coefficient below 870 nm which corresponds to band-edge energy of GaAs (1.424 eV). In this study, we propose and experimentally demonstrate a transmission EAM in which highly selective backside etching methods which include lapping, dry etching and wet etching is carried out to remove the GaAs substrate for achieving highly uniform modulation performance. First, lapping process on GaAs substrate was carried out for different lapping speeds (5 rpm, 7 rpm, 10 rpm) and the thickness was measured over different areas of surface. For a lapping speed of 5 rpm, a highly uniform surface over a large area ($2{\times}1\;mm^2$) was obtained. Second, optimization of inductive coupled plasma-reactive ion etching (ICP-RIE) was carried out to achieve anisotropy and high etch rate. The dry etching carried out using a gas mixture of SiCl4 and Ar, each having a flow rate of 10 sccm and 40 sccm, respectively with an RF power of 50 W, ICP power of 400 W and chamber pressure of 2 mTorr was the optimum etching condition. Last, the rest of GaAs substrate was successfully removed by highly selective backside wet etching with pH adjusted solution of citric acid and hydrogen peroxide. Citric acid/hydrogen peroxide etching solution having a volume ratio of 5:1 was the best etching condition which provides not only high selectivity of 235:1 between GaAs and AlAs but also good etching profile [3]. The fabricated transmission EAM array have an amplitude modulation of more than 50% at the bias voltage of -9 V and maintains high uniformity of >90% over large area ($2{\times}1\;mm^2$). These results show that the fabricated transmission EAM with substrate removed is an excellent candidate to be used as an optical shutter for HD 3D imaging application.

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