• Title/Summary/Keyword: patterning effect

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Fabrication of ITO-less Sustain Electrodes for High Resolution Plasma Display Panel by X-Ray Lithographic Process

  • Ryu, Seung-Min;Yang, Dong-Yol;So, Jae-Yong;Park, Lee-Soon;Cheong, Hee-Woon;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.370-373
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    • 2009
  • X-ray lithography was employed to fabricate ITO-less high resolution sustain electrodes for plasma display panel (PDP). A polyimide film based X-ray mask and Xray sensitive Ag electrode paste were fabricated to check their effect on the patterning of Ag electrodes with less than 30 ${\mu}m$ in width. The X-ray lithographic method was found to be useful for the high resolution sustain electrode patterns due to the high penetration power and low scattering property of X-ray source.

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Application to Gas Sensors by Electron Emission from Carbon Nanotube Emitters (탄소나노튜브 전극으로부터 전계방출을 이용한 가스센서의 응용)

  • Kim Seong-Jeen
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.5
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    • pp.405-410
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    • 2006
  • We fabricated gas sensors using carbon nanotubes (CNTs) as electron emitters for the purpose of detecting inert gases. By using the silicon-glass anodic bonding and glass patterning technologies with the typical Si process, we improved the compactness of the sensors and the reliability in process. The proposed sensor, based on, an electrical discharge theory known as Paschen's law in principle, works by figuring the variation of the discharge current depending on gas concentration. In the experiment, the initial breakdown characteristics were measured for air and Ar as a function of gas pressure. As the result, even though it should be realized that there are many other factors which have an effect on the breakdown of a gap, the sensors led to similar result as predicted by Paschen's law, and they showed a possibility as gas sensors which enable to detect the gas density ranged to the vacuum pressure from 1 to $10^{-3}$ Torr.

Dry Etching of patternedLiNbO3Waveguides for the High-speed Optical Modulator fabrication (초고속 광변조기 제작을 위한 LiNbO3도파로의 건식식각)

  • 양우석;김우경;이승태;박우정;장현수;윤대호;이한영
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.8
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    • pp.731-735
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    • 2003
  • Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

Fabrication of Large-Scale Single-Crystal Organic Nanowire Arrays for High-Integrated Flexible Electronics

  • Park, Gyeong-Seon;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.266.1-266.1
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    • 2013
  • Large-scale single-crystal organic nanowire arrays were generated using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with two- or three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

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Using Electron-beam Resists as Ion Milling Mask for Fabrication of Spin Transfer Devices

  • Nguyen Hoang Yen Thi;Yi, Hyun-Jung;Shin, Kyung-Ho
    • Journal of Magnetics
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    • v.12 no.1
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    • pp.12-16
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    • 2007
  • Magnetic excitation and reversal by a spin polarized current via spin transfer have been a central research topic in spintronics due to its application potential. Special techniques are required to fabricate nano-scale magnetic layers in which the effect can be observed and studied. This work discusses the possibility of using electron-beam resists, the nano-scale patterning media, as ion milling mask in a subtractive fabrication method. The possibility is demonstrated by two resists, one positive tone, the ZEP 520A, and one negative tone, the ma-N2403. The advantage and the key points for success of this process will be also addressed.

A Study on the Corner Effect of Fin-type SONOS Flash Memory Using TCAD Simulation (TCAD 시뮬레이션을 이용한 Fin형 SONOS Flash Memory의 모서리 효과에 관한 연구)

  • Yang, Seung-Dong;Oh, Jae-Sub;Yun, Ho-Jin;Jeong, Kwang-Seok;Kim, Yu-Mi;Lee, Sang-Youl;Lee, Hee-Deok;Lee, Ga-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.100-104
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    • 2012
  • Fin-type SONOS (silicon-oxide-nitride-oxide-silicon) flash memory has emerged as novel devices having superior controls over short channel effects(SCE) than the conventional SONOS flash memory devices. However despite these advantages, these also exhibit undesirable characteristics such as corner effect. Usually, the corner effect deteriorates the performance by increasing the leakage current. In this paper, the corner effect of fin-type SONOS flash memory devices is investigate by 3D Process and device simulation and their electrical characteristics are compared to conventional SONOS devices. The corner effect has been observed in fin-type SONOS device. The reason why the memory characteristic in fin-type SONOS flash memory device is not improved, might be due to existing undesirable effect such as corner effect as well as the mutual interference of electric field in the fin-type structure as reported previously.

A Study on the Mask Fabrication Process for X-ray Lithography (X-선 노광용 마스크 제작공정에 관한 연구)

  • 박창모;우상균;이승윤;안진호
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.2
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    • pp.1-6
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    • 2000
  • X-ray lithography mask with SiC membrane and Ta absorber patterns has been fabricated using ECR plasma CVD, d.c. magnetron sputtering, and ECR plasma etching. The stress of stoichiometric SiC film was adjusted by rapid thermal annealing under $N_2$, ambient. Adjusting the working pressure during sputtering process resulted in a near-zero residual stress, reasonable density, and smooth surface morphology of Ta film. Cl-based plasma showed a good etching characteristics of Ta, and two-step etching process was implemented to suppress microloading effect fur sub-quarter $\mu\textrm{m}$ patterning.

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The Effect of Cr Dosage on FePt Nanoparticle Formation

  • Won, C.;Keavney, D.J.;Divan, R.;Bader, S.D.
    • Journal of Magnetics
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    • v.11 no.4
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    • pp.182-188
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    • 2006
  • The search for high-density recording materials has been one of most active and vigorous field in the field of magnetism. $FePt-L1_{0}$ nanoparticle has emerged as a potential candidate because of its high anisotropy. In this paper, we provide an overview of recent work at Argonne National Laboratory that contributes to the ongoing dialogue concerning the relation between structure and properties of the FePt nanoparticle system. In particular we discuss the ability to control structure and properties via dosing with Cr. Cr-dosed FePt films were grown via molecular beam epitaxy and annealed at $550^{\circ}C$ in an ultrahigh vacuum chamber, and were studied with the surface magneto-optic Kerr effect (SMOKE), scanning electron microscopy (SEM) and x-ray magnetic circular dichroism (XMCD). We found that small dosage of Cr helps to generate $L1_{0}$ phase FePt magnetic nanoparticles with small size, defined shape and regular spatial distribution on MgO (001) substrate. The nanostructures are ferromagnetic with high magnetic coercivity (${\sim}0.9T$) and magnetic easy axis in the desired out-of-plane orientation. We also show that controlling the lateral region where nanostructures exist is possible via artificial patterning with Cr.

The Effect of Fused Silica Crystallization on Flexural Strength and Shrinkage of Ceramic Cores for Investment Casting

  • Kim, Young-Hwan;Yeo, Jeong-Gu;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.53 no.2
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    • pp.246-252
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    • 2016
  • Complex designed silica-based ceramic cores were fabricated by ceramic injection molding. Slow heating rate (0.2K/min) for debinding restrained bloating on the surface of ceramic cores. To investigate effect of sintering conditions on mechanical properties of ceramic cores, green bodies were sintered at temperatures in a range from $1150^{\circ}C$ to $1400^{\circ}C$ for various dwelling times (6 h to 48 h). Sintering above $1300^{\circ}C$ for 12 h and dwelling time over 24 h at $1200^{\circ}C$ reduce the flexural strength and increase the linear shrinkage of ceramic cores. Cristobalite, formed by high sintering temperature or long dwelling time, induces reduction of mechanical properties due to its phase transformation, which is accompanied by volume contraction and microcracking. Ceramic core sintered at $1200^{\circ}C$ for 12 h endured wax patterning and shell molding, and was manufactured successfully.

The Effect of Microdroplet Shape on the Evaporation (미세액적의 형상이 증발에 미치는 효과)

  • Song, Hyun-Soo;Lee, Yong-Ku;Jin, Song-Wan;Yoo, Jung-Yul
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.31 no.6 s.261
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    • pp.558-565
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    • 2007
  • Many studies of microdroplet evaporation from solid surfaces were made with priority given to inkjet printing and dye painting techniques. The objective of these studies is how to evaporate a droplet quickly and uniformly. Also it is necessary to prevent evaporation of a droplet to observe cells in a droplet generated through cell-patterning. In general, an identical volume of a water droplet on hydrophobic surfaces evaporates slower than that on hydrophilic surfaces. In this study, we observe the evaporation process of a droplet on various hydrophobic surfaces and calculated the evaporation rate considering the droplet geometry such as contact angle and height. This study also proposes a new model based on the fact that evaporation mode at the edge of a droplet is different from that at the outer surface of a droplet as the contact angle changes during evaporation. Finally, we reveal the cause fur the increase of evaporation flux and show that the ratio of edge evaporation to total evaporation increases with time.