• Journal of the Korean Vacuum Society
• /
• v.5 no.2
• /
• pp.127-132
• /
• 1996

We measured photoreflectance spectrum characteristics of InGaAs grown by MBE method on semi-insulating GaAs. The PR signal splitting of substate and epilayer was observed. The band gap energy was about 1.40 eV. It make to 8 meV difference when it is fitted by Pan's equation. The reason is stress on the interface, which is due to lattice mismatch between epilayer and substate . We became to know that reason influence crystalline on growing sample. In InGaAs epilayer, temperature dependency is low. The efficiency of photo absorption is high and activate over 200K. In this case when it is annealed at $400^{\circ}C$ below growing temperature, PR signal splitting is remarkable and crystalline is inhanced.

• Journal of Information Display
• /
• v.6 no.1
• /
• pp.33-36
• /
• 2005

To obtain various colors from the blue emitting poly(fluorene)s, two different approaches are introduced. One is copolymerization with low band gap comonomers and the other is molecular doping with various dyes. As fast and efficient exciton migration and trapping and/or energy transfer between the chromorphoric segments or doped dyes in conjugated polymers can shift the emission to longer wavelengths, these phenomena can be utilized to obtain various colors from the intrinsically blue light emitting poly(fluorene)s.

• KIEE International Transactions on Electrophysics and Applications
• /
• v.5C no.2
• /
• pp.54-57
• /
• 2005

Photoreflectance (PR) has been measured to investigate the characterization of the Si$_{3}$N$_{4}$Al$_{0.21}$ Ga$_{0.79}$As/GaAs and Al$_{0.21}$Ga$_{0.79}$As/GaAs heterostructures. In the PR spectrum, the caplayer thickness was 170 nm and Si$_{3}$N$_{4}$ was utilized as the capping material. The C peak is confirmed as the carbon defect with residual impurity originating from the growth process. After annealing, in the presence of the Si$_{2}$N$_{4}$ cap layer, band gap energy was low shifted. This result indicates that the Si$_{3}$N$_{4}$ cap layer controlled evaporation of the As atom.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.07a
• /
• pp.366-370
• /
• 2002

GaAs has become a very popular material for the fabrication of high frequency, low noise and microwave power devices. GaAs devices are also well suited for high temperature operation because of the large band gap of this material. The standard GaAs technology and device structures have to be modified for stable operation at high temperature. In this paper, AlGaAs/GaAs HBT considering stable ohmic contact at high temperature as well as thermal effect such as self-heating effect are introduced. All the data obtained study will be used as input data for the simulator and the result will be compared with an analytical model available in this study,

• Journal of the Korean Institute of Telematics and Electronics D
• /
• v.35D no.4
• /
• pp.71-77
• /
• 1998

In this paper, algeration of electical characteristics is analyzed when the operating temperature of MOSFET, BJT and CMOS/BiCMOS inverter is lowered from 300K to 77K. As the operating temperature is lowered, electric characteristics of MOSFET are enhanced generally but, those of bipolar transistor are degraded because current gain is reduced by BGN(Band Gap Narrowing) effect. For the inverter considered in this work, switching characteristics of PSA-BiCMOS inverter are enhanced by the electrical characteristics enhancement of MOSFET when the operating temperature is reduced to 200K, while under 200K, those of PSA-BiCMOS inverter are degraded because the degradation of BJT impacts on the inverter circuit.

• JSTS:Journal of Semiconductor Technology and Science
• /
• v.5 no.2
• /
• pp.83-88
• /
• 2005

The interface-states between the top silicon layer and buried oxide layer of nano-SOI substrate were developed. Also, the effects of thermal treatment processes on the interface-state distributions were investigated for the first time by using pseudo-MOSFETs. We found that the interface-state distributions were strongly influenced by the thermal treatment processes. The interface-states were generated by the rapid thermal annealing (RTA) process. Increasing the RTA temperature over $800^{\circ}C$, the interface-state density considerably increased. Especially, a peak of interface-states distribution that contributes a hump phenomenon of subthreshold curve in the inversion mode operation of pseudo-MOSFETs was observed at the conduction band side of the energy gap, hut it was not observed in the accumulation mode operation. On the other hand, the increased interface-state density by the RTA process was effectively reduced by the relatively low temperature annealing process in a conventional thermal annealing (CTA) process.

• Proceedings of the Korea Electromagnetic Engineering Society Conference
• /
• 2003.11a
• /
• pp.59-63
• /
• 2003

Modal properties of guided waves along circular dispersive double negative (DNG) index metamaterial rod waveguides are numerically investigated. Identical forms of dispersive dielectric and magnetic material constants are used for simplicity. For degenerated azimuthally symmetric mode, a multimode region, a single mode region, a band gap region and a forbidden region are found which cannot be observed in the case of the conventional dielectric rod waveguide. As the normalized frequency goes down, discrete guided modes are continuously generated, which is a reverse property of conventional dielectric rod waveguide. Also, there are high-frequency cutoffs, which have been generally examined in dispersive circular geometries such as a plasma column or a plasma Goubau line. In the single mode region, both the low- and high-frequency cutoffs are existed where the propagation constants are continued between the guided oscillating and surface modes.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2018.06a
• /
• pp.57-57
• /
• 2018

Zinc-oxide (ZnO), II-VI semiconductor with a wide and direct band gap (Eg: 3.2~3.4 eV), is one of the most potential candidates to substitute for ITO due to its excellent chemical, thermal stability, specific electrical and optoelectronic property. However, the electrical resistivity of un-doped ZnO is not low enough for the practical applications. Therefore, a number of doped ZnO films have been extensively studied for improving the electrical conductivities. In this study, Ti-doped ZnO films were successfully prepared by atomic layer deposition (ALD) techniques. ALD technique was adopted to careful control of Ti doping concentration in ZnO films and to show its feasible application for 3D nanostructured TCO layers. Here, the structural, optical and electrical properties of the Ti-doped ZnO depending on the Ti doping concentration were systematically presented. Also, we presented 3D nanostructured Ti-doped ZnO layer by combining ALD and nanotemplate processes.

• The Transactions of the Korean Institute of Electrical Engineers D
• /
• v.54 no.3
• /
• pp.180-185
• /
• 2005

Microstrip antennas generally have a lot of advantages that are thin profile, lightweight, low cost, and conformability to a shaped surface application with integrated circuitry. In addition to military applications, they have become attractive candidates in a variety of commercial applications such as mobile satellite communications, the direct broadcast system (DBS), global positioning system (GPS), and remote sensing. Recently, many of the researches have been achieved for improving the impedance bandwidth of microstrip antennas. The basic form of the microstrip antenna, consisting of a conducting patch printed on a grounded substrate, has an impedance bandwidth of $1\~2\%$. For improvement of narrow bandwidth of microstrip patch, we were designed U-slot microstrip patch antenna in this paper. This antenna had wide bandwidth for all personal communication services (PCS) and IMT-2000. For the design of U-slot microstrip patch antenna using a finite difference time domain(FDTD) method. This numerical method could get the frequency property of U-slot patch antenna and the electromagnetic fields of slots.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
• /
• 2016.05a
• /
• pp.696-697
• /
• 2016

본 논문은 5.25-GHz BiCMOS 저 잡음 증폭기를 위한 바이어스 회로를 제안한다. 이러한 회로는 1볼트 전원에서 동작하며, 저전압 및 저전력으로 동작하도록 설계되어 있다. 제안한 회로는 $0.18{\mu}m$ SiGe HBT BiCMOS로 설계하였다. 이러한 회로는 밴드 갭 참조회로 (band-gap reference circuit)를 사용하였다.