• Journal of the Korean Ceramic Society
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• v.30 no.12
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• pp.1059-1065
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• 1993

The sliding wear behavior of the plasma sprayed zirconia containing 8wt% yttria was investigated over a range of room temperature to 800℃. Both of the friction coefficient and the wear loss increased reaching its maximum at about to 499℃. and then decreased again with increasing temperature up to 800℃. The worn surface at elevated temperature were observed and analyzed by scanning electron microscopy and X-ray diffractometer to study the mechanisms of high temperature wear behavior. Surface morphology of the worn samples changes with temperature. Monoclinic (m)/tetragonal (t) x-ray peak intensity ratio of wear debris and worn surface decreased with increasing temperature. Non-transformable tetragonal (t') to metastable tetragonal (t) phase transformation of worn surface increased with increasing temperature. The results indicate that dehumidification and above phase changes are contributing to the high temperature wear behavior of the plasma sprayed ZrO2-Y2O3 coatings.

• Korean Journal of Materials Research
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• v.14 no.2
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• pp.110-114
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• 2004

High velocity oxy-fuel sprayed NiCoCrAlY coatings were oxidized between 1000 and $1200^{\circ}C$ in air, and the oxide scales were examined by XRD, SEM/EDS, and EPMA. The unoxidized coatings consisted mainly of ${\gamma}$'$-Ni_3$Al, with some ${\gamma}$-Ni. The major oxide formed on the coatings was $\alpha$ $-Al_2$$O_3$. Additionally, (CoCr$_2$$O_4$, $CoAl_2$$O_4$) spinels and $Al_{5}$ $Y_3$$O_{12}$ coexisted. NiO was not found, despite of high amount of Ni in the coating. Below the oxide layer, internally formed $Al_2$$O_3$ existed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.12
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• pp.1028-1032
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• 2009

In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the $SiO_x$ film with oxygen concentration($O_2/Ar+O_2$) of 3.3% and the $SiO_xN_y$ film with nitrogen concentration($N_2/Ar+O_2+N_2$) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the $SiO_x$ and/or $SiO_xN_y$ films showed the enhanced properties of decreased water vapor transmission rate (WVTR) over $10^{-1}\;g/m^2{\cdot}day$ compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the $SiO_xN_y$ film.

• Clean Technology
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• v.29 no.4
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• pp.321-326
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• 2023

Recently, there has been a growing interest in clean hydrogen energy that does not emit carbon dioxide during combustion due to the increasing focus on carbon neutral. Research related to hydrogen production continues, and in this study, we applied waste-derived synthesis gas to the water-gas shift reaction to simultaneously treat waste and produce high-purity hydrogen. To enhance catalytic activity in the high-temperature water-gas shift (HT-WGS) reaction, magnesium was used as a support material alongside cerium. Cu-CeO₂-MgO catalysts were synthesized, with copper acting as the active component for the HT-WGS reaction. A study on the catalytic activity based on the preparation method was conducted, and the Cu-CeO₂-MgO catalyst prepared by impregnation method exhibited the highest activity in the HT-WGS reaction. The observed superior performance of the Cu-CeO₂-MgO catalyst prepared through the impregnation method can be attributed to its significantly higher oxygen storage capacity and amount of active Cu species.

• Journal of the Korean Institute of Gas
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• v.5 no.4 s.16
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• pp.27-32
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• 2001

It is desired that carbon dioxide causing a greenhouse effect be removed at a high temperature and high pressure in a steam reforming reaction. In this research, a pellet form of adsorbent CaO is employed to capture $CO_2$. The adsorbent was manufactured using a high pressure molding on powdered $CaCO_3$ followed by calcination. Then its properties were analyzed and the adsorption experiments were carried out in a batch adsorption chamber. The pore area was found to be dependent on a molding pressure and the pore distribution showed two peaks. It is examined that $CO_2$ binds to CaO by means of chemisorption and its maximum conversion is nearly $80\%$ at $700^{\circ}C$.

• Journal of the Korean Ceramic Society
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• v.45 no.11
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• pp.701-706
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• 2008

High frequency dielectric ceramics have potential for applications in mobile and satellite communications systems at frequencies higher than 10GHz. The Ba$(Zn_{1/3}Ta_{2/3})O_3$ ceramics are known to have a high quality factor, a small temperature coefficient of the resonance frequency and a high dielectric constant. On the other hands, sintering at high temperature for extended time is required to obtain the ordered structure for high quality factor. In this study, the microwave dielectric properties of $ZrO_2$ and NiO-added Ba$(Zn_{1/3}Ta_{2/3})O_3$ ceramics prepared by solid-state reaction have been investigated. Adding $ZrO_2$ and NiO could effectively promote the densification even the case of decreasing the sintering time. At the surface of samples, secondary phase of Ba-Ta compounds was formed possibly due to the evaporation of ZnO, however, the interior of the samples remained as pure Ba$(Zn_{1/3}Ta_{2/3})O_3$. The samples sintered at $1600^{\circ}C$ for 2h exhibited 1:2 ordering of Zn and Ta cations. Excellent microwave dielectric properties of $Q{\cdot}f$(>96,000 GHz) and ${\varepsilon}_r$=30 has been obtained.

• KIEE International Transactions on Electrophysics and Applications
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• v.12C no.4
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• pp.208-213
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• 2002

The present study describe the electrical performance of amorphous T $a_2$ $O_{5-X}$ fabricated on the buffer layers Ti and Ti $O_2$. T $a_2$ $O_{5-X}$ thin films were grown on the Ti and Ti $O_2$ layers as a capacitor layer using reactive sputtering method. The X-ray pattern analysis indicated that the two as-deposited films were amorphous and the amorphous state was kept stable on the RTA(rapid thermal annealing) at even $700^{\circ}C$. Measurements of dielectric properties of the reactive sputtered T $a_2$ $O_{5-X}$ thin films fabricated in two simple MIS(metal insulator semiconductor), structures, (Cu/T $a_2$ $O_{5}$ Ti/Si and CuT $a_2$ $O_{5}$ Ti $O_2$Si) show that the amorphous T $a_2$ $O_{5}$ grown on Ti showed high dielectric constant (23～39) and high leakage current density(10$^{-3}$ ～10$^{-4}$ (A/$\textrm{cm}^2$)), whereas relatively low dielectric constant (～15) and tow leakage current density(10$^{-9}$ ～10$^{-10}$ (A/$\textrm{cm}^2$)) were observed in the amorphous T $a_2$ $O_{5}$ deposited on the Ti $O_2$ layer. The electrical behaviors of the T $a_2$ $O^{5}$ thin films were attributed to the contribution of Ti- $O_2$ and the compositionally gradient Ta-Ti-0, being the low dielectric layer and high leakage current barrier. In additional, The T $a_2$ $O_{5}$ Ti $O_2$ thin films exhibited dominant conduction mechanism contributed by the Poole-Frenkel emission at high electric field. In the case of T $a_2$ $O_{5}$ Ti $O_2$ thin films were related to the diffusion of Ta, Ti and O, followed by the creation of vacancies, in the rapid thermal treated thin films.films.

• Journal of Electrochemical Science and Technology
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• v.10 no.2
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• pp.196-205
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• 2019

Ni-rich layered oxides $Li(Ni_xCo_yMn_z)O_2$ (x + y + z = 1) have been extensively studied in recent times owing to their high capacity and low cost and can possibly replace $LiCoO_2$ in the near future. However, these layered oxides suffer from problems related to the capacity fading, thermal stability, and safety at high voltages. In this study, we use surface coating as a strategy to improve the thermal stability at higher voltages. The uniform and conformal $Al_2O_3$ coating on prefabricated electrodes using atomic layer deposition significantly prevented surface degradation over prolonged cycling. Initial capacity of 190, 199, 188 and $166mAh\;g^{-1}$ is obtained for pristine, 2, 5 and 10 cycles of ALD coated samples at 0.2C and maintains 145, 158, 151 and $130mAh\;g^{-1}$ for high current rate of 2C in room temperature. The two-cycle $Al_2O_3$ modified cathode retained 75% of its capacity after 500 cycles at 5C with 0.05% capacity decay per cycle, compared with 46.5% retention for a pristine electrode, at an elevated temperature. Despite the insulating nature of the $Al_2O_3$ coating, a thin layer is sufficient to improve the capacity retention at a high temperature. The $Al_2O_3$ coating can prevent the detrimental surface reactions at a high temperature. Thus, the morphology of the active material is well-maintained even after extensive cycling, whereas the bare electrode undergoes severe degradation.

• Journal of the Korean institute of surface engineering
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• v.52 no.4
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• pp.211-226
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• 2019

Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of $SiO_2$, $TiO_2$, $Nb_2O_5$ thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the $SiO_2$ thin films was almost constant, but the refractive indices of $TiO_2$ and $Nb_2O_5$ thin films were changed depending on the microstructure of these films. Antireflection films of $Air/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/Glass$ structure designed by Macleod program were manufactured by our developed sputtering system. Transmittance and reflectance of the manufactured multilayer films showed outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.7
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• pp.432-436
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• 2017

IZO transistors with $Al_2O_3$ as gate dielectrics have been investigated. To improve permittivity in an ambient dielectric layer, we grew $Al_2O_3$ by atomic layer deposition directly onto the substrates. Then, we prepared IZO semiconductor solutions with 0.1 M indium nitrate hydrate [$In(NO_3)_3{\cdot}xH_2O$] and 0.1 M zinc acetate dehydrate [$Zn(CH_3COO)_2{\cdot}2H_2O$] as precursor solutions; the IZO solution made with a molar ratio of 7:3 was then prepared. It has been found that these oxide transistors exhibit low operating voltage, good turn-on voltage, and an average field-effect mobility of $0.90cm^2/Vs$ in ambient conditions. Studies of low-voltage driving of IZO transistors with atomic layer-deposited high-k $Al_2O_3$ as gate dielectric provide data of relevance for the potential use of these materials and this technology in transparent display devices and displays.