• 제목/요약/키워드: field effect mobility

검색결과 518건 처리시간 0.027초

a-Si:H/a SiN:H 구조 MODFET의 제조 및 그 특성 (Fabrication of MODFET with a-Si:H/a-Sin:H Structure and Its Characteristics)

  • 강석진;최시영
    • 전자공학회논문지A
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    • 제30A권6호
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    • pp.14-21
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    • 1993
  • MODFETs using the heterostructure of phosphorous-contained a-SiN:H: and undoped a-Si:H films have been fabricated by PECVD of SiH$_{4}$, PH$_{3}$ gases. Thecharacteristics of the devices have been invetigated and compared with conventional TFTs(CTFTs). The threshold voltage of the MODFETs was smaller than that of CTFTs, in the case of the devices using the a-SiN:H film with the relatively high phosphorous content, the threshold voltage was negative and the operation of the devices followed the depletion mode. On the other hand, on/off current ratio of the MODFETs was more than one order of magnitude higher than the CTFTs, and the field effect mobility of the former was approximately two times as high as that of the latter.

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$\alpha$-6T(sexithiophene)을 이용한 유기 박막 트랜지스터 제작 및 전기적 특성 연구 (A Study on the Electrical Characteriatics and Fabrication for Organic Thin Film Transistor Using $\alpha$-67(sexithiophene))

  • 김옥병;김대엽;표상우;이한성;김정수;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.586-589
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    • 1999
  • Organic semiconductors based on conjugated thiophene oligomer have great potential to be utilized as an active layer far electronic and optoelectronic devices. In this study, $\alpha$ -sexithiophene($\alpha$-6T) thin films and various electrode materials were deposited by Organic Molecular Beam Deposition(OMBD) and vacuum evaporation respectively. Those films were photolithographically patterned fur measurements. Electrical characterization of the thin film transistor with various channel length were measured, and field effect mobility is calculated by formula.

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유기트랜지스터용 p-type 유기반도체 개발 (New p-type Organic Semiconducting Materials for Organic Transistor)

  • 강인남;이지훈
    • 한국전기전자재료학회논문지
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    • 제19권6호
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    • pp.558-562
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    • 2006
  • We have synthesized a new p-type polymer, poly(9,9'-n-dioctylfluorene-alt-phenoxazine) (PFPO), via the palladium catalyzed coupling reaction. The number average molecular weight ($M_n$) of PFPO was found to be 23,000. PFPO dissolves in common organic solvents such as chloroform and toluene. The UV-visible absorption maximum of the PFPO thin film is clearly blue-shifted with respect to that of F8T2, poly-(9,9'-n-dioctylfluorene-alt-bithiophene). The introduction of the phenoxazine moiety into the polymer system results in better field-effect transistor (FET) performance than that of F8T2. A solution processed PFPO TFT device with a top contact geometry was found to exhibit a hole mobility of $2.7{\times}10^{-4}cm^2/Vs$ and a low threshold voltage of -2 V with high on/off ratio(${\sim}10^4$).

투명 ZnO를 활성 채널층으로 하는 박막 트랜지스터 (Thin Film Transistor with Transparent ZnO as active channel layer)

  • 신백균
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권1호
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    • pp.26-29
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    • 2006
  • Transparent ZnO thin films were prepared by KrF pulsed laser deposition (PLD) technique and applied to a bottom-gate type thin film transistor device as an active channel layer. A high conductive crystalline Si substrate was used as an metal-like bottom gate and SiN insulating layer was then deposited by LPCVD(low pressure chemical vapour deposition). An aluminum layer was then vacuum evaporated and patterned to form a source/drain metal contact. Oxygen partial pressure and substrate temperature were varied during the ZnO PLD deposition process and their influence on the thin film properties were investigated by X-ray diffraction(XRD) and Hall-van der Pauw method. Optical transparency of the ZnO thin film was analyzed by UV-visible phometer. The resulting ZnO-TFT devices showed an on-off ration of $10^6$ and field effect mobility of 2.4-6.1 $cm^2/V{\cdot}s$.

전자 수송층을 삽입한 용액 공정형 산화물 트랜지스터의 특성 평가 (Characterization of Solution-Processed Oxide Transistor with Embedded Electron Transport Buffer Layer)

  • 김한상;김성진
    • 한국전기전자재료학회논문지
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    • 제30권8호
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    • pp.491-495
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    • 2017
  • We investigated solution-processed indium-zinc oxide (IZO) thin-film transistors (TFTs) by inserting a 2-(4-biphenylyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole (PBD) buffer layer. This buffer layer efficiently tuned the energy level between the semiconducting oxide channel and metal electrode by increasing charge extraction, thereby enhancing the overall device performance: the IZO TFT with embedded PBD layer (thickness: 5 nm; width: $2,000{\mu}m$; length: $200{\mu}m$) exhibited a field-effect mobility of $1.31cm^2V^{-1}s^{-1}$, threshold voltage of 0.12 V, subthreshold swing of $0.87V\;decade^{-1}$, and on/off current ratio of $9.28{\times}10^5$.

Effective Medium 모델 적용에 의한 poly-Si TFT 특성 Simulation (Poly-Si TFT characteristic simulation by applying effective medium model)

  • 박재우;김태형;노원열;최종선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.320-323
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    • 2000
  • In the resent years, the Thin Film Transistor Liquid Crystal Display(TFT-LCD) have trend toward larger panel sizes and higher spatial and/or gray-scale resolution. In this trend, Because of its low field effect mobility, a-Si TFT is change to poly-Si TFT. In this paper, both effective-medium model of poly-Si TFTs and empirical capacitance model are applied to Pixel Design Array Simulation Tool (PDAST) and the pixel characteristics of TFT-LCD array were simulated, which were compared with the results calculated by Aim-Spice.

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저온에서 제작된 고분자 기판 위의 poly-si TFT 제조 및 특성 (Fabrication and characteristics of low temperature poly-Si thin film transistor using Polymer Substrates)

  • 강수희;김영훈;한진우;서대식;한정인
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 학술대회 및 기술세미나 논문집 디스플레이 광소자
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    • pp.62-63
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    • 2006
  • In this paper, the characteristics of polycrystalline silicon thin-film transistors (poly-Si TFTs) fabricated on polymer substrates are investigated. The a-Si films was laser annealed by using a XeCl excimer laser and a four-mask-processed poly-Si TFT was fabricated with fully self-aligned top gate structure. The fabricated nMOS TFT showed field-effect mobility of $30cm2/V{\cdot}s$, on/off ratio of 105 and threshold voltage of 5 V.

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Aging 효과가 Sol-gel 공정 기반 CuO 박막 트랜지스터의 전기적 특성에 미치는 영향 (Aging Effects on Electrical Characteristics of Sol-gel Processed CuO Thin Film Transistors)

  • 장재원
    • 한국전기전자재료학회논문지
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    • 제29권9호
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    • pp.527-531
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    • 2016
  • In this study, p-type thin film transistors consisting of CuO channels were fabricated by sol-gel process, with copper (II) acetate monohydrate precursors. At $500^{\circ}C$, the deposited films were fully converted into monoclinic phase CuO. The fabricated CuO thin film transistors deliver field effect mobility in saturation regime of $0.015cm^2/Vs$, and $I_{on}/I_{off}$ of ${\sim}10^3$. The degradation of the performance of the fabricated CuO thin film transistor caused by the exposure to air has been studied.

저밀도 유도결합플라즈마 처리를 이용한 그래핀 클리닝

  • 임영대;이대영;심전자;라창호;유원종
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 춘계학술발표회 논문집
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    • pp.220-220
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    • 2012
  • 저밀도 알곤 유도결합플라즈마(Ar-ICP) 를 적용한 그래핀 클리닝 연구를 보고한다. 알곤 축전결합플라즈마(Ar-CCP)는 높은 이온포격에너지 (수백 eV) 로 인하여 그래핀의 C-C $sp_2$ bonding을 쉽게 파괴하고 defect을 형성시킨다. 그러나 저밀도 ($n_i$ < $5{\times}10^8cm^{-3}$) Ar-ICP 에 노출된 그래핀은 낮은 이온포격에너지, 이온밀도로 인하여 defect 이 형성되지 않고 residue 제거가 가능하였다. Graphene 이 집적된 back-gated field effect transistor (G-FET) 가 저밀도 Ar-ICP 에 노출될 경우 resist residue 제거로 인하여 $V_{dirac}$ 이 0 V 방향으로 이동하고 mobility 가 증가하는 것을 확인하였다.

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