Fabrication of MODFET with a-Si:H/a-Sin:H Structure and Its Characteristics

a-Si:H/a SiN:H 구조 MODFET의 제조 및 그 특성

MODFETs using the heterostructure of phosphorous-contained a-SiN:H: and undoped a-Si:H films have been fabricated by PECVD of SiH$_{4}$, PH$_{3}$ gases. Thecharacteristics of the devices have been invetigated and compared with conventional TFTs(CTFTs). The threshold voltage of the MODFETs was smaller than that of CTFTs, in the case of the devices using the a-SiN:H film with the relatively high phosphorous content, the threshold voltage was negative and the operation of the devices followed the depletion mode. On the other hand, on/off current ratio of the MODFETs was more than one order of magnitude higher than the CTFTs, and the field effect mobility of the former was approximately two times as high as that of the latter.