• 제목/요약/키워드: electronics

검색결과 71,268건 처리시간 0.07초

Data Retention Time and Electrical Characteristics of Cell Transistor According to STI Materials in 90 nm DRAM

  • Shin, S.H.;Lee, S.H.;Kim, Y.S.;Heo, J.H.;Bae, D.I.;Hong, S.H.;Park, S.H.;Lee, J.W.;Lee, J.G.;Oh, J.H.;Kim, M.S.;Cho, C.H.;Chung, T.Y.;Kim, Ki-Nam
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제3권2호
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    • pp.69-75
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    • 2003
  • Cell transistor and data retention time characteristics were studied in 90 nm design rule 512M-bit DRAM, for the first time. And, the characteristics of cell transistor are investigated for different STI gap-fill materials. HDP oxide with high compressive stress increases the threshold voltage of cell transistor, whereas the P-SOG oxide with small stress decreases the threshold voltage of cell transistor. Stress between silicon and gap-fill oxide material is found to be the major cause of the shift of the cell transistor threshold voltage. If high stress material is used for STI gap fill, channel-doping concentration can be reduced, so that cell junction leakage current is decreased and data retention time is increased.

Fabrication of an All-Layer-Printed TFT-LCD Device via Large-Area UV Imprinting Lithography

  • Lee, Seung-Jun;Park, Dae-Jin;Bae, Joo-Han;Lee, Sung-Hee;Kim, Jang-Kyum;Kim, Kyu-Young;Bae, Jung-Mok;Kim, Bo-Sung;Kim, Soon-Kwon;Lee, Su-Kwon;Kwon, Sin;Seo, Jung-Woo;Kim, Ki-Hyun;Cho, Jung-Wok;Chang, Jae-Hyuk
    • Journal of Information Display
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    • 제11권2호
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    • pp.49-51
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    • 2010
  • Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of $1280{\times}800$ lines (125 ppi).

Spin-transfer Torque Switching in nano-sized MTJ

  • Oh, S.C.;Lee, J.E.;Nam, K.T.;Jeong, J.H.;Yeo, I.S.;Kim, S.T.;Han, W.S.
    • 한국자기학회:학술대회 개요집
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    • 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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    • pp.61.2-61.2
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    • 2007
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2.4-GHz Power Amplifier with Power Detector Using Metamaterial-Based Transformer-Type On-Chip Directional Coupler

  • Dang, Trung-Sinh;Tran, Anh-Dung;Lee, Bomson;Yoon, Sang-Woong
    • ETRI Journal
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    • 제35권3호
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    • pp.554-557
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    • 2013
  • This letter presents a power amplifier (PA) with an on-chip power detector for 2.4-GHz wireless local area network application. The power detector consists of a clamp circuit, a diode detector, and a coupled line directional coupler. A series inductor for an output matching network in the PA is combined with a through line of the coupler, which reduces the coupling level. Therefore, the coupler employs a metamaterial-based transformer configuration to increase coupling. The amount of coupling is increased by 2.5 dB in the 1:1 symmetric transformer structure and by 4.5 dB from two metamaterial units along the coupled line.

셀 룰라 발진기 네트웍을 이용한 새로운 2진 주파수 편이 변조 기법 (A New Binary Frequency Shift Keying Technique Using Cellular Oscillator Networks)

  • 원은주;강성묵;최종호;문규
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.258-261
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    • 2000
  • In this paper, the design of Binary FSK Using Cellular Oscillator Network architecture is newly introduced and analyzed. With its easy frequency controllability and MHz range of quadrature signals, the Cellular Oscillator Network can be used in RF communication systems. Binary Frequency Shift Keying can also be implemented through digital loop-path switching. This FSK model is simulated and proved with typical 3V, 0.5$\mu\textrm{m}$ CMOS N-well process parameters.

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