• 한국응용과학기술학회지
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• 제35권4호
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• pp.1206-1212
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• 2018

본 연구에서는 강유전성 고분자를 이용하여 제작된 100 nm 이하 두께를 가지는 박막형 커페시터의 측정 주파수에 따른 분극 반전 특성을 측정, 분석하였다. 고정된 박막 두께에 대해, 인가되는 최고 전기장의 세기가 증가할수록 더 높은 항전계에서 분극 반전이 발생되었다. 고정된 최고 전기장에 대해, 박막의 두께에 무관하게 같은 항전계에서 분극 반전이 발생되었다. 모든 측정에서 로그스케일 전기장 및 로그스케일 주파수의 관계에서 약 $0.12{\pm}0.01$의 비례 상수를 보였다. 결과적으로, 강유전체 고분자 커페시터가 40 nm 두께까지는 size effect 없이 일정한 분극 반전 특성을 보였다. 본 연구는 저전압 동작 고분자 메모리 소자의 동작 예측에 유용할 것이므로 저전압에서 동작 가능한 고분자 메모리 소자의 가능성을 보여준다.

• 한국전기전자재료학회논문지
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• 제31권3호
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• pp.135-140
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• 2018

Atomically thin $MoS_2$ single crystals have a two-dimensional structure and exhibit semiconductor properties, and have therefore recently been utilized in electronic devices and circuits. In this study, we have fabricated a field effect transistor (FET), using a CVD-grown, 3 nm-thin, $MoS_2$ single-crystal as a transistor channel after transfer onto a $SiO_2/Si$ substrate. The $MoS_2$ FETs displayed n-channel characteristics with an electron mobility of $0.05cm^2/V-sec$, and a current on/off ratio of $I_{ON}/I_{OFF}{\simeq}5{\times}10^4$. Application of bottom-gate voltage stresses, however, increased the interface charges on $MoS_2/SiO_2$, incurred the threshold voltage change, and degraded the device performance in further measurements. Exposure of the channel to UV radiation further degraded the device properties.

• 한국전자파학회논문지
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• 제24권7호
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• pp.694-700
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• 2013

도심 지역은 무선 채널 환경 중 대표적인 이동 통신 사용 지역으로서, 건물의 밀집도가 다양하게 분포하는 형태를 보인다. 건물 밀집도의 차이는 신호전달 과정에서 상당한 영향을 미칠 것으로 예상되어, 건물 밀집도의 정도가 채널 특성 분석에 있어서 영향을 미칠 가능성을 고려하여 전파 특성을 분석할 필요성이 있다. 측정은 제주도 인근 도심 지역에서 실시하였으며, 채널 사운더와 $4{\times}4$ 안테나로 채널 특성을 측정하였다. 측정된 데이터를 바탕으로 도심 지역에서 건물 밀집도를 고려한 채널 특성을 도출하였다. 본 논문은 700 MHz 대역에서 도심 지역 건물 밀집도를 고려한 MIMO 시스템의 전파 채널 측정을 통해 측정 데이터를 분석하고, 채널 특성을 도출하였다.

• 대한인간공학회지
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• 제33권3호
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• pp.229-239
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• 2014

Objective: This research provides a guideline for working area design in the electronic industry, considering gender differences of physical characteristics. Background: Co-work in the electronic industry requires workers of various physical properties to work cohesively in the conveyor line for mass production. This stresses the need for a worker-centered design of the workplace convenient for all the workers. Method: In this research, the $6^{th}$ Size Korea (National Anthropometric Survey in Korea) report is referred to obtain the design measurements according to age and gender varieties. This information is used to provide the working area guideline concerning conveyor line workers of both genders aged 20 to 40. Results: Physical properties of workers and workplace design principles were obtained for application in the assembly, inspection, and material handling process in the electronic industry. Conclusion: Applying ergonomic design principles can provide safe and comfortable workplace for both genders. Application: This research can be fundamentally used in designing worker-centered workplaces.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2002년도 추계학술대회 발표 논문집
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• pp.81-84
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• 2002

The effects of the isoelectronic AI-doping of GaN grown by metal organic chemical vapor deposition were investigated for the first time using scanning electron microscopy (SEM), Hall measurements, photoluminescence (PL), and time-resolved PL. When a certain amount of Al was incorporated into the GaN films, the room temperature photoluminescence intensity of the films was approximately two orders larger than that of the undoped GaN. More importantly, the electron mobility significantly increased from 130 for the undoped sample to $500\textrm{cm}^2/Vs$ for the sample grown at a TMAl flow rate of $10{\mu}mol/min$, while the unintentional background concentration only increased slightly relative to the TMAl flow. The incorporation of Al as an isoelectronic dopant into GaN was easy during MOCVD growth and significantly improved the optical and electrical properties of the film. This was believed to result from a reduction in the dislocation-related non-radiative recombination centers or certain other defects due to the isoelectronic Al-doping.

• 반도체디스플레이기술학회지
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• 제10권1호
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• pp.51-55
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• 2011

The surface passivation is one of the important methods that can improve the efficiency of solar cells and can be classified into two methods: wet-chemical passivation and film passivation. In this paper, chemical HF treatment were employed for the passivation of n-type silicon wafers and their effects were studied. To investigate film passivation effects, the silicon nitride films were also deposited by PECVD (plasma-enhanced chemical vapor deposition) on n-type silicon wafers treated with chemical HF. The minority carrier lifetime measurements were used for evaluation of the passivation characteristics in the all experiments steps. We confirmed that the minority carrier lifetime was improved with chemical HF treatment due to passivation effects by H-termination.

• 한국세라믹학회지
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• 제51권6호
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• pp.523-526
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• 2014

PZT($Pb(Zr_{0.53}Ti_{0.47})O_3$)/PVDF(poly vinylidene fluoride) nanofibers were prepared based on DMF (dimethylformamide) and acetone solvent by electrospinning. The optimum concentration of a PZT and PVDF composite solution for the formation of nanofibers was found by SEM (scanning electron microscopy) observations. XRD (X-ray diffraction) measurements indicated that the characteristics of PZT and PVDF coexisted. The effects of the PZT concentration on the tensile strength were investigated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.187-188
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• 2005

The characteristics of GaN epitaxial layers grown on silicon (111) substrates by metalorganic vapor phase epitaxy have been investigated. The only control of AlN thickness was found to decrease the stress sufficiently for avoiding crack formation in an overgrown thick ($2.6{\mu}m$) GaN layer. X-ray diffraction and photoluminescence measurements are used to determine the effect of AlN thickness on the strain in the subsequent GaN layers. Strong band edge photoluminescence of GaN on Si(111) was observed with a full width at half maximum of the bound exciton line as low as 17meV at 13K.

• 센서학회지
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• 제5권2호
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• pp.55-60
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• 1996

The growth and microwave plasma assisted nitrogen doping of ZnSe by low pressure organometallic vapor phase epitaxy(OMVPE) has been investigated in a vertical downflow reactor equipped with a laser interferometer for in-situ growth rate measurements. Particular emphasis is placed on understanding growth characteristics of $H_{2}Se$ and the new adduct source dimethylzinc:triethyllamine($DMZn:NEt_{3}$) as compared with those obtained with $H_{2}Se$ and DMZn. At lower temperatures ($<300^{\circ}C$) and pressures(<30Torr), growth rates are higher with the adduct source and the surface morphology is improved relative to films synthesized with DMZn. Hall measurements and photoluminescence spectra of the grown films demonstrate that DMZn and $DMZn:NEt_{3}$ produce material with comparable electronic and optical properties. Microwave plasma decomposition of ammonia is investigated as a possible approach to increasing nitrogen incorporation in ZnSe and photoluminescence spectra are compared to those realized with conventional ammonia doping.

• Transactions on Electrical and Electronic Materials
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• 제16권3호
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• pp.130-134
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• 2015

This research proposes the use of a composition modulated (ZrO₂)_x(Al₂O₃)_1-x film as a charge trapping layer for charge trap flash memory; this is possible when the Zr (Al) atomic percent is controlled to form a variable bandgap as identified by the valence band offsets and electron energy loss spectrum measurements. Compared to memory devices with uniform compositional (ZrO₂)_0.1(Al₂O₃)_0.9 or a (ZrO₂)_0.92(Al₂O₃)_0.08 trapping layer, the memory device using the composition modulated (ZrO₂)_x(Al₂O₃)_1-x as the charge trapping layer exhibits a larger memory window (6.0 V) at the gate sweeping voltage of ±8 V, improved data retention, and significantly faster program/erase speed. Improvements of the memory characteristics are attributed to the special energy band alignments resulting from non-uniform distribution of elemental composition. These results indicate that the composition modulated (ZrO₂)_x(Al₂O₃)_1-x film is a promising candidate for future nonvolatile memory device applications.