• Title/Summary/Keyword: critical state parameter

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Liquefaction susceptibility of silty tailings under monotonic triaxial tests in nearly saturated conditions

  • Gianluca Bella;Guido Musso
    • Geomechanics and Engineering
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    • v.36 no.3
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    • pp.247-258
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    • 2024
  • Tailings are waste materials of mining operations, consisting of a mixture of clay, silt, sand with a high content of unrecoverable metals, process water, and chemical reagents. They are usually discharged as slurry into the storage area retained by dams or earth embankments. Poor knowledge of the hydro-mechanical behaviour of tailings has often resulted in a high rate of failures in which static liquefaction has been widely recognized as one of the major causes of dam collapse. Many studies have dealt with the static liquefaction of coarse soils in saturated conditions. This research provides an extension to the case of silty tailings in unsaturated conditions. The static liquefaction resistance was evaluated in terms of stress-strain behavior by means of monotonic triaxial tests. Its dependency on the preparation method, the volumetric water content, the void ratio, and the degree of saturation was studied and compared with literature data. The static liquefaction response was proved to be dependent mainly on the preparation technique and degree of saturation that, in turn, controls the excess of pore pressure whose leading role is investigated by means of the relationship between the -B Skempton parameter and the degree of saturation. A preliminary interpretation of the static liquefaction response of Stava tailings is also provided within the Critical State framework.

Synthesis and Analysis of the Impact of Partial Mercury Replacement with Lead on the Structural and Electrical Properties of the Hg1-xPbxBa2Ca2Cu3O8+δ Superconductor

  • Kareem Ali Jasim;Chaiar Abdeen Zaynel Saleh;Alyaa Hamid Ali Jassim
    • Korean Journal of Materials Research
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    • v.34 no.1
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    • pp.21-26
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    • 2024
  • In this investigation, samples of the chemical (Hg1-xPbxBa2Ca1.8Mg0.2Cu3O8+δ) were prepared utilizing a solid-state reaction technique with a range of lead concentrations (x = 0.0, 0.05, 0.10, and 0.20). Specimens were pressed at 8 tons per square centimeter and then prepared at 1,138 K in the furnace. The crystalline structure and surface topography of all samples were examined using X-ray diffraction (XRD) and atomic force microscopy (AFM). X-ray diffraction results showed that all of the prepared samples had a tetragonal crystal structure. Also, the results showed that when lead was partially replaced with mercury, an increase in the lead value impacted the phase ratio, and lattice parameter values. The AFM results likewise showed excellent crystalline consistency and remarkable homogeneity during processing. The electrical resistivity was calculated as a function of temperature, and the results showed that all samples had a contagious behavior, as the resistivity decreased with decreasing temperature. The critical temperature was calculated and found to change, from 102, 96, 107, and 119 K, when increasing the lead values in the samples from 0.0 to 0.05, 0.10, and 0.20, respectively.

Artificial intelligence design for dependence of size surface effects on advanced nanoplates through theoretical framework

  • Na Tang;Canlin Zhang;Zh. Yuan;A. Yvaz
    • Steel and Composite Structures
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    • v.52 no.6
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    • pp.621-626
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    • 2024
  • The work researched the application of artificial intelligence to the design and analysis of advanced nanoplates, with a particular emphasis on size and surface effects. Employing an integrated theoretical framework, this study developed a more accurate model of complex nanoplate behavior. The following analysis considers nanoplates embedded in a Pasternak viscoelastic fractional foundation and represents the important step in understanding how nanoscale structures may respond under dynamic loads. Surface effects, significant for nanoscale, are included through the Gurtin-Murdoch theory in order to better describe the influence of surface stresses on the overall behavior of nanoplates. In the present analysis, the modified couple stress theory is utilized to capture the size-dependent behavior of nanoplates, while the Kelvin-Voigt model has been incorporated to realistically simulate the structural damping and energy dissipation. This paper will take a holistic approach in using sinusoidal shear deformation theory for the accurate replication of complex interactions within the nano-structure system. Addressing different aspectsof the dynamic behavior by considering the length scale parameter of the material, this work aims at establishing which one of the factors imposes the most influence on the nanostructure response. Besides, the surface stresses that become increasingly critical in nanoscale dimensions are considered in depth. AI algorithms subsequently improve the prediction of the mechanical response by incorporating other phenomena, including surface energy, material inhomogeneity, and size-dependent properties. In these AI- enhanced solutions, the improvement of precision becomes considerable compared to the classical solution methods and hence offers new insights into the mechanical performance of nanoplates when applied in nanotechnology and materials science.

Analysis of Photoluminescence of Eu3+ in YOBr and Investigation of Critical Distance (YOBr:Eu3+ 형광체의 발광특성과 임계거리 연구)

  • Kim, Gyeong Hwa;Park, Jong Gyu;Park, Hui Dong;Han, Jeong Hwa
    • Journal of the Korean Chemical Society
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    • v.45 no.6
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    • pp.570-576
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    • 2001
  • The europium doped yttrium oxybromide phosphors were synthesized by solid-state reaction method. The YOBr: $Eu^{3+}$ phosphor showed a strong and narrow red emission band at 621 nm and maximum emission intensity obtained when 0.05 mol Eu ions were doped. The red emission of $Eu^{3+}$ originated from $^5D_0$ ${\rightarrow}$ $^7F_2$electric dipole transition. In order to investigate on photoluminescence behavior, several experimental skills and numerical fittings are conducted to the YOBr: $Eu^{3+}$ phosphor. The emission spectrum was measured in the UV range and then decay curve of $^5D_0$ ${\rightarrow}$ $^7F_j$transitions was examined. The energy interaction type of YOBr: $Eu^{3+}$ phosphor was dipole-dipole interaction. In addition to the calculating by critical concentration, the critical distance ($R_0$) was calculated by decay curve fitting parameter from Inokuti-Hirayamas equation, and spectral overlap method. The critical distance was 17.03, 10.51 and 7.18$\AA$ for those methods, respectively. As considering systematic error of measurements, these values are within the same order, so that the above fitting methods are plausible and recommendable.

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Analysis of Consolidation and Shear Characteristics for the Kwangyang Bay Clay (실내시험을 통한 광양만 점토의 압밀 및 전단특성분석)

  • 이영휘;김용준;김대길
    • Journal of the Korean Geotechnical Society
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    • v.15 no.1
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    • pp.151-160
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    • 1999
  • A series of laboratory tests for the marine clay sampled under the sea of Kwangyang bay have been conducted. The main types of tests are the general index property tests, the oedometer tests and the triaxial compression tests in both undrained(CIU) and drained(CID) conditions. The clayey samples, classified as CL, CH with natural water content of 38.3~84.6% and liquidity index of 0.71~0.98, are in the normally consolidated state with O.C.R. of 1.0l~l.60. The undrained stress path from CIU tests can be normalized with isotropic consolidation pressure$(p_0)$ and equal shear strain contour is linear passing through the origin in the (q, p) plot. The undrained shear strain is found to be the only function of the stress ratio($\eta$) and linear with intercept in the ($\varepsilon/\eta,\eta$) plot. The built-up pore pressure normalized with pc is also linear with respect to $\eta$. and its slope is defined by ´C´ as a pore pressure parameter. Equations to predict the undrained stress path and the shear strain are proposed. It is proved that the proposed equations give better agreements to the measured values than the Cam-clay theories. The failure points of the stress path are located on the same C.S.L. in (q, p) plot during both CIU and CID tests, which justifies the concept of critical state theory.

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Evaluation of Water Quality Change by Membrane Damage to Pretreatment Process on SDI in Wastewater Reuse (하수재이용에서 전처리 막 손상에 의한 수질변화가 SDI에 미치는 영향평가)

  • Lee, Min Soo;Seo, Dongjoo;Lee, Yong-Soo;Chung, Kun Yong
    • Membrane Journal
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    • v.32 no.4
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    • pp.253-263
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    • 2022
  • This study suggests a guideline for designing unit process of wastewater reuse in terms of a maintenance of the process based on critical parameters to draw a high quality performance of RO unit. Defining the parameters was done by applying membrane integrity test (MIT) in pretreatment process utilizing lab-scale MF. SDI is utilized for judging whether permeate is suitable to RO unit. However, result said TOC concentration matching with particle count analysis is better for judging the permeate condition. When membrane test pressure (Ptest) was measured to derive log removal value in PDT, virgin state of membrane fiber was used to measure dynamic contact angle utilizing surface tension of the membrane fiber. Actually, foulant affects to the state of membrane surface, and it decreases the Ptest value along with time elapsed. Consequently, LRVDIT is also affected by Ptest value. Thus, sensitivity of direct integrity test descends with result of Ptest value change, so Ptest value should be considered not the virgin state of the membrane but its current state. Overall, this study focuses on defining design parameters suitable to MF pretreatment for RO process in wastewater reuse by assessing its impact. Therefore, utilities can acknowledge that the membrane surface condition must be considered when users conduct the direct integrity test so that Ptest and other relative parameter used to calculate LRVDIT are adequately measured.

Lubrication Effect of Journal Bearing according to its Eccentricity and Attitude Angle (베어링 편심도와 자세각에 따른 저어널 베어링의 윤활효과)

  • Kim, Jong-Do;Wang, Yi-Jun;Yoon, Moon-Chul
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.14 no.5
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    • pp.88-95
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    • 2015
  • The thickness of adsorbed molecular layers is the most critical factor in studying thin-film lubrication, and it is the most essential parameter that distinguishes thin-film from thick-film lubrication analysis. The thin film between the shaft and bearing surface within a very narrow gap was considered. The general Reynolds equation has been derived for calculating thin-film lubrication parameters affecting the performance of the circular journal bearing. Investigation of the load-carrying capacity and pressure distribution for the journal bearing considering the adsorbed layer thickness has been carried out. A Reynolds equation appropriate for the journal bearing is used in this paper for the analysis, and it is discussed using the finite difference method of the central difference scheme. The parameters, such as eccentricity and attitude angle, are used for discussing the load-carrying capacity of the journal bearing. The results reported in this paper should be applied to analysis of the journal bearing with different lubrication factors. The steady-state analysis of the journal bearing is conducted using the Reynolds model under thin-film lubrication conditions. For a journal bearing, several parameters, such as a pressure, load capacity, and pressure components of the bearing can be obtained, and these results can be stored in a sequential data file for later analysis. Finally, their distribution can be displayed and analyzed easily by using the MATLAB GUI technique. The load-carrying capability of the journal bearing is observed for the specified operating conditions. This work could be helpful for the understanding and research of the mechanism of thin-film lubrication.

원자층 식각을 이용한 Sub-32 nm Metal Gate/High-k Dielectric CMOSFETs의 저손상 식각공정 개발에 관한 연구

  • Min, Gyeong-Seok;Kim, Chan-Gyu;Kim, Jong-Gyu;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.463-463
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    • 2012
  • ITRS (international technology roadmap for semiconductors)에 따르면 MOS(metal-oxide-semiconductor)의 CD (critical dimension)가 45 nm node이하로 줄어들면서 poly-Si/$SiO_2$를 대체할 수 있는 poly-Si/metal gate/high-k dielectric이 대두된다고 보고하고 있다. 일반적으로 high-k dielectric를 식각시 anisotropic 한 식각 형상을 형성시키기 위해서 plasma를 이용한 RIE (reactive ion etching)를 사용하고 있지만 PIDs (plasma induced damages)의 하나인 PIED (plasma induced edge damage)의 발생이 문제가 되고 있다. PIED의 원인으로 plasma의 direct interaction을 발생시켜 gate oxide의 edge에 trap을 형성시키므로 그 결과 소자 특성 저하가 보고되고 있다. 그러므로 본 연구에서는 이에 차세대 MOS의 high-k dielectric의 식각공정에 HDP (high density plasma)의 ICP (inductively coupled plasma) source를 이용한 원자층 식각 장비를 사용하여 PIED를 줄일 수 있는 새로운 식각 공정에 대한 연구를 하였다. One-monolayer 식각을 위한 1 cycle의 원자층 식각은 총 4 steps으로 구성 되어 있다. 첫 번째 step은 Langmuir isotherm에 의하여 표면에 highly reactant atoms이나 molecules을 chemically adsorption을 시킨다. 두 번째 step은 purge 시킨다. 세 번째 step은 ion source를 이용하여 발생시킨 Ar low energetic beam으로 표면에 chemically adsorbed compounds를 desorption 시킨다. 네 번째 step은 purge 시킨다. 결과적으로 self limited 한 식각이 이루어짐을 볼 수 있었다. 실제 공정을 MOS의 high-k dielectric에 적용시켜 metal gate/high-k dielectric CMOSFETs의 NCSU (North Carolina State University) CVC model로 구한 EOT (equivalent oxide thickness)는 변화가 없으면서 mos parameter인 Ion/Ioff ratio의 증가를 볼 수 있었다. 그 원인으로 XPS (X-ray photoelectron spectroscopy)로 gate oxide의 atomic percentage의 분석 결과 식각 중 발생하는 gate oxide의 edge에 trap의 감소로 기인함을 확인할 수 있었다.

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중성빔 식각을 이용한 Metal Gate/High-k Dielectric CMOSFETs의 저 손상 식각공정 개발에 관한 연구

  • Min, Gyeong-Seok;O, Jong-Sik;Kim, Chan-Gyu;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.287-287
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    • 2011
  • ITRS(international technology roadmap for semiconductors)에 따르면 MOS (metal-oxide-semiconductor)의 CD(critical dimension)가 45 nm node이하로 줄어들면서 poly-Si/SiO2를 대체할 수 있는 poly-Si/metal gate/high-k dielectric이 대두되고 있다. 일반적으로 metal gate를 식각시 정확한 CD를 형성시키기 위해서 plasma를 이용한 RIE(reactive ion etching)를 사용하고 있지만 PIDs(plasma induced damages)의 하나인 PICD(plasma induced charging damage)의 발생이 문제가 되고 있다. PICD의 원인으로 plasma의 non-uniform으로 locally imbalanced한 ion과 electron이 PICC(plasma induced charging current)를 gate oxide에 발생시켜 gate oxide의 interface에 trap을 형성시키므로 그 결과 소자 특성 저하가 보고되고 있다. 그러므로 본 연구에서는 이에 차세대 MOS의 metal gate의 식각공정에 HDP(high density plasma)의 ICP(inductively coupled plasma) source를 이용한 중성빔 시스템을 사용하여 PICD를 줄일 수 있는 새로운 식각 공정에 대한 연구를 하였다. 식각공정조건으로 gas는 HBr 12 sccm (80%)와 Cl2 3 sccm (20%)와 power는 300 w를 사용하였고 200 eV의 에너지로 식각공정시 TEM(transmission electron microscopy)으로 TiN의 anisotropic한 형상을 볼 수 있었고 100 eV 이하의 에너지로 식각공정시 하부층인 HfO2와 높은 etch selectivity로 etch stop을 시킬 수 있었다. 실제 공정을 MOS의 metal gate에 적용시켜 metal gate/high-k dielectric CMOSFETs의 NCSU(North Carolina State University) CVC model로 effective electric field electron mobility를 구한 결과 electorn mobility의 증가를 볼 수 있었고 또한 mos parameter인 transconductance (Gm)의 증가를 볼 수 있었다. 그 원인으로 CP(Charge pumping) 1MHz로 gate oxide의 inteface의 분석 결과 이러한 결과가 gate oxide의 interface trap양의 감소로 개선으로 기인함을 확인할 수 있었다.

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Sampled-Data Modeling and Dynamic Behavior Analysis of Peak Current-Mode Controlled Flyback Converter with Ramp Compensation

  • Zhou, Shuhan;Zhou, Guohua;Zeng, Shaohuan;Xu, Shungang;Cao, Taiqiang
    • Journal of Power Electronics
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    • v.19 no.1
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    • pp.190-200
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    • 2019
  • The flyback converter, which can be regarded as a nonlinear time-varying system, has complex dynamics and nonlinear behaviors. These phenomena can affect the stability of the converter. To simplify the modeling process and retain the information of the output capacitor branch, a special sampled-data model of a peak current-mode (PCM) controlled flyback converter is established in this paper. Based on this, its dynamic behaviors are analyzed, which provides guidance for designing the circuit parameters of the converter. With the critical stability boundary equation derived by a Jacobian matrix, the stable operation range with a varied output capacitor, proportional coefficient of error the amplifier, input voltage, reference voltage and slope of the compensation ramp of a PCM controlled flyback converter are investigated in detail. Research results show that the duty ratio should be less than 0.5 for a PCM controlled flyback converter without ramp compensation to operate in a stable state. The stability regions in the parameter space between the output capacitor and the proportional coefficient of the error amplifier are enlarged by increasing the input voltage or by decreasing the reference voltage. Furthermore, the ramp compensation also can extend to the stable region. Finally, time-domain simulations and experimental results are presented to verify the theoretical analysis results.