• 한국진공학회지
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• 제17권6호
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• pp.518-522
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• 2008

반도체 집적도의 비약적인 발전으로 박막은 더욱 다층화 되고 선폭은 더욱 미세화가 진행되었다. 이러한 악조건에서 소자의 집적도를 계속 향상시키기 위하여 많은 연구가 진행되고 있다. 특히 소자 집적도 향상으로 금속 배선 공정에서는 선폭의 미세화와 배선 길이 증가로 인한 RC지연이 발생하게 되었다. 이를 방지하기 위하여 Al보다 비저항이 작은 Cu를 배선물질로 사용하여야 하며, 또한 일부 공정에서는 이미 사용하고 있다. 그러나 Cu를 금속배선으로 사용하기 위해 해결해야 할 가장 큰 문제점은 저온에서 쉽게 Si기판과 반응하는 문제이다. 현재까지 본 실험실에서는 tungsten (W)을 주 물질로 W-C-N (tungsten- carbon - nitrogen) 확산방지막을 증착하여 연구를 하였으며, $\beta$-ray, XRD, XPS 분석을 통하여 고온에서도 Cu의 확산을 효과적으로 방지한다는 연구 결과를 얻었다. 이 연구에서는 기존 연구에 추가적으로 W-C-N 확산방지막의 표면을 Nano-Indenter System을 이용하여 확산방지막 표면강도 변화를 분석하여 확산방지막의 물성 특성을 연구하였다. 이러한 연구를 통하여 박막내 불순물인 질소가 포함된 박막이 고온 열처리 과정에서 보다 안정적인 표면강도 변화를 나타내는 연구 결과를 얻었으며, 이로부터 박막의 물성 분석을 실시하였다.

• 전자공학회논문지A
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• 제31A권3호
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• pp.46-52
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• 1994

We investigated theoretically the current-voltage characteristics of resonant tunneling diodes with a single quantum well structure. using a self-consistent method. This method is a numerical analysis which is able to include the effects of the undoped spacer layer and the band bending by charge accumulation and depletion on the contact layers which have not been considered in the flat-band model reported by Esaki. so that it is better suited to explain experimental results. The structure used is an $AL_{0.5}Ga_{0.5}AS/GaAs/Al_{0.5}Ga_{0.5}AS$ single quantum well. In this work. we estimate the theoretical current-voltage characteristics of the same structure, and then, the dependence of the current-voltage curves on the thickness of undoped spacer layers sandwiched between the barrier and highly n-doped GaAs contact layer.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.74-77
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• 2006

Thin $AuO_x$ layer was formed by $O_2$ plasma treatment on Au electrode. The surface work function of plasma treatment showed higher by 0.5 eV than that of bare Au, reducing the hole injection barrier at the Au/pentacene interface. Using $O_2$ plasma-treated Au source-drain electrodes, the field-effect mobility of bottom-contact pentacene-OTFT was increased from 0.05 to 0.1 $cm^2/Vs$.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1413-1415
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• 2005

The OTFT performance depends strongly on the interfacial properties between an organic semiconductor and ${\alpha}$ metal electrode. The contact resistance is critical to the current flow in the device. The contact resistance arises mainly from the Schottky barrier formation due to the work function difference between the semiconductor and electrodes. We doped pentacene/source-drain interfaces with $F_4TCNQ$ (2,3,5,6-Tetrafluoro-7,7,8,8-tetracyanoquinodimethane), resulting in p-doped region at the SD contacts, in order to solve this problem. We found that the mobility increased and the threshold voltage decreased.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.179.2-179.2
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• 2014

Carbon nanotubes (CNT)-metal contacts play an important role in nanoelectronics applications such as field-effect transistor (FET) devices. Using Al and (10,0) CNT, we have recently showed that the CNT-metal contacts mediated via topological defects within CNT exhibits intrinsically low contact resistance, thanks to the preservation of the sp2 bonding network at the metal-CNT contacts.[1] It is well-established that metals with good wetting property such as Pd consistently yield good contacts to both metallic and semiconducting CNTs. In this work, the electronic and charge transport properties of the interfaces between capped CNT and Pd will be investigated based on first-principles computations and compared with previous results obtained for the Al electrodes.

• 한국표면공학회지
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• 제39권2호
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• pp.64-69
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• 2006

Nanoscale task such as nanolithography and nanoindenting is a challenging work that is beyond the capabilities of human sensing and precision. Since surface forces and intermolecular forces dominate over gravitational and other more intuitive forces of the macro world at the nanoscale, a user is not familiar with these novel nanoforce effects. In order to overcome this scaling barrier, haptic interfaces that consist of visual and force feedback at the macro world have been used with an Atomic Force Microscope (AFM) as a manipulator at the nanoscale. In this paper, a nanoscale virtual coupling (NSVC) concept is introduced and the relationship between performance and impedance scaling factors of velocity (or position) and force are explicitly represented. Experiments have been performed for nanoindenting and nanolithography with different materials in the nanoscale virtual surface. The interaction forces (non contact and contact nanoforces) between the AFM tip and the nano sample are transmitted to the operator through the haptic interface.

• JSTS:Journal of Semiconductor Technology and Science
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• 제4권2호
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• pp.124-127
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• 2004

W/n-GaN Schottky diodes were irradiated with $^{60}Co\;{\gamma}-rays$ to doses up to 315Mrad. The barrier height obtained from current-voltage (I-V) measurements showed minimal change from its estimated initial value of ${\sim}0.4eV$ over this dose range, though both forward and reverse I-V characteristics show evidence of defect center introduction at doses as low as 150 Mrad. Post irradiation annealing at $500^{\circ}C$ increased the reverse leakage current, suggesting migration and complexing of defects. The W/GaN interface is stable to high dose of ${\gamma}-rays$, but Au/Ti overlayers employed for reducing contact sheet resistance suffer from adhesion problems at the highest doses.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.224-224
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• 2010

Pt와 ITO 상부전극의 top-electode/NiO/Pt 구조에서 resistance switching현상을 연구하였다. 하부전극물질이 resistance switching현상에 미치는 영향은 이미 연구되었다. Ohmic 이나 low Schottky contact은 NiO 박막의 resistance switching 현상은 높은 전기장의 인가에 의해 것이 나타나는 것은 알 수 있었다. Ohmic contact에서는 유도전기장에 의한 resistance switching 현상들을 관찰할 수 있다. low Schottky barrier를 가지는 ITO/NiO/Pt 구조에서 resistances switching현상은 관찰되지 않고 Pt/ITO구조로 Ohmic 접촉은 유도전기장에 의한 resistance switching 현상이 나타나지 않음을 알 수 있었다.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.120-123
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• 2019

The effect of surface plasmon on ZTO thin films was investigated. The phenomenon of depletion occurring in the interface of the ZTO thin film created a potential barrier and the dielectric layer of the depletion formed a non-mass particle called plasmon. ZTO thin film represents n-type semiconductor features, and surface current by plasma has been able to obtain the effect of improving electrical efficiency as a result of high current at positive voltage and low current at negative voltage. It can be seen that the reduction of electric charge due to recombination of electronic hole pairs by heat treatment of compound semiconductors induces higher surface current in semiconductor devices.

• 반도체디스플레이기술학회지
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• 제17권3호
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• pp.17-20
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• 2018

IGZO thin films were prepared on n-type Si substrates to research the interface characteristics between IGZO and substrate. After the annealing processes, the depletion layer was formed at the interface to make a Schottky contact owing to the electron-hall fair recombination. The carrier density was decreased by the effect of depletion layer and the hall mobility decreased during the deposition processes. But the annealing effect of depletion layer increased the hall mobility because of the increment of potential barrier and the extension of depletion layer. It was confirmed that it is useful to observe the depletion effect and Schottky contact's properties by complementary using the Hall measurement and I-V measurement.