• 제목/요약/키워드: bias voltage

검색결과 1,264건 처리시간 0.032초

Voltage Clamp Bias를 사용한 고전압 LED Drive IC (A High Voltage LED Drive IC using Voltage Clamp Bias)

  • 박성남;박시홍
    • 한국전기전자재료학회논문지
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    • 제22권7호
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    • pp.559-562
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    • 2009
  • Due to the enormous progress achieved in light emitting diodes (LEDs) LEDs have been become a good solution for lightings. In LED driver for lighting applications, it is required high input voltage to drive more LEDs. Therefore, high-voltage should be changed to low-voltage to supply power for drive IC. In this paper, LED drive IC using voltage clamp bias circuit, it use a hysteretic-buck converter topology was proposed and verified through experiments.

Voltage Clamp Bias를 사용한 고전압 LED Drive IC (A High-voltage LED Drive IC Using a Voltage Clamp Bias)

  • 김성남;박시홍
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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    • pp.85-87
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    • 2009
  • Due to the enormous progress in light emitting diodes (LEDs), LEDs have been become a good solution for lightings. In LED driver for lighting applications, it is required a high input voltage to drive more LEDs. Therefore, a high-voltage should be changed to low-voltage to supply power for drive IC. In this paper, a LED drive IC with hysteretic-buck converter topology using a voltage clamp bias circuit was proposed and verified through simulations.

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글로우방전 질량분석법을 이용한 구리 박막내의 미량불순물 분석: 음의 기판 바이어스에 의한 불순물원소의 농도변화 (Trace impurity analysis of Cu films using GDMS: concentration change of impurities by applying negative substrate bias voltage)

  • 임재원
    • 한국진공학회지
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    • 제14권1호
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    • pp.17-23
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    • 2005
  • 본 논문은 글로우방전 질량분석법(Glow Discharge Mass Spectrometry: GDMS)을 이용하여 구리 박막내의 미량 불순물의 농도분석과 음의 기판 바이어스에 대한 구리 박막내의 불순물의 농도변화에 대해서 고찰하였다. 구리 박막은 실리콘 기판 위에 비질량 분리형 이온빔 증착장비를 이용하여 기판 바이어스를 걸지 않은 경우와 -50 V의 기판 바이어스를 걸은 상태에서 증착하였다. 전기를 통하지 않는 분석 샘플의 경우, 직류(DC) GDMS에 의한 분석시, 샘플 표면에서의 charge-up 효과에 의해 분석에 어려움이 있었지만, 본 실험에서는 간편하게 분석이 가능하도록 샘플을 알루미늄 포일(foil)로 감싸서 구리 박막으로부터 실리콘 기판 뒤의 샘플 홀더까지 전기적 접촉이 이루어지도록 하였다. 구리 타겟과 증착된 구리 박막들에 대한 GDMS 분석결과에 의해서, 전체적으로 박막내의 불순물의 양이 음의 기판 바이어스에 의해 줄어듦으로써 구리 박막의 전체 순도를 높일 수 있다는 것을 알게 되었다. 음의 기판 바이어스에 의한 불순물들의 농도변화는 각각의 불순물의 이온화 포텐셜의 차이에 의한 것으로, 박막 증착시 플라즈마내의 Penning ionization effect와 본 논문에서 제시한 이온화 과정에 의해 각 불순물의 농도변화가 설명되어질 수 있었다. 또한, 기판 위에서의 구리 이온들의 충격에 의한 cleaning effect도 박막내의 불순물의 농도변화에 기여했다고 판단된다.

물리증착법에 의해 제작한 마그네슘 박막의 형성기구와 내식특성 (Formation Mechanism and Corrosion-Resistance of Magnesium Film by Physical Vapour Deposition Process)

  • 이명훈
    • Journal of Advanced Marine Engineering and Technology
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    • 제18권2호
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    • pp.54-63
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    • 1994
  • Mg thin films were prepared on SPCC(cold-rolled steel) substrates by vasuum evapoaration and ion-plating. The influence of argon gas pressure and substrates bias voltage on the crystal orientation and morphology of the film was determined by using X-ray diffraction and scanning electron micrography (SEM), respectively. And the effect of crystal orientation and morphology of the Mg thin films on corrosion behavior was estimated by measuring the anodic polarization curves in deaerated 3% NaCl solution. The crystal orientation of the Mg films deposited at high argon gas pressure exhibited a (002) preferred orientation, regardless of the substrate bias voltage. Film morphology changed from a columnar to a granular structure with the increase of argon gas pressure. The morphology of the films depended not only on argon gas pressure but also bias voltage ; i.e., the effect of increasing bias voltage was similar to that of decreasing argon gas pressure. The influences of argon gas pressure and bias voltage were explained by applying the adsorption inhibitor theory and the sputter theory. And also, this showed that the corrosion resistance of the Mg thin films can be changed by controlling the crystal orientaton and morphology.

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Pulsed Magnet ron Sputtering Deposit ion of DLC Films Part II : High-voltage Bias-assisted Deposition

  • Chun, Hui-Gon;Lee, Jing-Hyuk;You, Yong-Zoo;Ko, Yong-Duek;Cho, Tong-Yul;Nikolay S. Sochugov
    • 한국표면공학회지
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    • 제36권2호
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    • pp.148-154
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    • 2003
  • Short ($\tau$=40 $mutextrm{s}$) and high-voltage ($U_{sub}$=2~8 kV) negative substrate bias pulses were used to assist pulsed magnetron sputtering DLC films deposition. Space- and time-resolved probe measurements of the plasma characteristics have been performed. It was shown that in case of high-voltage substrate bias spatial non-uniformity of the magnetron discharge plasma density greatly affected DLC deposition process. By Raman spectroscopy it was found that maximum percentage of s $p^3$-bonded carbon atoms (40 ~ 50%) in the coating was attained at energy $E_{c}$ ~700 eV per deposited carbon atom. Despite rather low diamond-like phase content these coatings are characterized by good adhesion due to ion mixing promoted by high acceleration voltage. Short duration of the bias pulses is also important to prevent electric breakdowns of insulating DLC film during its growth.wth.

코로나방전에 의한 AUTO-BIAS형태의 전기집진에 관한 연구 (A Study on the Electrostatic Precipitation of Auto-Bias Type by Corona Discharge)

  • 이주상;김신도;김광영
    • 환경위생공학
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    • 제10권2호
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    • pp.79-88
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    • 1995
  • The electrostatic precipitation of Auto- Bias has the advantages of a little of power consumption by the voltage to apply only at ionizer and the prevention of fire danger by current flow over. As this ionizer wire was used WXN- Pt material of diameter 90$\mu $m, that improved ion efficiency and safety, simplified a existing source of electric power by induced Auto- Bias voltage. Also, the new type collector used electric conductivity- film wag superior a electric safety and dust collection efficiency and was possible to wash it by water. As a experiment result of this Auto- Bias electrostatic collector, the induced Auto- Bias voltage by appling D.C 4.0∼6.0kV at ionizer was 1.3∼2.3kV and then the power consumption by applied voltage was 8- l8W. The pressure loss of collector by the amount of flowing was 6.1 OmmH$_{2}$O in 300m$^{3}$/hr and showed a safe state of the dust collection. The collection efficiency by particle size was 65.1-95.8% in 0.5∼5.0$\mu $m. After corona discharge of ionizer, the remains ozone concentration was found much lower than that of ACGIH or air pollution criteria in Korea.

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Experimental Investigation of Output Current Variation in Biased Silicon-based Quadrant Photodetector

  • Liu, Hongxu;Wang, Di;Li, Chenang;Jin, Guangyong
    • Current Optics and Photonics
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    • 제4권4호
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    • pp.273-276
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    • 2020
  • We report on the relationship between output current for quadrant photodetector (QPD) and bias voltage in silicon-based p-i-n (positive-intrinsic-negative) QPD examined using millisecond pulse laser (ms pulse laser) irradiation. The mechanism governing the relationship was further studied experimentally. The output current curves were obtained by carrying out QPD under different bias voltages (0-40 V) irradiated by ms pulse laser. Compared to other photodetectors, the relaxation was created in the output current for QPD which is never present in other photodetectors, such as PIN and avalanche photodetector (APD), and the maximum value of relaxation was from 6.8 to 38.0 ㎂, the amplitude of relaxation increases with bias value. The mechanism behind this relaxation phenomenon can be ascribed to the bias voltage induced Joule heating effect. With bias voltage increasing, the temperature in a QPD device will increase accordingly, which makes carriers in a QPD move more dramatically, and thus leads to the formation of such relaxation.

Si이 첨가된 $Al_{0.33}Ga_{0.67}As$에서의 Electroreflectance에 관한 연구 (A Study on Electroreflectance in Si-Doped $Al_{0.33}Ga_{0.67}As$)

  • 김근형;김동렬;김종수;김인수;배인호;한병국
    • E2M - 전기 전자와 첨단 소재
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    • 제10권7호
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    • pp.692-699
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    • 1997
  • The silicon doped $Al_{0.33}$G $a_{0.67}$As were grown by molecular beam epitaxy. The electroreflectance(ER) spectra of Schottky barrier Au/n-Al/suu x/G $a_{1-x}$ As have been measured at various modulation voltage( $V_{ac}$ ) and dc bias voltage( $V_{bias}$). From the observed Franz-Keldysh oscillations(FKO) peak, the band gap energy of the $Al_{x}$G $a_{1-x}$ As is 1.91 eV which corresponds to an Al composition of 33%. The internal electric field( $E_{i}$)of this sample is 2.96$\times$10$^{5}$ V/cm. As the modulation voltage( $V_{ac}$ ) is changed, the line shape of ER signal does not change but its amplitude varies linearly. The amplitude as a function of modulation voltage has saturated at 0.8 V. The internal electric field has decreased from 6.47$\times$10$^{5}$ V/cm to 2.00$\times$10$^{5}$ V/cm as the dc bias voltage( $V_{bias}$) increases from -3.5 V to +0.8 V. The values of built-in voltage( $V_{bi}$ ) and carrier concentration(N) determined from the plot of $V_{bias}$ from the plot of $V_{bias}$ versus $E_{i}$$^{2}$ are 0.855 V and 3.83$\times$10$^{17}$ c $m^{-3}$ , respectively.ively.y.y.y.

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Competitive Growth of Carbon Nanotubes versus Carbon Nanofibers

  • Kim, Sung-Hoon
    • 한국세라믹학회지
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    • 제40권12호
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    • pp.1150-1153
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    • 2003
  • Carbon nanofilaments were formed on silicon substrate using microwave plasma-enhanced chemical vapor deposition method. The structures of carbon nanofilaments were identified as carbon nanotubes or carbon nanofibers. The formation of bamboo-like carbon nanotubes was initiated by the application of the bias voltage during the plasma reaction. The growth kinetics of bamboo-like carbon nanotubes increased with increasing the bias voltage. The growth direction of bamboo-like carbon nanotubes was vertical to the substrate.

Ku-Band Power Amplifier MMIC Chipset with On-Chip Active Gate Bias Circuit

  • Noh, Youn-Sub;Chang, Dong-Pil;Yom, In-Bok
    • ETRI Journal
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    • 제31권3호
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    • pp.247-253
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    • 2009
  • We propose a Ku-band driver and high-power amplifier monolithic microwave integrated circuits (MMICs) employing a compensating gate bias circuit using a commercial 0.5 ${\mu}m$ GaAs pHEMT technology. The integrated gate bias circuit provides compensation for the threshold voltage and temperature variations as well as independence of the supply voltage variations. A fabricated two-stage Ku-band driver amplifier MMIC exhibits a typical output power of 30.5 dBm and power-added efficiency (PAE) of 37% over a 13.5 GHz to 15.0 GHz frequency band, while a fabricated three-stage Ku-band high-power amplifier MMIC exhibits a maximum saturated output power of 39.25 dBm (8.4 W) and PAE of 22.7% at 14.5 GHz.

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