• 전기학회논문지
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• 제61권1호
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• pp.89-93
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• 2012

c-BN films were deposited on SKH-51 steels by electron assisted hot filament CVD method and microstructure development was studied processing parameters such as bias voltage, temperature, etching and phase transformation at boundary layer between BN compound and steel to develop a high performance wear resistance tools. A negative bias voltage higher than 200V at substrate temperature of $800^{\circ}C$ and gas pressure of 20 torr in B2H6-NH3-H2 gas system was one of optimum conditions to produce c-BN films on the SKH-51 steels. Thin layer of hexagonal boron nitride phase was observed at the interface between c-BN layer and substrate.

• 전기학회논문지
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• 제57권4호
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• pp.648-652
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• 2008

Corona discharge and ozone generation characteristics of a wire-plate plasma reactor, with a biased third electrode, have been investigated with an emphasis on the role of the bias voltage and frequency applied on the third electrode. It was found that the wire-plate plasma reactor, with the biased third electrode, had a switching characteristic on its I-V characteristics for negative and positive discharges, which is very different from that of a conventional wire-plate plasma reactor without the third electrode. As a result, the corona discharge and ozone generation characteristics of the proposed plasma reactor could be controlled by adjusting the bias voltage and frequency of the third electrode. The corona onset and breakdown voltages, and ozone generation and yield, were increased compared with those of without the third electrode. These, however, reveal the effectiveness of the biased third electrode.

• 대한전자공학회논문지TC
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• 제46권3호
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• pp.40-47
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• 2009

본 논문에서는 W-CDMA 기지국용 envelope tracking 전력 증폭기의 선형성 특성을 개선하는 새로운 드레인 바이어스 기법을 제안한다. 기존의 envelope tracking 전력 증폭기에서 드레인 바이어스 전압은 트랜지스터의 문턱전압 근처까지 감소하여 선형성 특성이 크게 나빠진다. 이 문제를 해결하기 위해서 본 연구에서는 입력 신호가 작을 때는 드레인 바이어스 전압이 고정된 class AB로 동작하게 하고 입력 신호가 클 때는 envelope tracking 동작을 하도록 하는 방법을 제안한다. 또한, envelope tracking 동작에서 신호의 왜곡을 줄이도록 드레인 바이어스 전압과 입력 신호의 관계를 새로이 구한다. 제안된 기법의 효과를 검증하기 위하여 class AB Si-LDMOS 전력 증폭기를 사용하여 W-CDMA envelope tracking 전력 증폭기를 설계하였다. 제안된 드레인 바이어스 기법은 평균 효율을 저하시키지 않으면서 선형성 특성을 크게 개선하여 추가의 선형화 기법 없이도 W-CDMA 기지국용 전력 증폭기의 선형성 사양을 만족시키는 것을 시뮬레이션을 통해 확인하였다.

• 한국표면공학회지
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• 제31권3호
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• pp.133-141
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• 1998

Stainless is widely used for various purposes due to its good corrosion resistance. There has been much research to produce the color stainless steel by several methods. In this experiment, TixN films have been deposited on the SUS304 substrate by the DC magnetron sputtering system and the color and texture of the films as a function of coating conditions has been studies. The TixN films showed a (111) preferred orintation in bias-free conditions. The texture of coated later was changed from (111) to (200) to (2200 with a change of the bias from -1000V to -3000V. When the bias is low, coated elements have low energy. Therefore, the texturct (111) of low surface energy. The mobility of atoms was increased with the increase of the blas and texture was changed to the other plane. Non-etched specimens all exhibited strong (111) texture. This result shows that (111) is a loose plane and of non-etched specimens all exhibited. High growing velocity of (111) of especially was main texture of Non-etched specimens. Low working pressure($4\times10^{-3}$torr) was more effective than figh working pressure ($6\times10^{-3}$torr) for the gold color of $Ti_xN$ film. L and b were increased and a was decreased with the increase of bias voltage. Accordingly, We obtained the near gold color of $Ti_xN$ film(L;92, a;1~1.5 b:24~29.50. As a result of reflectance. And as the bias increased, the reflectance was proportional to the increasing bias voltage, but we took the top reflectance when the bias voltage was -200V.

• 대한전자공학회논문지
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• 제27권8호
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• pp.1260-1264
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• 1990

A voltage controlled CMOS operational transconductance amplifier (OTA), whose transconductance is directly proportional to the DC bias voltage, has been designed for many electronic circuit applications. It consists of a differential pair and three ourrent mirrors. The SPICE simulation shows that the conversion sensitivity of the OTA is 41.817 \ulcornerho/V and the linearity error is less than 0.402% over a bias voltage range from -2. OV to 1. OV. Electrically tunalble filters based on voltage controlled impedances, which are realized with OTA's, also have been designed. The SPICE simulation shows that a second-order bandpass filter, whose center frequency is 23KHz at -1. OV, has the conversion sensitivity 6.6KHz/V and the linearity error less than 0.822% over a voltage range from -2.OV tp 1.OV, Tne OTA has been laid out with the 3\ulcorner n-well CMOS design rule adopted in ISRC (inter-university semiconductor research center). The chip size was about $0.756x0.945mm^2$.

• 한국세라믹학회지
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• 제40권10호
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• pp.921-924
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• 2003

A current-voltage relation for Positive Temperature Coefficient of Resistance (PTCR) ceramic was derived and compared with the experimental data. The new current-voltage relation was developed based on Heywangs double Schottky barrier model and a bias distribution across the grain boundary. The voltage limitation V < 4${\Phi}$$\sub$b/ suggested by Heywang is no longer necessary in the new expression for the voltage dependence of the resistance. The pulsed voltages were applied to the PTCR ceramic specimen in order to avoid possible temperature variation during the measurement.

• ETRI Journal
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• 제37권5호
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• pp.961-971
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• 2015

This paper proposes a 250 mV supply voltage digital low-dropout (LDO) regulator. The proposed LDO regulator reduces the supply voltage to 250 mV by implementing with all digital circuits in a$0.11{\mu}m$ CMOS process. The fast current tracking scheme achieves the fast settling time of the output voltage by eliminating the ringing problem. The over-voltage and under-voltage detection circuits decrease the overshoot and undershoot voltages by changing the switch array current rapidly. The switch bias circuit reduces the size of the current switch array to 1/3, which applies a forward body bias voltage at low supply voltage. The fabricated LDO regulator worked at 0.25 V to 1.2 V supply voltage. It achieved 250 mV supply voltage and 220 mV output voltage with 99.5% current efficiency and 8 mV ripple voltage at $20{\mu}A$ to $200{\mu}A$ load current.

• The Korean Journal of Ceramics
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• 제2권4호
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• pp.197-202
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• 1996

The highly oriented diamond particles were deposited on the mirror-polished (100) silicon substrates in the bell-jar type microwave plasma deposition system using a three-step process consisting if carburization, bias-enhanced nucleation and growth. By adjusting the geometry of the substrate and substrate holder, very dense disc-shaped plasma was formed over the substrate when the bias voltage was below -200V. Almsot perfectly oriented diamond films were obtained only in this dense disc-shaped plasma. From the results of the optical emission spectra of the dense disc-shaped plasma, it was found that the concentrations of atomic hydrogen and hydrocarbon radical were increased with negative bias voltage. It was also found that the highly oriented diamonds were deposited in the region, where the intensity ratios of carbonaceous species to atomic hydrogen are saturated.

• 한국전기전자재료학회논문지
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• 제24권5호
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• pp.364-369
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• 2011

Analyzing electrical degradation of polycrystalline silicon transistor to applicable at several environment is very important issue. In this research, after fabricating p channel poly crystalline silicon TFT (thin film transistor) electrical characteristics were compare and analized that changed by gate bias with first measurement. As a result on and off current was reduced by variation of gate bias and especially re duce ratio of off current was reduced by $7.1{\times}10^1$. On/off current ratio, threshold voltage and electron mobility increased. Also, when channel length gets shorter on/off current ratio was increased more and thresh old voltage increased less. It was cause due to electron trap and de-trap to gate silicon oxide by variation of gate bias.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.472-474
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• 1995

A Sputter ion Plating(SIP) system with a r.f. coil electrode and the Facing Target Sputter(FTS) source was designed for high-quality thin film formation. The rf discharge was combined with DC facing target sputtering in order to enhance ionization degree of a sputtered atoms. The energy of ions incident on the substrate depended on the health potential of DC biased substrate. The mean impact ion energy increased with negative bias voltage and rf power. The adhesive force of the TiN film formed was in the range of 30$\sim$50N, and markedly influenced by substrate bias voltage.