• 한국방사성폐기물학회:학술대회논문집
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• 한국방사성폐기물학회 2003년도 가을 학술논문집
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• pp.78-82
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• 2003

국내 원전에서 증기발생기 세정 후 발생되는 Fe-EDTA 함유 폐액 처리를 위한 초임계수 산화공정 (Supercritical Water Oxidation Process), 광촉매 산화 공정 (Photocatalyst Oxidation Process) 및 DBD 상온 플라즈마 공정 (Dielectric Barrier Discharge Atmospheric Pressure Plasma Process)이 평가되었다. 초임계수 산화 공정에 의해 99.98 %이상의 EDTA 전환율을 나타내어 EDTA 처리를 위한 효과적인 반응공정임을 확인하였으나 공정의 안정성, 부식 방지대책 등이 마련되어야 할 것으로 판단된다. 광촉매산화공정으로는 10 % 정도의 낮은 EDTA전환율을 보여 세정폐액 처리 공정으로는 부적합한 것으로 나타났다. DBD를 이용한 Methylene Blue 분해 결과 저 에너지 소비율로 높은 유기물 분해 효율을 얻을 수 있었으나 실 EDTA 공정에의 적용 및 공정 규모 확장 등에 대한 향후 연구 평가가 필요한 것으로 사료된다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 E
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• pp.2182-2185
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• 1999

In this experimental study we propose the double dielectric barrier discharge(DDBD) reactor to produce as high an electric field as possible. DDBD reactor is designed to remove $NO_x$ at atmospheric pressures from the moving pollution source such as diesel automobile DDBD reactor consisted of two cylinder glass tubes arranged so that the gas flow was directed between the two tubes. Inside of the inner tube was filled with small metal beads and outside of the inner tube was wounded with stainless wire to form the electrode. The outer tube was surrounded by an aluminum foil In this reactor there are three electrodes, i.e. metal bead(C), helical wire(I) and aluminum foil(0). By using DDBD reactor we will report some interesting results of treatment of the gas which is the dilute mixtures of NO in N2. And then we compared thee results with the results of cylinder-wire(CW) which is one of popularly used reactor in non-thermal plasma applications.

• 한국표면공학회지
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• 제44권2호
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• pp.50-54
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• 2011

Hydrophobic a-C:F film was coated on polycarbonate film with $CF_4$, $C_2F_6$ and HFC ($C_2F_4H_2$) gas in helium discharge generated by 5~100 kHz AC power supply at atmospheric pressure and room temperature. The highest water contact angle of the a-C:F film formed with $He/C_2F_6$ mixed gas is $155^{\circ}$. X-ray photoelectron spectrum showed that there was 40% of C-$CF_3$ bond at the surface of the super hydrophobic film. The contact angle and deposition rate were decreased with increasing substrate temperature. The contact angle was generally increased with the surface roughness of the film. The contact angle was high when the surface microstructure of the film was fine and sharp at the similar roughness and chemical composition of the surface.

• 한국표면공학회지
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• 제48권5호
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• pp.245-252
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• 2015

In recent years, the cleaning and activation technology of surfaces using atmospheric plasma as well as the deposition technology for coating using atmospheric plasma have been demonstrated conclusively and drawn increasing industrial attention. Especially, due to the simplicity, the technology using atmospheric plasma enhanced chemical vapor deposition has been widely studied from many researchers. The plasma source type commonly used as the stabilization of diffuse glow discharges for atmospheric pressure plasma enhanced chemical vapor deposition pressure is the dielectric barrier discharge. In this review paper, some kinds of modified dielectric barrier discharge type will be presented. And, the characteristics of silicon based compound such as SiOx and SiNx deposited using atmospheric plasma enhanced chemical vapor system will be discussed.

• 한국수산과학회지
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• 제55권6호
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• pp.910-916
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• 2022

The purpose of this study is to evaluate the effect of underwater non-thermal dielectric barrier discharge plasma (DBD plasma) on the sterilization of three types of pathogenic bacteria that cause diseases in freshwater fish and the reduction of a tetracycline antibiotics. This experiment was conducted in the DBD plasma generator, and the voltages used to generate plasma were 11.6 kV and 23.1 kV. The measurement intervals were 0, 1, 5, 10 and 15 min. As a result of DBD plasma treatment, Aeromonas hydrophila, Edwardsiella tarda and Pseudomonas fluorescens were removed 93-99% after 5 min at 23.1 kV, and the tetracycline antibiotics were reduced 70-95% after 15 min at 23.1 kV. In this study, as a result of treating the effluent with DBD plasma at a fish farm where the medicinal bath was conducted with oxytetracycline-HCl (OTC-HCl) products, OTC-HCl decreased by 62% after 10 min at 23.1 kV.

• 산업식품공학
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• 제15권4호
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• pp.398-403
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• 2011

비열살균기술로서 저온플라즈마 활용 가능성을 탐색하고자 유전체장벽 방전 플라즈마(DBDP)생성장치를 제작하여 최적 플라즈마생성 조건을 도출하고 Staphyloocus aureus를 대상으로 살균성능을 조사하였다. DBDP생성장치는 전력공급장치, 변압기, 전극, 시료처리부 등 네 부분으로 구성하였다. 인가전압은 단상 200 V AC를 사용하고, 변압기를 통하여 10.0-50.0 kV로 변환하고 10.0-50.0 kHz의 주파수의 펄스 구형파를 유전체인 세라믹 블록 내에 장치한 전극에 투입함으로써 상압에서 플라즈마를 생성하였다. 주파수를 올림에 따라 높은 전류가 유입되었고, 이에 비례하여 전력소비량이 증가하였다. 전류세기 1.0-2.0 A, 주파수32.0-35.3 kHz 범위에서 균일하고 안정적인 플라즈마 발생이 이루어졌으며 시료를 투입하지 않은 상태에서의 최적 전극간격은 1.85 mm 이었다. 전극간격을 높임에 따라 소비전력이 증가하였으나 시료 처리에 적합한 전극간격은 2.65 mm였다. DBDP 처리에 의한 온도상승은 최대 20$^{\circ}C$에 불과하여 열에 의한 생물학적 효과는 무시할 수 있었으며 따라서 비열기술임이 확인되었다. Staphyloocus aureus를 대상으로 DBDP 처리할 경우 초기 5분 동안은 살균치가 직선적인 증가를 보이다가 이후 다소 완만해지는 경향을 보였으며 1.25 A에서 10분간 처리 시 살균치는 5.0을 상회하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.583-585
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• 2002

The effects of phosphor properties such as the granular sizes and shape on the crosssectional shape of phosphor layer and plasma discharge characteristics for improving the luminance and luminous efficiency in ac PDP have been investigated. As the granular size decreases, the thickness of vertical side of barrier rib in blue cell decreases, and wheras the thickness of bottom side increases due to increased dispersibility. In addition, the phosphor with round granular shape showing good dispersibility shows better voltage margin and higher luminous efficiency due to their improved discharge volume and packing density.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.199-199
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• 2014

좁은 관경을 갖는 상대 유전율 3 이하인 PTFE와 PE 고분자 튜브 내부에 플라즈마 방전을 일으켜 고분자 튜브 표면 그래프팅 기술을 개발 하고자 하였다. 스텐트 및 인공혈관 등에 적용이 가능한 내부지름 3 mm 이하의 원통형 고분자 생체 식립체 내부 표면을 그래프팅하는 기술이다. 좁은 고분자 튜브 내부에 생성되는 방전은 고분자의 관경에 의해 방전개시 전압이 결정되었다. 방전개시 이후 DC glow discharge 에서 나타나는 전압과 전류의 특징들이 나타났다. 전압과 전류의 파형 분석에서는 고분자 표면과 가스 간의 새로운 용량성 임피던스가 형성되는 것을 관찰하였다. 고분자 내부 표면에 플라즈마의 방전 형태는 면 방전 (surface discharge)의 형태로 나타났다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권10호
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• pp.476-480
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• 2003

In this paper, we have performed 3-dimensional time-resolving measurement of the Ne light emitted from the cell of plasma display panel(PDP) as a function of the pressure using the scanned point detecting system. From the temporal behavior results, we could analyze the discharge behavior of panel with Ne-Xe(4%) mixing gas and 300 torr, 400 torr and 500 torr pressure. At the top view of panel, the discharge of 300 torr panel starts at the 634 ns and ends at the 722 ns. The emission duration time is about 90 ns. The discharge of 400 torr panel starts at the 682 ns and ends at the 786 ns. the emission duration time is about 100 ns. Also, the discharge of 500 torr panel starts at the 770 ns and ends at the 826 ns. the emission duration time is about 56 ns. The discharge moves from inner edge of cathode electrode to outer cathode electrode forming arc type. In the side view of 300 torr, 400 torr and 500 torr an emission shows that the light is detected up to 180${\mu}{\textrm}{m}$, 150${\mu}{\textrm}{m}$ and 70${\mu}{\textrm}{m}$ height of barrier rib and the emission distribution of the 300 torr is wider than 400 torr, 500 torr.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.552-552
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• 2013

In our study we consider Al2O3 ceramic substrates for Plasma Surface Treatments in order to improve deposited diamond surface and increase diamond deposition rate by applying DBD (Dielectric Barrier Dischrge) system. Because Plasma Surface Treatments was used as a modification method of material surface properties like surface free energy, wettability, and adhesion. By applying Plasma Surface Treatments diamond films are deposited on the Al2O3 ceramic substrates. DC Arc Plasmatron with mathane and hydrogen gases is used. Deposited diamond films are investigated by SEM (Scanning Electron Microscopy), AFM (Atomic Force Microscopy) and XRD (X-ray Diffractometer). Then the C-H stretching of synthetic diamond films by FTIR (Fourier Transform Infrared Spectroscopy) is studied. As a result, nanocrystalline diamond films were identified by using SEM and diamond properties in XRD peaks at (111, $43.8{\Box}$, (220, $75.3{\Box}$ and (311, $90.4{\Box}$ were shown. Absorption peaks in FTIR spectrum, caused by CHx sp3 bond stretching of CVD diamond films, were identified as well. Finally, we improved such parameters as depostion rate ($2.3{\mu}m$/h), diamond surface uniformity, and impurities level by applying Plasma Surface Treatments. These experimental results show the importance of Plasma Surface Treatments for diamond deposition by a plasma source.