• Title/Summary/Keyword: ZnO:Ga film

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Electrical and Optical Properties of the GZO Transparent Conducting Layer Prepared by Magnetron Sputtering Technique (마그네트론 스퍼터링법으로 제작된 GZO 투명전도막의 전기적 및 광학적 특성)

  • No, Im-Jun;Kim, Sung-Hyun;Shin, Paik-Kyun;Lee, Kyung-Il;Kim, Sun-Min;Cho, Jin-Woo
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.24 no.4
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    • pp.110-115
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    • 2010
  • Transparent conducting gallium-doped zinc oxide (GZO) thin films which were deposited on Corning glass substrate using an Gun-type rf magnetron sputtering deposition technology. The GZO thin films were fabricated with an GZO ceramic target (Zn : 97[wt%], $Ga_2O_3$ : 3[wt%]). The GZO thin films were deposited by varying the growth conditions such as the substrate temperature, oxygen pressure. Among the GZO thin films fabricated in this study, the one formed at conditions of the substrate temperature of 200[$^{\circ}C$], Ar flow rate of 50[sccm], $O_2$ flow rate of 5[sccm], rf power of 80[W] and working pressure of 5[mtorr] showed the best properties of an electrical resistivity of $2.536{\times}10^{-4}[{\Omega}{\cdot}cm]$, a carrier concentration of $7.746{\times}10^{20}[cm^{-3}]$, and a carrier mobility of 31.77[$cm^2/V{\cdot}S$], which indicates that it could be used as a transparent electrode for thin film transistor and flat panel display applications.

Effect of Electrolyte-Additives on the Performance of Al-Air Cells (전해질 첨가제가 알루미늄-공기전지의 성능에 미치는 영향)

  • Park, Gwun Pil;Chun, Hai Soo
    • Applied Chemistry for Engineering
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    • v.9 no.1
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    • pp.52-57
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    • 1998
  • The effects of additives such as zinc compounds in 4M KOH electrolyte of Al-air cell have been studied. Zinc compounds in electrolyte increased hydrogen evolution overpotential and TPC(tripotasium citrate)/CaO formed fine film on aluminum surface, and these additives decreased hydrogen evolution rate and corrosion rate of aluminum. These additives shifted the OCP in the positive direction on high purity aluminum(purity, 99.999%) and in the negative direction on Al No 1050(purity,99.5%). Addition of two or more additives resulted in the prevention or the reduction of corrosion rate and hydrogen evolution at OCP. As the overpotential on Al electrode increased, the hydrogen evolution rate decreased and the utilization of aluminum increased. At high current density$(>100mA/cm^2)$, TPC/CaO/ZnO additives increased the utilization of high purity aluminum up to that of aluminum alloys containing indium, gallium and thallium.

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Study of large-area CIGS thin film solar cell (CIGS 박막 태양전지의 대면적화 연구)

  • Kim, Chae-Woong;Kim, Dae-Sung;Kim, Tae-Sung;Kim, Jin-Hyeok
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.11a
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    • pp.399-399
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    • 2009
  • CIS계 화합물 태양전지는 높은 광흡수계수와 열적 안정성 및 Ga 조성 조절을 통한 밴드갭 조절이 용이해 고효율 박막 태양전지로 각광 받고 있다. CIS 태양전지의 광 흡수층 제조 방법으로는 여러 가지 방법이 있지만 본 연구에서는 가장 높은 에너지 변환 효율을 달성한 Co-Evaporation 방법을 사용하기로 하였다. 미국의 NREL의 경우 Co-Evaporation 방법을 사용해 20%의 에너지 변환 효율을 달성한 바가 있다. 하지만 이러한 효율의 태양전지는 실험실에서 연구용으로 제작한 아주 작은 면적으로 태양전지 양산화에 그대로 적용하기는 힘들다. 따라서 CIGS 태양전지의 양산화 적용을 위해 대면적화가 필수적이다. 본 연구에서는 기존의 3 stage 방식을 이용해 광흡수층을 증착하여 최적화 조건을 연구하였다. 또한 기판의 면적 증가에 따라 효율과 Voc, Jsc, F.F가 얼마나 감소하는지 실험하여 보았다. 기판은 soda lime glass를 사용 하였으며 후면 전극으로 약$1{\mu}m$ 두께의 Mo를 DC Supptering 방법을 이용해 증착하였다. 다음으로 약 $2{\mu}m$이상의 광흡수층을 Co-Evaporation 방법을 이용하여 증착 하였으며 buffer층으로는 약 50nm의 CdS층을 CBD방법을 이용하여 제조 하였다. TCO층으로 약 50nm의 i-ZnO와 약 450nm의 Al-ZnO를 RF Sputtering 방법을 이용하여 증착 하였다. 마지막으로 앞면 전극으로 약 $3{\mu}m$의 Al을 Thermal Evaporation 방법으로 증착하였다. 태양전지 소자의 면적은 $0.49cm^2$, $25cm^2$, $100cm^2$로 각각 면적을 달리하며 효율을 비교 분석하였다.

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Metal Oxide Thin Film Transistor with Porous Silver Nanowire Top Gate Electrode for Label-Free Bio-Relevant Molecules Detection

  • Yu, Tae-Hui;Kim, Jeong-Hyeok;Sang, Byeong-In;Choe, Won-Guk;Hwang, Do-Gyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.268-268
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    • 2016
  • Chemical sensors have attracted much attention due to their various applications such as agriculture product, cosmetic and pharmaceutical components and clinical control. A conventional chemical and biological sensor is consists of fluorescent dye, optical light sources, and photodetector to quantify the extent of concentration. Such complicated system leads to rising cost and slow response time. Until now, the most contemporary thin film transistors (TFTs) are used in the field of flat panel display technology for switching device. Some papers have reported that an interesting alternative to flat panel display technology is chemical sensor technology. Recent advances in chemical detection study for using TFTs, benefits from overwhelming progress made in organic thin film transistors (OTFTs) electronic, have been studied alternative to current optical detection system. However numerous problems still remain especially the long-term stability and lack of reliability. On the other hand, the utilization of metal oxide transistor technology in chemical sensors is substantially promising owing to many advantages such as outstanding electrical performance, flexible device, and transparency. The top-gate structure transistor indicated long-term atmosphere stability and reliability because insulator layer is deposited on the top of semiconductor layer, as an effective mechanical and chemical protection. We report on the fabrication of InGaZnO TFTs with silver nanowire as the top gate electrode for the aim of chemical materials detection by monitoring change of electrical properties. We demonstrated that the improved sensitivity characteristics are related to the employment of a unique combination of nano materials. The silver nanowire top-gate InGaZnO TFTs used in this study features the following advantages: i) high sensitivity, ii) long-term stability in atmosphere and buffer solution iii) no necessary additional electrode and iv) simple fabrication process by spray.

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Sputtered ZTO as a blocking layer at conducting glass and $TiO_2$ Interfaces in Dye-Sensitized Solar Cells (GZO/ZTO 투명전극을 이용한 DSSC의 광전 변환 효율 특성)

  • Park, Jaeho;Lee, Kyungju;Song, Sangwoo;Jo, Seulki;Moon, Byungmoo
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.53.2-53.2
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    • 2011
  • Dye-sensitized solar cells(DSSCs) have been recognized as an alternative to the conventional p-n junction solar cells because of their simple fabrication process, low production cost, and transparency. A typical DSSC consists of a transparent conductive oxide (TCO) electrode, a dye-sensitized oxide semiconductor nanoparticle layer, liquid redox electrolyte, and a Pt-counter electrode. In dye-sensitized solar cells, charge recombination processes at interfaces between coducting glass, $TiO_2$, dye, and electrolyte play an important role in limiting the photon-to-electron conversion efficiency. A layer of ZTO thin film less than ~200nm in thickness, as a blocking layer, was deposited by DC magnetron sputtering method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells(DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte ($I^-/I_3^-$). The presented DSCs were fabricated with working electrode of Ga-doped ZnO glass coated with blocking ZTO layer, dye-attached nanoporous $TiO_2$ layer, gel electrolyte and counter electrode of Pt-deposited GZO glass. The effects of blocking layer were studied with respect to impedance and conversion efficiency of the cells.

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Research Trends for Improvement of NBIS Instability in Amorphous In-Ga-ZnO Based Thin-Film Transistors (비정질 인듐-갈륨-아연 산화물 기반 박막 트랜지스터의 NBIS 불안정성 개선을 위한 연구동향)

  • Yoon, Geonju;Park, Jinsu;Kim, Jaemin;Cho, Jaehyun;Bae, Sangwoo;Kim, Jinseok;Kim, Hyun-Hoo;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.371-375
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    • 2019
  • Developing a thin-film transistor with characteristics such as a large area, high mobility, and high reliability are key elements required for the next generation on displays. In this paper, we have investigated the research trends related to improving the reliability of oxide-semiconductor-based thin-film transistors, which are the primary focus of study in the field of optical displays. It has been reported that thermal treatment in a high-pressure oxygen atmosphere reduces the threshold voltage shift from -7.1 V to -1.9 V under NBIS. Additionally, a device with a $SiO_2/Si_3N_4$ dual-structure has a lower threshold voltage (-0.82 V) under NBIS than a single-gate-insulator-based device (-11.6 V). The dual channel structure with different oxygen partial pressures was also confirmed to have a stable threshold voltage under NBIS. These can be considered for further study to improve the NBIS problem.

Selenization of CIG Precursors Using RTP Method with Se Cracker Cell

  • Kang, Young-Jin;Song, Hye-Jin;Cho, You-Suk;Yoon, Jong-Man;Jung, Yong-Deuk;Cho, Dea-Hyung;Kim, Ju-Hee;Park, Su-Jung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.426-426
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    • 2012
  • The CIGS absorber has outstanding advantages in the absorption coefficient and conversation efficiency. The CIGS thin film solar cells have been researched for commercialization and increasing the conversion efficiency. CIG precursors were deposited on the Mo coated glass substrate by magnetron sputtering with multilayer structure, which is CuIn/CuGa/CuIn/CuGa. Then, the metallic precursors were selenized under high Se pressure by RTP method which included. Se vapor was supplied using Se cracker cell instead of toxic hydrogen selenide gas. Se beam flux was controlled by variable reservoir zone (R-zone) temperature during selenization process. Cracked Se source reacted with CIG precursors in a small quantity of Se because of small size molecules with high activation energy. The CIGS thin films were studied by FESEM, EDX, and XRD. The CIGS solar cell was also developed by layering of CdS and ZnO layers. And the conversion efficiency of the CIGS solar cell was characterization. It was reached at 6.99% without AR layer.

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박막 트랜지스터 채널용 IGZO 박막의 제작

  • Kim, Dae-Hyeon;Kim, Sang-Mo;Choe, Hyeong-Uk;Choe, Yeong-Gyu;Kim, Gyeong-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.137-137
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    • 2009
  • Indium Gallium Zinc Oxide (IGZO) thin films for TFT channel were prepared by using a Facing Target Sputtering (FTS) system. To investigate the effect of oxygen on the optical and the electrical properties of amorphous InGaZnO(a-IGZO), we prepared thin films by FTS system in various oxygen atmospheres at room temperature. As-deposited IZTO thin films were investigated by using a UV/VIS spectrometer, an X-ray diffractometer, a Hall Effect measurement system, and an atomic force microscope. The quantitative analysis of the films was carried out by using the energy dispersive X-ray (EDX) technique for the as-deposited film.

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Optoelectrical properties of IGZO/Cu bi-layered films deposited with DC and RF magnetron sputtering

  • joo, Moon hyun;hyun, Oh-jung;Son, Dong-Il;Kim, Daeil
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.178.2-178.2
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    • 2015
  • In and Ga doped ZnO (IGZO) films were deposited on 5 nm thick Cu film buffered Polycarbonate (PC) substrates with RF magnetron sputtering and then the effect of Cu buffer layer on the optical and electrical properties of the films was investigated. While IGZO single layer films show the electrical resistivity of $1.2{\times}10-1{\Omega}cm$, IGZO/Cu bi-layered films show a lower resistivity of $1.6{\times}10-3{\Omega}cm$. Although the optical transmittance of the films in a visible wave length range is deteriorated by Cu buffer layer, IGZO films with 5 nm thick Cu buffer layer show the higher figure of merit of $2.6{\times}10-4{\Omega}-1$ than that of the IGZO single layer films due to the enhanced opto-electrical performance of the IGZO/Cu bi-layered films.

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증착공정에서 산소유량 제어에 따른 박막 특성 연구

  • Jo, Tae-Hun;Park, Hye-Jin;Yun, Myeong-Su;Gwon, Gi-Cheong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.266.1-266.1
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    • 2014
  • 반도체 및 디스플레이 등의 산업 중 증착공정에서 TCO 등 산화막의(oxide thin film) 중요성은 날로 대두되고 있다. 특히 정밀한 막질을 원하는 공정에서 산소(Oxygen)유량의 차이로 인한 생성된 막질의 변화가 크다. 이로 인하여 여러 연구실에서 다양한 연구가 활발하게 진행중에 있다. 특히 최근 IGZO (In-Ga-ZnO)가 이슈가 되면서 더 다양하게 연구가 진행중이다. 그러나 공정 장비의 노화나 증착공정중장비(Chamber)내부의 미세한 변화가 많아 산소와 공정 기체의 비가 틀어지는 경우가 있고 이를 제어하기는 쉽지 않은 실정이다. 본 연구에서는 먼저 ITO (Indium Tin Oxide)타겟을 통해 스퍼터장비에서 일반적인 공정을 진행한 박막과, 제작된 유량 제어 시스템을 통하여 공정을 진행한 박막을 만들었다. 이를 통해 박막의 차이점을 분석하고 증착공정중 발생하는 플라즈마의 분석도 진행하여 공정의 제어가 가능함을 확인하였다.

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