• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.221-223
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• 1999

In this work, samples were manufactured variously by changing conventional calcining and sintering conditions and we tried the utilization by making the heat treatment time, which is demanded to high-Tc phase formation, much shorter. We found out optimal heat treatment conditions with the analysis on formation process at superconducting phase in term of the change of calcining and sintering time and then, examined X-ray diffraction(XRD) patterns, scanning electron microscope(SEM) measurement and energy dispersive X-ray spectrometer(EDX) of the samples manufactured under heat treatment conditions which we suggest here. As a result, 2223 high-$T_c$, phase of (Bi,Pb)SrCaCuO superconductor starting with ($Bi_l$ xPbx,)$_2$$Sr_2$$Ca_2$$Cu_3$$O_y$, composition was formed from 1 hr sintering sample at temperature nearby melting point and also the completed sample with calcining and sintering time of 9 hr was formed high-$T_c$.low-$T_c$ phase appearing in sight above the critical temperature of liquid $N_2$.

• 한국재료학회지
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• 제12권11호
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• pp.875-879
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• 2002

$Pb_{1-x}$ $Cd_{x}$ $I_2$ (x=0.0, 0.2, 0.5, 0.7, 0.9, 1.0) single crystals were grown by using Bridgman method and their structural and optical properties were investigated from the measurement of X-ray diffraction, optical absorption and photoluminescence. As-grown single crystals have hexagonal closed packed layered structure. The values of lattice constant c decrease with increasing composition x. Direct and indirect transition optical energy band gaps are calculated from optical absorption spectra measured at room temperature. They increase exponentially from 2.3eV to 3.2 eV with increasing composition x. The energies of photoluminescence peak due to donor bound exciton measured at 6K increase with increasing composition . However, the peak energies of donor-acceptor pair (DAP) are independent of the optical energy band gaps of $Pb_{1-x}$/$Cd_{x}$ $I_2$ single crystals.

• Electronic Materials Letters
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• 제14권6호
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• pp.669-677
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• 2018

In this work, the high ${\kappa}$ $Zr_xAl_{1-x}O_y$ films with a different Zr concentration have been deposited by atomic layer deposition, and the effect of Zr concentrations on the structure, chemical composition, surface morphology and dielectric properties of $Zr_xAl_{1-x}O_y$ films is analyzed by Atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and capacitance-frequency measurement. The effect of Zr concentrations of $Zr_xAl_{1-x}O_y$ gate insulator on the electrical property and stability under negative bias illumination stress (NBIS) or temperature stress (TS) of ZnSnO (ZTO) TFTs is firstly investigated. Under NBIS and TS, the much better stability of ZTO TFTs with $Zr_xAl_{1-x}O_y$ film as a gate insulator is due to the suppression of oxygen vacancy in ZTO channel layer and the decreased trap states originating from the Zr atom permeation at the $ZTO/Zr_xAl_{1-x}O_y$ interface. It provides a new strategy to fabricate the low consumption and high stability ZTO TFTs for application.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1010-1014
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• 2004

High quality GaN layer and $In_xGa_{1-x}N$ alloy were obtained on (0001)sapphire substrate using ammonia$(NH_3)$ and dimethylhydrazine$(DMH_y)$ as a nitrogen source by gas source molecular hem epitaxy(GSMBE) respectively. As a result, RHEED is used to investigate the relaxation processes which take place during the growth of GaN and $In_xGa_{1-x}N$. The full Width at half maximum of the x-ray diffraction(FWHM) rocking curve measured from Plane of GaN has exhibitted as narrow as 8 arcmin. Photoluminescence measurement of GaN and $In_xGa_{1-x}N$ were investigated at room temperature, where the intensity of the band edge emission is much stronger than that of deep level emission. In content of $In_xGa_{1-x}N$ epitaxial layer according to growth condition was investigated.

• Progress in Superconductivity
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• 제4권2호
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• pp.144-147
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• 2003

We investigated superconducting property of ($Mg_{1-x}$$Zn_{x}$)$CNi_3$ (x=0,0.03, 0.06, 0.09, 0.12, 0.15, and 0.18) sample where Mg is substituted with Zn. The samples were synthesized us ins the solid state reaction method under As atmosphere. X -ray diffraction spectra show that the $MgCNi_3$ structure is maintained up to x=18. With increasing x, the lattice constant (or the Ni-Ni distance) decreases. Magnetic susceptibility measurement shows that $T_{c}$ decreases systematically with x and becomes ～2K at x =0.18. Surprisingly, the transition width remains sharp (～0.3K). Under some assumptions, we estimate the coupling constant in the McMillan formula as a function of x which we interpret in terms of the BCS theory.y.y.y.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.124-127
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• 2003

The stochiometric $AgGaSe_2$ polycrystalline mixture of evaporating materials for the $AgGaSe_2$ single crystal thin film was prepared from horizontal furnance. To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal and semi-insulating GaAs(100) wafer were used as source material and substrate for the Hot Wall Epitaxy (HWE) system, respectively. The source and substrate temperature were fixed at $630^{\circ}C$ and $420^{\circ}C$, respectively. The thickness of grown single crystal thin films is $2.1{\mu}m$. The single crystal thin films were investigated by photoluminescence and double crystal X-ray diffraction(DCXD) measurement. From the photoluminescence measurement of $AgGaSe_2$ single crystal thin film, we observed free excition ($E_x$) observable only in high quality crystal and neutral bound excition ($D^{\circ}$,X) having very strong peak intensity. And, the full width at half maximum and binding energy of neutral donor bound excition were 8 meV and 14.1 meV, respectively. By Haynes rule, an activation energy of impurity was 141 meV.

• 공업화학
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• 제17권5호
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• pp.471-475
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• 2006

$VO_x$ 박막이 상온에서 $Pt/Ti/SiO_{2}/Si$ 기판위에 반응성 radio frequency (rf) 마그네트론 스퍼터링 방법에 의하여 450 nm 두께로 증착되었다. 증착 공정에서 산소의 농도와 타겟에 인가되는 rf power를 변수로 설정하여 증착 속도를 조사하였다. $VO_x$ 박막의 증착속도는 산소 농도가 증가함에 따라서 감소하고, rf power가 증가할수록 증가하는 것이 관찰되었다. 증착된 $VO_x$ 박막은 $O_{2}$와 $N_{2}$ 가스 분위기에서 $450^{\circ}C$의 온도로 2, 4, 그리고 6 h 동안 각각 열처리 되었고, 열처리 과정을 진행한 후 x-ray diffraction (XRD) 분석을 이용하여 열처리 전과 후의 결정성 변화를 관찰하였다. 그리고 열처리 전과 후의 $VO_x$ 박막의 표면과 단면을 field emission scanning electron microscopy (FESEM)를 이용하여 관찰하였으며 전류-전압 측정을 이용하여, 증착된 $VO_x$ 박막의 metal-insulator transition (MIT) 특성을 관찰하였다. $N_{2}$ 분위기에서 열처리된 $VO_x$ 박막보다 $O_{2}$ 분위기에서 열처리된 $VO_x$ 박막에서 더 우수한 MIT 특성을 관찰 할 수 있었다.

• 대한화학회지
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• 제40권5호
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• pp.295-301
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• 1996

$CaGa_1-xFexO_3-y$계의 x=0.25, 0.50, 0.75 및 1.00에 해당하는 고용체를 $1150^{\circ}C$, 대기압하에서 제조하였다. X-선 회절분석, Mohr염 정정, Mossbauer 분광분석을 수행하여 합성된 고용체들의 구조, 비화학량론적 화학식 및 양이온들의 분포를 결정한 후 전기전도도와 자기측정을 수행하여 물성에 관한 논의를 하였다. X-선 회절분석으로부터 얻은 모든 조성의 결정계는 브라운밀러릿 사방정계이다. 환산 격자부피는 단위세포의 차원이 다른 X=0.25의 조성을 제외하고 x값이 증가함에 따라 직선성을 가지고 증가한다. Mohr염분석 결과 고용체들은 $Fe^{4+}$ 이온을 포함하지 않고 산소공위의 몰수인 y값은 0.50으로 고정된 값을 가진다. Mossbauer 분광분석으로부터 Fe 이온의 산화상태, 배위상태, 브라운밀러릿 구조 및 $Ga^{3+}$와 $Fe^{3+}$ 이온의 분포를 논의하였다. 전기전도도와 활성화에너지는 x값이 증가함에 따라 각각 증가와 감소하고 이들로부터 전자 전기전도 메커니즘을 제안한다. x=0.50~1.00의 조성을 냉각하면서 자기측정을 수행할 때 열적 자기 히스테리시스가 나타나며 이러한 현상을 공간군과 Dzyaloshinsky-Moriya 상호작용을 기초로 논의하였다.

• 한국진공학회지
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• 제5권1호
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• pp.62-66
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• 1996

$(Ba_{1-x}Sr_xTiO_3$ (BST) thin films have been grown on Pt-coated MgO by metal -organic chemical vapor deposition. X-ray diffraction results showed that BST films were grown on a Pt/MgO substrate with (100) preferred orientation perpendicular to the surface. The lineawr relationship of P-E curve obtained form hysteresis loop measurement indicated that the BST films had a Curie transitions below room temperature . Films deposited at $900^{\circ}C$ exhibited a smooth and dense microstructure, a dielectric constant of 202, and a dissipation facotr of 0.02 at 100kHz. The leakage current density of the BST films is about $2\times10^{-10} \;A/\textrm{cm}^2$$ at an applied electric field of 0.2 MV/cm. The electrical behavior on the current-voltage characteristics is well explained by the bulk-limited Pool-Frenkel emission.

• 한국광학회지
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• 제11권1호
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• pp.13-18
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• 2000

Si(100) 위에 RF 스퍼터링법으로 SiOxNy 박막을 제작하였다. 제작 조건은 반응 가스 비율에 따른 증착율과 RF 출력으로 하였다. XRD, XPS, n&k analyzer 그리고 FTIR로 SiOxNy 박막의 특성을 조사하였다. XRD 측정결과 ${SiO_x}{N_y}$ 박막은 비정질이었으며, XPS와 n&k analyzer 측정 결과 ${SiO_x}{N_y}$ 박막의 질소성분이 증가할수록 굴절률은 증가함을 알 수 있었다.