• Journal of the Optical Society of Korea
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• 제13권3호
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• pp.330-334
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• 2009

A simple and compact frequency swept laser is demonstrated at $1.3{\mu}m$ using a wavelength scanning filter based on a rotating slit disk. The laser is comprised of a pigtailed semiconductor optical amplifier, a circulator, and a wavelength scanning filter in an extended cavity configuration. The wavelength scanning filter is composed of a collimator, a diffraction grating, a rotating slit disk, and a mirror. The instantaneous laser output power is more than 5 mW. The scanning range of the laser is extended to 80 nm at the maximum level, and 55 nm in the full width at half maximum at a scanning rate of 2 kHz.

• 한국광학회지
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• 제25권2호
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• pp.61-66
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• 2014

본 논문에서는 두 개의 반도체 광 증폭기 (SOA)와 다면체 거울 스캐닝 파장 필터를 이용한 파장 훑음 레이저의 특성을 보고한다. 파장 훑음 레이저의 출력 세기 및 파장 훑음 범위는 레이저 공진기에서 두 개의 SOA와 출력 광 커플러의 위치 및 커플링 비율에 의존한다. 본 연구에서는 크게 두 가지 광 배열에 대해 출력 광 커플러의 커플링 비율을 10%, 30%, 50%, 70%, 90%로 바꾸어 가면서 파장 훑음 속도에 따른 파장 훑음 범위와 광 출력을 비교 분석하였다. 두 SOA 사이에 광 커플러를 둔 최적화된 배열에서 비교적 높은 출력과 넓은 파장 훑음 범위를 얻을 수 있었다. 이 배열에서는 출력 광 커플러의 커플링 비율이 증가함에 따라 광 출력도 증가하는 것을 볼 수 있었다. 이러한 결과는 다면체 거울 스캐닝 필터를 이용하여 파장 훑음 레이저를 제작할 때 최적의 레이저 공진기 구성에 많은 도움이 될 것으로 기대한다.

• 한국광학회지
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• 제27권1호
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• pp.32-40
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• 2016

광학계의 특성은 파장과 온도에 따라 변화한다. 이 연구에서는 얇은 렌즈 근사를 이용하여 특정한 기준파장과 기준온도에서 파장과 온도변화에 안정한 광학계를 설계하는 방법에 대하여 연구하고, 이를 기반으로 2매의 렌즈로 구성된 레이저 주사광학계를 설계하였다. 설계된 레이저 주사광학계는 기대한 바와 같이 파장과 온도 변화에 따른 유효초점거리의 변화가 매우 적음을 확인 할 수 있었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.863-864
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• 2011

• 한국광학회지
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• 제20권3호
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• pp.189-194
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• 2009

광섬유 일체형으로 된 파브리-페롯 가변 필터를 레이저 공진기에 삽입하고, 1300 nm 대역의 반도체 광 증폭기를 이득매질로 이용하여 링 공진기 형태의 파장 훑음 레이저를 구현하였다. 파장 훑음 레이저의 훑음 주파수에 따른 레이저 출력 특성을 시간영역과 파장영역에서 분석하였다. 파장 훑음 주파수가 증가하면 레이저 출력이 급격하게 줄어들고, 훑음 반치폭도 감소한다. 또한 훑음 주파수 증가에 따라 전방 훑음과 후방 훑음의 광 세기가 비대칭으로 나타나며, 실제 응용 시스템에 적용할 수 있는 제한요소로 작용한다.

• 제어로봇시스템학회논문지
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• 제9권7호
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• pp.507-514
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• 2003

Inspection and shape measurement of three-dimensional objects are widely needed in industries for quality monitoring and control. Recently the shape measurement using interferometric principle is found to be a successful methodology among other visual or optical technologies. Especially, the measuring method using wavelength scanning interferometer(WSI) has a great advantage in comparison with other conventional jnterferometric methods in that the absolute distance from the reference surface can be directly obtained from the amount of jnterferometric phase change. However, the measurement methods using WSI proposed by other researchers have low measurement resolution so far because they can't measure fractional phase change. To avoid this shortcoming we propose a new algorithm in this paper, which can obtain a small amount of even fractional phase change by sinusoidal function fitting. To evaluate the effectiveness of the proposed sinusoidal function fitting algorithm, a series of measuring experiments are conducted for discontinuously shaped specimens which have various height. The proposed algorithm shows much more enhanced measurement resolution than other existing conventional algorithms such as zero crossing algorithm and Fourier transform algorithm.

• Current Optics and Photonics
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• 제5권3호
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• pp.229-237
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• 2021

The capabilities of the near-field scanning optical microscope (NSOM) for obtaining high resolution lateral topographical images as well as for mapping the spectroscopic and optical properties of a sample below the diffraction limit of light have made it an attractive research field for most researchers dealing with optical characteristics of materials in nano scales. The apertured NSOM technique involves confining light into an aperture of sub-wavelength size and using it to illuminate a sample maintained at a distance equal to a fraction of the sub-wavelength aperture (near-field region). In this article, we present a setup for developing NSOM using a cantilever with a sub-wavelength aperture at the tip. A single laser is used for both cantilever deflection measurement and near-field sample excitation. The laser beam is focused at the apex of the cantilever where a portion of the beam is reflected and the other portion goes through the aperture and causes local near-field optical excitation of the sample, which is then raster scanned in the near-field region. The reflected beam is used for an optical beam deflection technique that yields topographical images by controlling the probe-sample in nano-distance. The fluorescence emissions signal is detected in far-field by the help of a silicon avalanche photodiode. The images obtained using this method show a good correlation between the topographical image and the mapping of the fluorescence emissions.

• Bulletin of the Korean Chemical Society
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• 제25권6호
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• pp.801-805
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• 2004

In this work, the fundamental study of on-line monitoring of $SiO_2$ particles in the size range of 40 nm to 725 nm was carried out using turbidimetry. The size of particle was measured using a field emission scanning electron microscope (FE-SEM). The factors affecting on the turbidity were discussed, for example, wavelength, size, and concentration. In order to observe the dependence of turbidity on the wavelength, a turbidimetric system equipped with charged coupled detector (CCD) was built. The shape of the transmitted peak was changed and the peak maximum was shifted to the red when the concentration of particle was increased. This result indicates that the turbidity is related to the wavelength, which corresponds to the characteristic of the Mie extinction coefficient, Q, that is a function of not only particle diameter and refractive index but also wavelength. It is clear that a linear calibration curve for each particle in different size can be obtained at an optimized wavelength.

• 대한기계학회논문집A
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• 제28권9호
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• pp.1270-1275
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• 2004

Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

• The Journal of the Acoustical Society of Korea
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• 제15권1E호
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• pp.70-76
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• 1996

We proposed to use shear waves instead of longitudinal waves in a STAM (scanning tomographic acoustic microscope system) in which the specimens are solid. For any specimen with a shear modulus, mode conversion will take place at the water-solid interface. Some of the energy of the insonifying longitudinal waves in the water will convert to shear wave energy within the specimen. The shear wave energy is detectable and can be used for tomographic reconstruction. The resolution limitation of STAM depends on the available angular view and the acoustic wavelength. While wave transmission in most solid specimens is limited to about 20°for longitudinal waves, we show that it is about twice that high for shear waves. Since the wavelength of the shear wave is shorter than that of the longitudinal wave, we are able to achieve the high resolution. In order to compare the operation of a shear-wave STAM with that of the conventional longitudinal-wave STAM we have simulated tomographic reconstruction for each. Our simulation results with aluminum specimen and back-and-forth propagation algorithm showed resolution of a shear-wave STAM is better than that of a longitudinal-wave STAM.