• Corrosion Science and Technology
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• 제19권1호
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• pp.8-15
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• 2020

In this paper, the efficiency and the inhibition mechanisms of cobalt salts (cobalt nitrate and cobalt-exchange silica Co/Si) for the corrosion protection of AA2024 were investigated in a neutral aqueous solution by using the electrochemical impedance spectroscopy (EIS) and polarization curves. The experimental measurements suggest that cobalt cation plays a role as a cathodic inhibitor. The efficiency of cobalt cation was important at the concentration range from 0.001 to 0.01 M. The formation of precipitates of oxides/hydroxides of cobalt on the surface at low inhibitor concentration was confirmed by the Scanning Electron Microscopy/Energy Dispersive X-Ray Spectroscopy (SEM/EDS) analysis. EIS measurements were also conducted for the AA2024 surface covered by water-based epoxy coating comprising Co/Si salt. The results obtained from exposure in the electrolyte demonstrated the improvement of the barrier and inhibition properties of the coating exposed in the electrolyte solution for a lengthy time. The SEM/EDS analysis in artificial scribes of the coating after salt spray testing revealed the release of cobalt cations in the coating defect to induce the barrier layer on the exposed AA2024 substrate.

• 한국전기전자재료학회논문지
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• 제19권1호
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• pp.71-74
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• 2006

In this paper, we investigated the characterization of silicon oxide(SiOx) thin film on Ethylene Terephthalate(PET) substrates by e-beam deposition for transparent barrier application. The temperature of chamber increases from $30^{\circ}C$ to $110^{\circ}C$, the roughness increase while the Water vapor transmission rate (WVTR) decreases. Under these conditions, the WVTR for PET can be reduced from a level of $0.57 g/m^2/day$ (bare subtrate) to $0.05 g/m^2/day$ after application of a 200-nm-thick $SiO_2$ coating at 110 C. A more efficient way to improve permeation of PET was carried out by using a double side coating of a 5-${\mu}m$-thick parylene film. It was found that the WVTR can be reduced to a level of $-0.2 g/m^2/day$. The double side parylene coating on PET could contribute to the lower stress of oxide film, which greatly improves the WVTR data. These results indicates that the $SiO_2$ /Parylene/PET barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

• 한국표면공학회지
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• 제44권2호
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• pp.50-54
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• 2011

Hydrophobic a-C:F film was coated on polycarbonate film with $CF_4$, $C_2F_6$ and HFC ($C_2F_4H_2$) gas in helium discharge generated by 5~100 kHz AC power supply at atmospheric pressure and room temperature. The highest water contact angle of the a-C:F film formed with $He/C_2F_6$ mixed gas is $155^{\circ}$. X-ray photoelectron spectrum showed that there was 40% of C-$CF_3$ bond at the surface of the super hydrophobic film. The contact angle and deposition rate were decreased with increasing substrate temperature. The contact angle was generally increased with the surface roughness of the film. The contact angle was high when the surface microstructure of the film was fine and sharp at the similar roughness and chemical composition of the surface.

• Journal of Ceramic Processing Research
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• 제13권spc1호
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• pp.140-144
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• 2012

Ga-doped ZnO (GZO) was a limit of application on the photovoltaic devices such as CIGS, CdTe and DSSC requiring high process temperature, because it's electrical resistivity is unstable above 300 ℃ at atmosphere. Therefore, ZTO (zinc tin oxide) was introduced in order to improve permeability and thermal stability of GZO film. The resistivity of GZO (300 nm) single layer increased remarkably from 1.8 × 10-3Ωcm to 5.5 × 10-1Ωcm, when GZO was post-annealed at 400 ℃ in air atmosphere. In the case of the ZTO (150 nm)/GZO (150 nm) double layer, resistivity showed relatively small change from 3.1 × 10-3Ωcm (RT) to 1.2 × 10-2Ωcm (400 ℃), which showed good agreement with change of carrier density. This result means that ZTO upper layer act as a barrier for oxygen at high temperature. Also ZTO (150 nm)/GZO (150 nm) double layer showed lower WVTR compared to GZO (300 nm) single layer. Because ZTO has lower WVTR compared to GZO, ZTO thin film acts as a barrier by preventing oxygen and water molecules to penetrate on top of GZO thin film.

• Structural Engineering and Mechanics
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• 제85권4호
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• pp.461-468
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• 2023

Edible coatings are one of the most innovative methods to preserve the quality and increase the shelf life of fresh fruits and vegetables. A successful edible coating should have a barrier against gases, especially oxygen and water vapor, and have good surface characteristics. Today, chitosan coating is widely used due to its properties, such as non-toxic, biodegradable, and biocompatibility. Is. Coating the surface of fruits and vegetables with chitosan increases shelf life due to reducing weight loss and reducing respiration rate and also reduces decay due to its antimicrobial and anti-fungal effect. This work discusses the effect of using chitosan coating containing chamomile extract to increase fresh vegetables'shelf life. In addition to increasing the shelf life of vegetables, this method can be used as a solution for the economic management of human resources. The results of this method confirm the successful synthesis of these nanoparticles, and the results of applying this food coating on vegetables have been successful. They have increased the shelf life of vegetables such as basil and spinach.

• Composites Research
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• 제30권2호
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• pp.84-93
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• 2017

본 논문에서는 탄화규소 섬유강화 탄화규소 복합재료에 내환경 코팅을 수행한 후, 열 기계적 특성평가에 대한 연구를 수행하였다. 초기분말은 성형공정도중 흐름성을 좋게 하기 위해 분무건조법으로 구형의 분말을 제조하였다. 내환경 코팅재는 복합재료가 산화되거나 고온 수증기와 반응하는 것을 방지하기 위해 행하여 지는데, 본 연구에서는 액상침투법(LSI)으로 제조한 복합재에 실리콘으로 본드코팅을 하고 그 위에 대기플라즈마용사법으로 뮬라이트(mullite)와 무게비로 12% 이터븀 실리케이트(ytterbium silicate)가 혼합된 복합재를 코팅하였다. 대기플라즈마 코팅공정 시 성형변수로서 분무거리를 100, 120 그리고 140 mm로 변화시켰다. 그 후 $1100^{\circ}C$의 온도에서 100시간동안 유지하는 실험과 $1200^{\circ}C$의 온도에서 열충격을 가하는 싸이클을 3000회 반복하였다. 열내구성 시험동안 계면 박리는 일어나지 않았지만, 현저한 균열들이 코팅층 내에서 발견되었다. 균열밀도와 균열의 길이는 코팅도중의 분무거리에 의존하여 변화하였다. 열 내구성 시험 후, 압흔 시험을 통해 기계적 열화거동을 분석하였는데, 시험의 방식이나 조건들이 하중-변위 곡선의 거동에 영향을 주었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 대한기계학회논문집B
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• 제36권10호
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• pp.1049-1054
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• 2012

유기전자재료의 발전으로 박막화, 유연화, 경량화가 가능하면서, 저가의 생산비용으로 제조 될 수 있는 유기반도체의 개발 및 상용화에 대한 연구가 활발히 이루어지고 있다. 하지만, 유기반도체를 구성하는 유기재료 및 전극재료가 미량의 수분과 반응으로 성능이 저하되는 문제로 상용화의 큰 걸림돌이 되고 있다. 따라서 유기재료 및 전극을 동작환경의 수분으로부터 보호할 수 있는 고성능 투습 방지막 개발에 대한 연구가 많이 진행되고 있다. 본 연구에서는 $SiO_x$/parylene 및 $SiN_x$/parylene 구조를 이용한 다중 구조의 고성능 박막 봉지막을 개발하고, 개발된 박막을 Ca-corrosion test를 이용하여 수분투과율을 측정하였다. 또한 박막 봉지재를 유기태양전지에 적용하여 유기태양전지의 수명과 투습특성과의 관계를 확인하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.973-976
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• 2006

In this paper, the inorganic multi-layer encapsulation of thin film was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter, inorganic multi-layer thin-film encapsulation was deposited onto the Ethylene Terephthalate(PET) and their interface properties between inorganic and organic layer were investigated. In this investigation, the SiON $SiO_2$ and parylene layer showed the most suitable properties. Under these conditions, the water vapor transmission rate (WVTR) for PET can be reduced from level of $0.57g/m^2/day$ (bare substrate) to $1^{\ast}10^{-5}g/m^2/day$ after application of a SiON and $SiO_2$ layer. These results indicate that the $PET/SiO_2/SiON/Parylene$ barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

• 한국전기전자재료학회논문지
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• 제19권3호
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• pp.255-259
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• 2006

In this paper, the inorganic-organic thin film encapsulation layer was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter and Spin-Coater system, the various kinds of inorganic and organic thin-films were deposited onto the Ethylene Terephthalate(PET) and their interface properties between organic and inorganic layer were investigated. In this investigation, the SiON and Polyimide(PI) layer showed the most suitable properties. Under these conditions, the WVTR(water vapour transition rate) for PET can be reduced from level of $0.57\;g/m^2{\cdot}day$ (bare subtrate) to $1{\times}10^{-5}\;g/m^2{\cdot}day$ after application of a SiON and Polyimide layer. These results indicates that the SiON/PI/SiON/PI/PET barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.