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EXTENSION OF BLOCK MATRIX REPRESENTATION OF THE GEOMETRIC MEAN

  • Choi, Hana;Choi, Hayoung;Kim, Sejong;Lee, Hosoo
    • Journal of the Korean Mathematical Society
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    • v.57 no.3
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    • pp.641-653
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    • 2020
  • To extend the well-known extremal characterization of the geometric mean of two n × n positive definite matrices A and B, we solve the following problem: $${\max}\{X:X=X^*,\;\(\array{A&V&X\\V&B&W\\X&W&C}\){\geq}0\}$$. We find an explicit expression of the maximum value with respect to the matrix geometric mean of Schur complements.

Optimization of Betacyanin Production by Red Beet (Beta vulgaris L.) Hairy Root Cultures. (Red Beet의 모상근 배양을 이용한 천연색소인 Betacyanin 생산의 최적화)

  • Kim, Sun-Hee;Kim, Sung-Hoon;Lee, Jo-No;An, Sang-Wook;Kim, Kwang-Soo;Hwnag, Baik;Lee, Hyeong-Yong
    • Microbiology and Biotechnology Letters
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    • v.26 no.5
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    • pp.435-441
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    • 1998
  • Optimal conditions for the production of natural color, betacyanin were investigated by varying light intensity, C/N ratio, concentrations of phosphate and kinds of elicitors. Batch cultivation was employed to characterize cell growth and betacyanin production of 32 days. The maximum specific growth rate, ${\mu}$$\sub$max/, was 0.3 (1/day) for batch cultivation. The maximum specific production rate, q$\^$max/$\sub$p/, was enhanced 0.11 (mg/g-cell/day) at 3 klux. A light intensity of 3 klux was shown to the best for both cell growth and betacyanin production. The maximum specific production rate was 0.125 (mg/g-cell/day) at 0.242 (1/day), the maximum specific growth rate. The dependence of specific growth rate on the light lintensity is fit to the photoinhibition model. The correlation between ${\mu}$ and q$\sub$p/ showed that the product formation parameters, ${\alpha}$ and ${\beta}$$\sub$p/ were 0.3756 (mg/cell) and 0.001 (mg/g-cell/day), respectively. The betacyanin production was partially cell growth related process, which is different from the production of a typical product in plant cell cultures. In C/N ratio experiment, high carbon concentration, 42.1 (w/w) improved cell growth rate while lower concentration, 31.6 (w/w) increased the betacyanin production rate. The ${\mu}$$\sub$max/ and q$\^$max/$\sub$p/ were 0.26 (1/day) and 0.075 (mg/g-cell/day), respectively. Beta vulgaris L. cells under 1.25 mM phosphate concentration produced 10.15 mg/L betacyanin with 13.46 (g-dry wt./L) of maximum cell density. The production of betacyanin was elongated by adding 0.1 ${\mu}$M of kinetin. This also increased the cell growth. Optimum culture conditions of light intensity, C/N, phosphate concentration were obtained as 5.5 klux, 27 (w/w), 1.25 mM, respectively by the response surface methodology. The maximum cell density, X$\sub$max/, and maximum production, P$\sub$max/, in optimized conditions were 16 (g-dry wt./L), 12.5 (mg/L) which were higher than 8 (g-dry wt./L), 4.48 (mg/L) in normal conditions. The ${\mu}$$\sub$max/ and q$\^$max/$\sub$p/ were 0.376 (1/day) and 0.134 (mg/g-cell/day) at the optimal condition. The overall results may be useful in scaling up hairy root cell culture system for commercial production of betacyanin.

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BOUNDARIES OF THE CONE OF POSITIVE LINEAR MAPS AND ITS SUBCONES IN MATRIX ALGEBRAS

  • Kye, Seung-Hyeok
    • Journal of the Korean Mathematical Society
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    • v.33 no.3
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    • pp.669-677
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    • 1996
  • Let $M_n$ be the $C^*$-algebra of all $n \times n$ matrices over the complex field, and $P[M_m, M_n]$ the convex cone of all positive linear maps from $M_m$ into $M_n$ that is, the maps which send the set of positive semidefinite matrices in $M_m$ into the set of positive semi-definite matrices in $M_n$. The convex structures of $P[M_m, M_n]$ are highly complicated even in low dimensions, and several authors [CL, KK, LW, O, R, S, W]have considered the possibility of decomposition of $P[M_m, M_n] into subcones.

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ON THE AFFINE WEYL GROUP OF TYPE $\tilde{A}_{n-1}$ II

  • Albar, Muhammad A.;Al-hamed, Maha A.
    • Bulletin of the Korean Mathematical Society
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    • v.30 no.1
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    • pp.25-27
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    • 1993
  • In our paper [4] we showed that over bar $A_{n-1}$ is a split extension of (n-1) copies of Z by the symmetric group S$_{n}$ of degree n. We show in this paper how over bar $A_{n-1}$ appears naturally as a subgroup of the natural wreath product W=ZS$_{n}$.TEX> n/.

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Monitoring on the Soils and Plant Growth in Modular Sloped Rooftop Greening System (모듈형 경사지붕 녹화시스템의 토양과 식물생육 모니터링)

  • Ryu, Nam-Hyong;Lee, Chun-Seok
    • Journal of the Korean Society of Environmental Restoration Technology
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    • v.14 no.5
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    • pp.53-67
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    • 2011
  • The major objective of this study was to quantify the effects of substrate depth and substrate composition on the development of sedum etc., in a sloped rooftop (6 : 12 pitch) environment during a 4-year period. The experiment was conducted from 2006 October to 2010 December under several conditions without soil erosion control : two substrate depth (5cm, 10cm), four substrate composition (A5N3C2, A3N3C4, A6C4, G5L3C2: A: artificial lightweight soil, N : natural soil, G : granite decomposed soil, C : leave composite, L : loess), four sloped roof direction ($E40^{\circ}W$, $W40^{\circ}N$, $S40^{\circ}W$, $N40^{\circ}E$). In this experiment 4 sedum etc., were used: Sedum sarmentosum, Sedum kamtschaticum, Sedum rupestre, Sedum telephium, flowering herbs (mixed seed : Taraxacum platycarpum, Lotus corniculatus, Aster yomena, Aster koraiensis), western grasses (mixed seed : Tall fescue, Creeping redfescue, Bermuda grass, Perennial ryegrass). The establishment factor had two levels : succulent shoot establishment (sedum), seeding (flowering herbs, western grasses). 1. Enkamat, as it bring about top soil exfoliation, was unsuitable material for soil erosion control. 2. Sedum species exhibited greater growth at a substrate depth of 10cm relative to 5cm. All flowering herbs and western grasses established only at a substrate depth of 5cm were died. A substrate depth of 5cm was not suited in sloped rooftop greening without maintenance. If additional soil erosion control will be supplemented, a substrate depth of 10cm in sloped rooftop greening without maintenance was considered suitable. 3. For all substrate depth and composition, the most abundant species was Sedum kamtschaticum. The percentage of surviving Sedum kamtschaticum was 73.4% at a substrate depth of 10cm in autumn 2007 one year after the roof vegetation had been established. But the percentage of surviving other sedum were 33.3%~51.9%, therefor mulching for soil erosion control was essential after rooftop establishment in extensive sloped roof greening was proved. To raise the ratio of plant survival, complete establishment of plant root at substrate was considered essential before rooftop establishment. 4. There was a significant interaction between biomass and substrate moisture content. There were also a significant difference of substrate moisture and erosion among substrate composition. The moisture content of A6C4 was highest, the resistance to erosion of A5N3C2 was highest among substrate composition. The biomass of plants were not significantly higher in A5N3C2 and A6C4 relative to A3N3C4 and G5L3C2, For substrate moisture and erosion resistance, A5N3C2 and A6C4 were considered suitable in sloped rooftop greening without maintenance. 5. There were significant difference among roof slope direction on the substrate moisture. Especially, the substrate moisture content of $S40^{\circ}W$ was lower relative to that of $N40^{\circ}E$, that guessed by solar radiation and erosion.

Orientations of Vertical Rift and Grain Planes in Mesozoic Granites, Korea (국내의 중생대 화강암류에서 발달하는 수직의 1번 및 2번 면의 방향성)

  • Park, Deok-Won
    • The Journal of the Petrological Society of Korea
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    • v.16 no.1 s.47
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    • pp.12-26
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    • 2007
  • We have studied orientational characteristics of vertical rift and grain planes developing in 108 quarries for Mesozoic granites. Orientations of these planes vary in different localities. In general, orientations of these planes are predominantly NNE in South Korea. From the regional distribution chart, orientations of these planes show three dominant sets in terms of frequency orders: (1) $N2{\sim}10^{\circ}E(1st-order),\;(2)\;N15{\sim}25^{\circ}E(2nd-order),\;(3)\;N45{\sim}70^{\circ}E,\;N10{\sim}30^{\circ}W\;and\;N70{\sim}80^{\circ}W(3rd-order)$. These granite quarries are classified by the relative difference in the easiness of rock splitting between horizontal and vertical quarrying planes into: R-type, G-type, and H-type. The results showed that quarries for Triassic granites belong to R and G-types;those for Jurassic granites belong to R, G and H-types. In addition, quarries for Cretaceous granites belong mainly to R-type. Among these quarry types, the most diverse type was identified in the quarries for Jurassic granites. R-type (77.8%) shows a higher distribution ratio compared with G and H-types (22.2%). In general, anisotropy of physical properties is found in granitic rocks and there exists close correlation between orientations of granitic rock splitting planes and those of the open microcracks. Meanwhile, it has been reported that preferred orientations of open microcracks suggest maxinum principal stress orientations.

The etch characteristic of TiN thin films by using inductively coupled plasma (유도결합 플라즈마를 이용한 TiN 박막의 식각 특성 연구)

  • Park, Jung-Soo;Kim, Dong-Pyo;Um, Doo-Seung;Woo, Jong-Chang;Heo, Kyung-Moo;Wi, Jae-Hyung;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.74-74
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    • 2009
  • Titanium nitride has been used as hardmask for semiconductor process, capacitor of MIM type and diffusion barrier of DRAM, due to it's low resistivity, thermodynamic stability and diffusion coefficient. Characteristics of the TiN film are high intensity and chemical stability. The TiN film also has compatibility with high-k material. This study is an experimental test for better condition of TiN film etching process. The etch rate of TiN film was investigated about etching in $BCl_3/Ar/O_2$ plasma using the inductively coupled plasma (ICP) etching system. The base condition were 4 sccm $BCl_3$ /16 sccm Ar mixed gas and 500 W the RF power, -50 V the DC bias voltage, 10 mTorr the chamber pressure and $40\;^{\circ}C$ the substrate temperature. We added $O_2$ gas to give affect etch rate because $O_2$ reacts with photoresist easily. We had changed $O_2$ gas flow rate from 2 sccm to 8 sccm, the RF power from 500 W to 800 W, the DC bias voltage from -50 V to -200 V, the chamber pressure from 5 mTorr to 20 mTorr and the substrate temperature from $20\;^{\circ}C$ to $80\;^{\circ}C$.

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