• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.1
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• pp.10-13
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• 2010

The plasma processing technologies of thin film deposition and surface treatment technique have been applied to many industrial fields. This study is purposed Large-area uniformity and surface treatment on the stainless substrate. We treat surface of stainless by $CF_4$ plasma. $CF_4$ plasma is generated by using SPM(Scanning plasma method)which is kind a of CVD. Generally, SPM has been used for uniform surface treatment using a crossed electromagnetic field. The optimum discharge condition has been studied for the gas pressure, the magnetic flux density and the distance between substrate and electrodes. In result, contact angle is increased by surface treatment using $CF_4$ Plasma. Therefore we expect that SPM to control contact angle is applied to many industries.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.28 no.4
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• pp.362-369
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• 2004

LGP(Light-Guide Panel) of LCD backlight is one of the major componets which affect on the product quality of LCD. The optical relation between brightness and pattern has been investigated for LGP with the uniform distribution of brightness. When given the brightness distribution as target, the solutions of pattern distribution is not unique. Each solution of pattern designs shows the different brightness intensity even though they have the same brightness distribution with target's one. The manufacturing condition of pattern has an influence on the possibly-maximum-brightness intensity among the solutions of pattern design. The present study has examined the effects of LGP thickness, pattern shape errors, and reflection film on the optical characteristics of LGP.

• Journal of Industrial and Engineering Chemistry
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• v.68
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• pp.393-398
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• 2018

This work offers a promising approach for development of a temperature-responsive colorimetric display platform. For this purpose, uniform thermochromic microcapsules consisting of a cholesteric liquid crystal (CLC) core and a thin polyurethane shell layer were fabricated by conducting in-situ condensation polymerization at the interface of monodisperse CLC-in-water emulsion drops. Colloidal packing-driven microcapsule registry led to exact 2-dimensional positioning of CLC microcapsules into a holes-patterned flexible film stencil. Furthermore, we showed that the designated registry of different color types of CLC microcapsules on the stencil enabled development of a microwriting display technology capable of reversible text representation according to temperature change.

• Korean Journal of Chemical Engineering
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• v.35 no.12
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• pp.2474-2479
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• 2018

Plasma-enhanced atomic layer deposition (PEALD) is well-known for fabricating conformal and uniform films with a well-controlled thickness at the atomic level over any type of supporting substrate. We prepared nickel oxide (NiO) thin films via PEALD using bis(ethylcyclopentadienyl)-nickel ($Ni(EtCp)_2$) and $O_2$ plasma. To optimize the PEALD process, the effects of parameters such as the precursor pulsing time, purging time, $O_2$ plasma exposure time, and power were examined. The optimal PEALD process has a wide deposition-temperature range of $100-325^{\circ}C$ and a growth rate of $0.037{\pm}0.002nm$ per cycle. The NiO films deposited on a silicon substrate with a high aspect ratio exhibited excellent conformality and high linearity with respect to the number of PEALD cycles, without nucleation delay.

• Nuclear Engineering and Technology
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• v.34 no.4
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• pp.286-300
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• 2002

An algorithm for the sodium boiling model has been developed for calculation of the void reactivity feedback as well as the fuel and cladding temperatures in the KALIMER core after onset of sodium boiling. Modeling of sodium boiling in liquid metal reactors using sodium as a coolant is necessary because of phenomenon difference comparing with that observed generally in light water reactor systems. The applied model to the algorithm is the multiple-bubble slug ejection model. It allows a finite number of bubbles in a channel at any time. Voiding is assumed to result from formation of bubbies that (ill the whole cross section of the coolant channel except for the liquid film left on the cladding surface. The vapor pressure, currently, is assumed to be uniform within a bubble The present study is focused on not only demonstration of the vapor bubble behavior predicted by the developed model, but also confirmation of a qualitative acceptance for the model. As a result, the model can represent important phenomena in the sodium boiling, but it is found that further effort is also needed for its completition.

• Bulletin of the Korean Chemical Society
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• v.6 no.4
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• pp.218-221
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• 1985

Transient charging and discharging currents as well as space charge limited currents have been measured in biaxially stretched poly(vinylidene fluoride) film under various poling fields and temperatures. At low temperatures and short poling times, the I-V characteristics showed shallow trap behavior. When the current values extrapolated to the infinite time, the I-V characteristics indicate that the distribution of the trap energy levels is uniform or very broad. The abnormal suppression of current at higher poling voltages and the high discharge rate observed also in the same voltage range are attributed to the morphological changes due to dipole reorientation.

• Journal of Sensor Science and Technology
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• v.30 no.1
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• pp.10-14
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• 2021

Wet etching is more economical than dry etching and provides a uniform etching depth regardless of wafer sizes. Typically, potassium hydroxide (KOH) and tetra-methyl-ammonium hydroxide (TMAH) solutions are widely used for the wet etching of silicon. However, there is a limit to the wet etching process when a material deposited on an unetched surface reacts with an etching solution. To solve this problem, in this study, an apparatus was designed and manufactured to physically block the inflow of etchants on the surface using a rubber O-ring. The proposed apparatus includes a heater and a temperature controller to maintain a constant temperature during etching, and the hydrostatic pressure of the etchant is considered for the thin film structure. A corrugation membrane with a diameter of 800 ㎛, thickness of 600 nm, and corrugation depth of 3 ㎛ with two corrugations was successfully fabricated using the prepared device.

• Design & Manufacturing
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• v.17 no.1
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• pp.64-69
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• 2023

This paper explores the impact of gate shape changes on the size and density of foamed cells in microcellular foam injection molding. Five different gate shapes were examined while varying the amount of nitrogen gas(N2) injected for foaming. Analysis of the results showed that while average values did not change significantly, deviation values decreased by approximately 65% for cell size and 56% for density when 3.5wt% of nitrogen gas was injected in the film gate. Further analysis was conducted to verify this phenomenon, revealing that the contact area between the gate and product had the greatest impact. Our findings indicate that to ensure uniform generation of foamed cells in microcellular foaming product design, a gate with a wide contact area should be secured.

• Journal of the Korean Society for Precision Engineering
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• v.13 no.11
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• pp.46-56
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• 1996

Planarization technique is rapidly recognized as a critical step in chip fabrication due to the increase in wiring density and the trend towards a three dimensional structure. Global planarity requires the preferential removal of the projecting features. Also, the several materials i.e. Si semiconductor, oxide dielectric and sluminum interconnect on the chip, should be removed simultaneously in order to produce a planar surface. This research has investihgated the development of the chemical mechanical polishing(CMP) machine with uniform pressure and velocity mechanism, and the pad insensitive to pattern topography named hard grooved(HG) pad for global planarization. Finally, a successful result of uniformity less than 5% standard deviation in residual oxide film and planarity less than 15nm in residual step height of 4 inch device wafer, is achieved.

• The Journal of Korean Society for Radiation Therapy
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• v.18 no.2
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• pp.81-87
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• 2006

Purpose: Few researches have been peformed on the dose distribution of the moving organ for radiotherapy so far. In order to simulate the organ motion caused by respiratory function, multipurpose phantom and moving device was used and dosimetric measurements for dose distribution of the moving organs were conducted in this study. The purpose of our study was to evaluate how dose distributions are changed due to respiratory motion. Materials and Methods: A multipurpose phantom and a moving device were developed for the measurement of the dose distribution of the moving organ due to respiratory function. Acryl chosen design of the phantom was considered the most obvious choice for phantom material. For construction of the phantom, we used acryl and cork with density of $1.14g/cm^3,\;0.32g/cm^3$ respectively. Acryl and cork slab in the phantom were used to simulate the normal organ and lung respectively. The moving phantom system was composed of moving device, moving control system, and acryl and cork phantom. Gafchromic film and EDR2 film were used to measure dose ditrbutions. The moving device system may be driven by two directional step motors and able to perform 2 dimensional movements (x, z axis), but only 1 dimensional movement(z axis) was used for this study. Results: Larger penumbra was shown in the cork phantom than in the acryl phantom. The dose profile and isodose curve of Gafchromic EBT film were not uniform since the film has small optical density responding to the dose. As the organ motion was increased, the blurrings in penumbra, flatness, and symmetry were increased. Most of measurements of dose distrbutions, Gafchromic EBT film has poor flatness and symmetry than EDR2 film, but both penumbra distributions were more or less comparable. Conclusion: The Gafchromic EBT film is more useful as it does not need development and more radiation dose could be exposed than EDR2 film without losing film characteristics. But as response of the optical density of Gafchromic EBT film to dose is low, beam profiles have more fluctuation at Gafchromic EBT. If the multipurpose phantom and moving device are used for treatment Q.A, and its corrections are made, treatment quality should be improved for the moving organs.