• Title/Summary/Keyword: Thin-film electrodes

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A Study on the Microfabricated Clark-type Sensor for Measuring Dissolved Oxygen (용존 산소 측정용 초소형 Clark-type 센서에 대한 연구)

  • Park, Jung-Il;Chang, Jong-Hyeon;Choi, Myung-Ki;Lee, Dong-Young;Kim, Young-Mi;Pak, Jung-Ho
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.8
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    • pp.1450-1454
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    • 2007
  • This paper presents a microfabricated Clark-type sensor which exactly can measure dissolved oxygen in the cell containing solution. We designed, fabricated, and characterized a microfabircated Clark-type oxygen sensor for measuring dissolved oxygen. The microfabricated oxygen sensor consists of 3-electrodes on a glass substrate, a FEP (Fluorinated ethylene propylene) oxygen-permeable membrane, and PDMS (Polydimethylsiloxane) reservoir for storing sample solution. Thin-film Ag/AgCl was employed as a reference electrode and its durability was verified by obtaining a stable open circuit potential for 2 hours against a commercial Ag/AgCl electrode and a stable cyclic voltammetry curve. Selectivity, response time, and linearity of the fabricated oxygen sensor were also verified well by cyclic voltammetry and amperometry depending. The fabricated oxygen sensor showed a 90% response time of 40sec and an excellent linearity with a correlation coefficient of 0.994.

A Study on the Phase Transfer and Electrical Properties of PBLG and PBDG (PBLG와 PBDG의 상전이와 전기특성에 관한 연구)

  • Kim, Beyung-Geun;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.400-403
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    • 2003
  • Recently, the study on development of electrical and electronic device is done to get miniature, high degrees of integration and efficiency by using inorganic materials. the study of Langmuir-Boldgett(LB) method that uses organic materials because of the limitation for the ultra small size. In this paper, detected displacement current using PBLG and PBDG, deposition and observed the electrical characteristics to each 1, 3, 5, 7, 9 layers by LB method. Maximum value of change ratio of displacement current by the detected speed and temperature appeared almost lineally, could confirm that it are in comparison relation each other speed temperature and displacement current. The structure of manufactured device is MIM. Also, we then examined of the MIM device by means of I-V. The I-V characteristic of the device is measured from 0 to +2[V]. The insulation property of a thin film is better as the distance between electrodes is larger.

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Electrochemical Characteristics of DAAQ/CNFs electrode for Supercapacitor (슈퍼커패시터용 DAAQ/CNFs 전극의 전기화학적 특성)

  • Kim, Hong-Il;Choi, Weon-Kyung;Park, Soo-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.1184-1187
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    • 2003
  • Electrochemical capacitors are becoming attractive energy storage systems particularly for applications involving high power requirements such as hybrid systems consisting of batteries and electrochemical capacitors for electric vehicle propulsion. A new type electric double layer capacitor (EDLC) was constructed by using carbon nanofibers (CNFs) and DAAQ(1,5-diaminoanthraquinone) electrode. Carbonaceous materials are found in variety forms such as graphite, diamond, carbon fibers etc. While all the carbon nanofibers include impurities such as amorphous carbon, nanoparticles, catalytic metals and incompletely grown carbons. We have eliminated of Ni particles and some carbonaceous particles in nitric acid. Nitric acid treated CNFs could be covered with very thin DAAQ oligomer from the results of CV and TG analyses and SEM images. DAAQ oligomer film exhibited a specific capacity as 45-50 Ah/kg in 4M $H_2SO_4$. We established Process Parameters of the technique for the formation of nano-structured materials. Furthermore, improved the capacitive properties of the nano structured CNFs electrodes using controlled solution chemistry. As a result, CNFs coated by DAAQ composite electrode showed relatively good electrochemical behaviors in acidic electrolyte system with respect to specific capacity and scan rate dependency.

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A Brief Review of the Application on Solar Cells and Biosensors Using Graphene Materials of 2-Dimensional Carbon Structure (2차원 탄소 나노 구조를 가진 그래핀 소재의 바이오 센서 및 태양전지 응용에 관한 연구 동향)

  • Park, Hyeong Gi;Kim, Seung-Il;Moon, Ji-Yun;Choi, Jun-Hui;Hyun, Sang-Hwa;Lee, Jae-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.2
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    • pp.129-133
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    • 2022
  • This paper describes why we must use graphene materials for solar cells and biosensors. It has been superior in several properties such as super-thin film, higher tensile strength, high current density, high thermal conductivity, and high mobility. Therefore, graphene is one of the emerging advanced materials because of its applicability in various electronic device applications. We investigated the requirements of graphene materials for the application of solar cells and biosensors. In addition, we discussed the research trends such as transducers in biosensors and transparent electrodes in solar cells. The research on graphene materials and their application will be beneficial and helpful for the near future.

Dielectric Property Analysis of BaTiO3 Capacitor Manufactured by Inkjet Printing Process (잉크젯 프린팅 공정을 통해 제작된 BaTiO3 Capacitor의 유전특성 분석)

  • Kim, Yu-Jin;Lee, Gyeong-Yeong;Lee, In-Gon;Hong, Ic-Pyo;Kim, Ji-Hoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.6
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    • pp.610-615
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    • 2022
  • BaTiO3 is one of the ferroelectric materials with excellent dielectric properties such as high dielectric constant, low dielectric loss, and is widely used for the manufacturing of capacitors, piezoelectric converters, microsensors, and ferroelectric memories. Inkjet printing is a technology which uses digital and contactless methods which significantly improves flexibility associated with material and structural design, reducing manufacturing costs. Therefore, the top and bottom electrodes, BaTiO3 ink, and photocurable resin were all printed by an inkjet to produce a BaTiO3 capacitor. The properties of the printed thin film were analyzed. It was confirmed that the photocurable resin ink was well-infiltrated between the BaTiO3 powder particles printed by inkjet. The dielectric properties of the capacitor such as dielectric constant which varies in accordance with frequency, polarization and tunability that changes with voltage, were measured.

Electrical Characteristic of IGZO Oxide TFTs with 3 Layer Gate Insulator

  • Lim, Sang Chul;Koo, Jae Bon;Park, Chan Woo;Jung, Soon-Won;Na, Bock Soon;Lee, Sang Seok;Cho, Kyoung Ik;Chu, Hye Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.344-344
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    • 2014
  • Transparent amorphous oxide semiconductors such as a In-Ga-Zn-O (a-IGZO) have advantages for large area electronic devices; e.g., uniform deposition at a large area, optical transparency, a smooth surface, and large electron mobility >10 cm2/Vs, which is more than an order of magnitude larger than that of hydrogen amorphous silicon (a-Si;H).1) Thin film transistors (TFTs) that employ amorphous oxide semiconductors such as ZnO, In-Ga-Zn-O, or Hf-In-Zn-O (HIZO) are currently subject of intensive study owing to their high potential for application in flat panel displays. The device fabrication process involves a series of thin film deposition and photolithographic patterning steps. In order to minimize contamination, the substrates usually undergo a cleaning procedure using deionized water, before and after the growth of thin films by sputtering methods. The devices structure were fabricated top-contact gate TFTs using the a-IGZO films on the plastic substrates. The channel width and length were 80 and 20 um, respectively. The source and drain electrode regions were defined by photolithography and wet etching process. The electrodes consisting of Ti(15 nm)/Al(120 nm)/Ti(15nm) trilayers were deposited by direct current sputtering. The 30 nm thickness active IGZO layer deposited by rf magnetron sputtering at room temperature. The deposition condition is as follows: a rf power 200 W, a pressure of 5 mtorr, 10% of oxygen [O2/(O2+Ar)=0.1], and room temperature. A 9-nm-thick Al2O3 layer was formed as a first, third gate insulator by ALD deposition. A 290-nm-thick SS6908 organic dielectrics formed as second gate insulator by spin-coating. The schematic structure of the IGZO TFT is top gate contact geometry device structure for typical TFTs fabricated in this study. Drain current (IDS) versus drain-source voltage (VDS) output characteristics curve of a IGZO TFTs fabricated using the 3-layer gate insulator on a plastic substrate and log(IDS)-gate voltage (VG) characteristics for typical IGZO TFTs. The TFTs device has a channel width (W) of $80{\mu}m$ and a channel length (L) of $20{\mu}m$. The IDS-VDS curves showed well-defined transistor characteristics with saturation effects at VG>-10 V and VDS>-20 V for the inkjet printing IGZO device. The carrier charge mobility was determined to be 15.18 cm^2 V-1s-1 with FET threshold voltage of -3 V and on/off current ratio 10^9.

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Electrical Characterization of Ultrathin Film Electrolytes for Micro-SOFCs

  • Shin, Eui-Chol;Ahn, Pyung-An;Jo, Jung-Mo;Noh, Ho-Sung;Hwang, Jaeyeon;Lee, Jong-Ho;Son, Ji-Won;Lee, Jong-Sook
    • Journal of the Korean Ceramic Society
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    • v.49 no.5
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    • pp.404-411
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    • 2012
  • The reliability of solid oxide fuel cells (SOFCs) particularly depends on the high quality of solid oxide electrolytes. The application of thinner electrolytes and multi electrolyte layers requires a more reliable characterization method. Most of the investigations on thin film solid electrolytes have been made for the parallel transport along the interface, which is not however directly related to the fuel cell performance of those electrolytes. In this work an array of ion-blocking metallic Ti/Au microelectrodes with about a $160{\mu}m$ diameter was applied on top of an ultrathin ($1{\mu}m$) yttria-stabilized-zirconia/gadolinium-doped-ceria (YSZ/GDC) heterolayer solid electrolyte in a micro-SOFC prepared by PLD as well as an 8-${\mu}m$ thick YSZ layer by screen printing, to study the transport characteristics in the perpendicular direction relevant for fuel cell operation. While the capacitance variation in the electrode area supported the working principle of the measurement technique, other local variations could be related to the quality of the electrolyte layers and deposited electrode points. While the small electrode size and low temperature measurements increaseed the electrolyte resistances enough for the reliable estimation, the impedance spectra appeared to consist of only a large electrode polarization. Modulus representation distinguished two high frequency responses with resistance magnitude differing by orders of magnitude, which can be ascribed to the gadolinium-doped ceria buffer electrolyte layer with a 200 nm thickness and yttria-stabilized zirconia layer of about $1{\mu}m$. The major impedance response was attributed to the resistance due to electron hole conduction in GDC due to the ion-blocking top electrodes with activation energy of 0.7 eV. The respective conductivity values were obtained by model analysis using empirical Havriliak-Negami elements and by temperature adjustments with respect to the conductivity of the YSZ layers.

Impact of Absorber Thickness on Bifacial Performance Characteristics of Semitransparent Amorphous Silicon Thin-Film Solar Cells (광흡수층 두께에 따른 투광형 비정질 실리콘 박막 태양전지의 양면발전 성능특성)

  • Seo, Yeong Hun;Lee, Ahruem;Shin, Min Jeong;Cho, Ara;Ahn, Seungkyu;Park, Joo Hyung;Yoo, Jinsu;Choi, Bo-Hun;Cho, Jun-Sik
    • Current Photovoltaic Research
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    • v.7 no.4
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    • pp.97-102
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    • 2019
  • Bifacial and semitransparent hydrogenated amorphous silicon (a-Si:H) thin-film solar cells in p-i-n configuration were prepared with front and rear transparent conducting oxide (TCO) electrodes using plasma-enhanced chemical vapor deposition method. Fluorine-doped tin oxide and tin-doped indium oxide films were used as front and rear TCO contacts, respectively. Film thickness of intrinsic a-Si:H absorber layers were controlled from 150 nm to 450 nm by changing deposition time. The dependence of performance characteristics of solar cells on the front and rear illumination direction were investigated. For front illumination, gradual increase in the short-circuit current density (JSC) from 10.59 mA/㎠ to 14.19 mA/㎠ was obtained, whereas slight decreases from 0.83 V to 0.81 V for the open-circuit voltage (VOC) and from 68.43% to 65.75% for fill factor (FF) were observed. The average optical transmittance in the wavelength region of 380 ~ 780 nm of the solar cells decreased gradually from 22.76% to 15.67% as the absorber thickness was changed from 150 nm to 450 nm. In case of the solar cells under rear illumination condition, the JSC increased from 10.81 to 12.64 mA/㎠ and the FF deceased from 66.63% to 61.85%, while the VOC values were maintained at 0.80 V with increasing the absorber thickness from 150 nm to 450 nm. By optimizing the deposition parameters, a high-quality bifacial and semitransparent a-Si:H solar cell with 350 nm-thick i-a-Si:H absorber layer exhibited the conversion efficiencies of 7.69% for front illumination and 6.40% for rear illumination, and average visible optical transmittance of 17.20%.

Electrical and Optical Properties of Ga-doped ZnO Thin Films Deposited at Different Process Pressures by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법으로 제작된 Ga-doped ZnO 박막의 공정압력에 따른 전기적, 광학적 특성)

  • Jeong, Seong-Jin;Kim, Deok-Kyu;Kim, Hong-Bae
    • Journal of the Korean Vacuum Society
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    • v.21 no.1
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    • pp.17-21
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    • 2012
  • Ga-doped ZnO (GZO) thin films for application as transparent conducting oxide film were deposited on the glass substrate by using rf-magnetron sputtering system. The effects of working pressure on electrical and optical characteristics of GZO films were investigated. Regardless of the working pressure, all films were oriented along with the c-axis, perpendicular to the substrate. The electrical resistivity was about $8.68{\times}10^{-3}{\Omega}{\cdot}cm\sim2.18{\times}10^{-3}{\Omega}{\cdot}cm$ and the average transmittance of all films including substrates was over 90% in the visible range. The good transparents and conducting properties were obtained due to controle the working pressure. The obtained results have acceptable for application as transparent conductive electrodes in LCDs and solar cells.

Comparison of retention characteristics of ferroelectric capacitors with $Pb(Zr, Ti)O_3$ films deposited by various methods for high-density non-volatile memory.

  • Sangmin Shin;Mirko Hofmann;Lee, Yong-Kyun;Koo, June-Mo;Cho, Choong-Rae;Lee, June-Key;Park, Youngsoo;Lee, Kyu-Mann;Song, Yoon-Jong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.3
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    • pp.132-138
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    • 2003
  • We investigated the polarization retention characteristics of ferroelectric capacitors with $Pb(Zr,Ti)O_3$ (PZT) thin films which were fabricated by different deposition methods. In thermally-accelerated retention tests, PZT films which were prepared by a chemical solution deposition (CSD) method showed rapid decay of retained polarization charges as the thickness of the films decreased down to 100 nm, while the films which were grown by metal organic chemical vapor deposition (MOCVD) retained relatively large non-volatile charges at the corresponding thickness. We concluded that in the CSD-grown films, the thicker interfacial passive layer compared with the MOCVD-grown films had an unfavorable effect on retention behavior. We observed the existence of such interfacial layers by extrapolation of the total capacitance with thickness of the films and the capacitance of these layers was larger in MOCVD-grown films than in CSD-grown films. Due to incomplete compensation of surface polarization charges by the free charges in the metal electrodes, the interfacial field activated the space charges inside the interfacial layers and deposited them at the boundary between the ferroelectric layer and the interfacial layer. Such space charges built up an internal field inside the films, which interfered with domain wall motion, so that retention property at last became degraded. We observed less imprint which was a result of less internal field in MOCVD-grown films while large imprint was observed in CSD-grown films.