References
- H. Kobayashi, T. Ishida, Y. Nakato, and H. Tsubomura, J. Appl. Phys. 69, 1736 (1991). https://doi.org/10.1063/1.347220
- S. Major, S. Kumar, M. Bhatnagar, and K. L. Chopra, Appl. Phys. Lett. 49, 394 (1986). https://doi.org/10.1063/1.97598
- H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish. Semiconducting Transparent Thin Films (Institute of Physics Publishing, Bristol and Philadelphia, 1995).
- M. Hiramatsu, K. Imaeda, N. Horio, and T. Goto. J. Vac. Sci. Technol. A 16, 669 (1998). https://doi.org/10.1116/1.581085
- M. Chen, Z. L. Pei, C. Sun, J. Gong, R. F. Huang, and L. S. Wen. Mat. Sci. Eng. B 85, 212 (2001). https://doi.org/10.1016/S0921-5107(01)00584-0
- T. Miyazaki, K. Sato, A. Mitsui, and H. Nishimura. Jpn. J. Appl. Phys. 24, L781 (1985). https://doi.org/10.1143/JJAP.24.L781
- H. J. Ko, Y. F. Chen, S. K. Hong, H. Wenisch, T. Yao, D. C. Look, J. Hu, and R. G. Gordon, J. Appl. Phys. 72, 5381 (1992). https://doi.org/10.1063/1.351977
- J. Hu and R. G. Gordon. J. Appl. Phys. 72, 5381 (1992). https://doi.org/10.1063/1.351977
- K. Y. Cheong, N. Muti, and S. R. Ramanan. Thin Solid Films 410, 142-146 (2002). https://doi.org/10.1016/S0040-6090(02)00286-9
- K. T. Ramakrishna Reddy, H. Gopalaswamy, P. J. Reddy, and R. W. Miles. J. Crystal Growth 210, 516 (2000). https://doi.org/10.1016/S0022-0248(99)00868-4
- E. Fortunato, V. Assuncao, A. Goncalves, A. Marques, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. Thin Solid Films 451-452, 443-447 (2004). https://doi.org/10.1016/j.tsf.2003.10.139
- G. A. Hirata, J. McKittrick, T. Cheeks, J. M. Siqueiros, J. A. Diaz, O. Contreras, and O. A. Lopez Thin Solid Films 288, 29 (1996). https://doi.org/10.1016/S0040-6090(96)08862-1
- H. Kato, M. Sano, K. Miyamoto, and T. Yao. J. Crystal Growth. 237-239, 538 (2002). https://doi.org/10.1016/S0022-0248(01)01972-8
- J. H. Lee, D. J. Lee, D. G. Lim, and K. J. Yang. Thin Solid Films 515, 6094 (2007). https://doi.org/10.1016/j.tsf.2006.12.099
- A. Van der Drift. Philips Res. Rep. 22, 267 (1967).
- S. Kim, W. I. Lee, E. H. Lee, S. K. Hwang, and C. Lee. J Mater Sci. 42, 4845 (2007) https://doi.org/10.1007/s10853-006-0738-8
- Y. Igasaki and H. Kanma, Appl. Surf. Sci. 508, 169 (2001)
- S. K. Kim, W. I. Lee, E. H. Lee, S. K. Hwang, and C. M. Lee, J. Mat. Sci. 42, 4845 (2007) https://doi.org/10.1007/s10853-006-0738-8
Cited by
- Optical and Electrical Properties of Sputtered ZnO:Al Thin Films with Various Annealing Temperature vol.22, pp.1, 2013, https://doi.org/10.5757/JKVS.2013.22.1.20
- Fabrication and Study of Transparent Conductive Films ZnO(Al) and ZnO(AlGa) by DC Magnetron Sputtering vol.22, pp.3, 2013, https://doi.org/10.5757/JKVS.2013.22.3.119