• Journal of Ceramic Processing Research
• /
• v.19 no.6
• /
• pp.519-524
• /
• 2018

Carbon/carbon composites (C/C) have been widely studied in the aerospace field because of their excellent thermal shock resistance and specific strength at high temperature. However, they have the problems that is easily oxidized and deteriorated under atmospheric environment. In order to overcome these shortcomings, the CVD coating of ultra-high-temperature ceramics to C/C has become an important technical issue. In this study, thermodynamic calculations were performed to TaC CVD coating on C/C by FactSage 6.2 program. The Ta-C phase diagrams were constructed with the results of thermodynamic calculations in the Ta-C-H-Cl system. Based on the Ta-C phase diagram, the experimental conditions were designed to confirm the deposition of various phases such as TaC single phase, TaC + C and $TaC+Ta_2C$ by varying the composition of Ta/C ratio. The deposited films were found to be in good agreement with the predicted phases.

• Journal of Advanced Navigation Technology
• /
• v.7 no.2
• /
• pp.211-216
• /
• 2003

In this paper, characteristics of Ta-Ti alloy was studied as a gate electrode for NMOS devices to replace the widely used polysilicon. Ta-Ti alloy was deposited directly on $SiO_2$ by a co-sputtering method using two of Ta and Ti targets. The sputtering power of each metal target was 100W. To compare with Ta-Ti, Ta deposited with a 100W sputtering power was fabricated as well. In order to investigate the thermal/chemical stability of the Ta-Ti alloy gate, the alloy was annealed at $600^{\circ}C$ with rapid thermal annealer. No appreciable degradation of the device was observed. Also the results of electrical analysis showed that the work function of Ta-Ti metal alloy was about 4.1eV which was suitable for NMOS devices and sheet resistance of alloy was lower than that of polysilicon.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2005.06a
• /
• pp.1115-1119
• /
• 2005

The paper proposes the elastic modulus evaluation technique of a cantilever beam by vibration analysis based on time-average electronic speckle pattern interferometry (TA-ESPI) with non-contact and nondestructive and Euler-Bernoulli equation. General approaches for the measurement of elastic modulus of thin film are Nano indentation test, Bulge test and Micro-tensile test and so on. They each have strength and weakness in the preparation of test specimen and the analysis of experimental result. ESPI has been developed as a common measurement method for vibration mode visualization and surface displacement. Whole-field vibration mode shape (surface displacement distribution) at a resonance frequency can be visualized by ESPI. And the maximum surface displacement distribution from ESPI is a clue to find the resonance frequency at each vibration mode shape. And the elastic modules of test material can be easily estimated from the measured resonance frequency and Euler-Bernoulli equation. The TA-ESPI vibration analysis technique is able to give the elastic modulus of materials through the simple processing of preparation and analysis.

• Journal of the Korean Chemical Society
• /
• v.30 no.6
• /
• pp.510-515
• /
• 1986

Spectra for the $v_3$+ Amide II combination band of thioacetamide(TA) were obtained in carbon tetrachloride solutions and in very dilute solutions of TA-N,N-dimethlylacetamide (DMA) in carbon tetrachloride in the range of 5~55$^{\circ}$C. The combination band in the three component system can be resolved into components due to monomeric TA, 1 : 1 TA-DMA complex and 1 : 2 TA-DMA complex. In the dilute solutions the experimental spectrum was resolved by using the computer into its two Lorentzian-Gaussian product components which have been identified with the monomeric TA and the 1 : 1 complex. The equilibrium constants and thermodynamic parameters of 1 : 1 complex were determined by analysis of concentration and temperature dependent spectra. The ${\Delta}H^{\circ}$ and ${\Delta}S^{\circ}$ for the 1 : 1 complex were -14.4 KJ mol$^{-1}$ and -15.6 J mol$^{-1}deg^{-1}$, respectively.

• Journal of Ginseng Research
• /
• v.43 no.3
• /
• pp.488-495
• /
• 2019

Background: Timosaponin AIII (TA3) is a steroidal saponin extracted from Anemarrhena asphodeloides. Here, we investigated the anticancer effects of TA3 in MG63 human osteosarcoma cells. TA3 attenuates migration and invasion of MG63 cells via regulations of two matrix metalloproteinases (MMPs), MMP-2 and MMP-9, which are involved with cancer metastasis in various cancer cells. TA3 reduced enzymatic activities and transcriptional expressions of MMP-2 and MMP-9 in MG63 cells. TA3 also inhibited Src, focal adhesion kinase, extracellular signal-regulated kinase (ERK1/2), c-Jun N-terminal kinase (JNK), p38, ${\beta}-catenin$, and cAMP response element binding signaling, which regulate migration and invasion of cells. TA3 induced apoptosis of MG63 cells via regulations of caspase-3, caspase-7, and poly(ADP-ribose) polymerase (PARP). Then, we tested several ginsenosides to be used in combination with TA3 for the synergistic anticancer effects. We found that ginsenosides Rb1 and Rc have synergistic effects on TA3-induced apoptosis in MG63 cells. Methods: We investigated the anticancer effects of TA3 and synergistic effects of various ginseng saponins on TA3-induced apoptosis in MG63 cells. To test antimetastatic effects, we performed wound healing migration assay, Boyden chamber invasion assays, gelatin zymography assay, and Western blot analysis. Annexin V/PI staining apoptosis assay was performed to determine the apoptotic effect of TA3 and ginsenosides. Results: TA3 attenuated migration and invasion of MG63 cells and induced apoptosis of MG63 cells. Ginsenosides Rb1 and Rc showed the synergistic effects on TA3-induced apoptosis in MG63 cells. Conclusions: The results strongly suggest that the combination of TA3 and the two ginsenosides Rb1 and Rc may be a strong candidate for the effective antiosteosarcoma agent.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2002.11a
• /
• pp.14-19
• /
• 2002

In this study, as Cu diffusion barrier, tantalum nitrides were successfully deposited on Si(100) substrate and SiO2 by plasma assisted atomic layer deposition(PAALD) and thermal ALD, using pentakis (ethylmethlyamino) tantalum (PEMAT) and $NH_3$ as precursors. The TaN films were deposited on $250^{\circ}$C by both method. The growth rates of TaN films were $0.8{\AA}$/cycle for PAALD and $0.75{\AA}$/cycle for thermal ALD. TaN films by PAALD showed good surface morphology and excellent step coverage for the trench with an aspect ratio of h/w - $1.8 : 0.12 \mu\textrm{m}$ but TaN films by thermal ALD showed bad step coverage for the same trench. The density for PAALD TaN was $11g/\textrm{cm}^3$ and one for thermal ALD TaN was $8.3g/\textrm{cm}^3$. TaN films had 3 atomic % carbon impurity and 4 atomic % oxygen impurity for PAALD and 12 atomic % carbon impurity and 9 atomic % oxygen impurity for thermal ALD. The barrier failure for Cu(200nm)/TaN(l0nm)/$SiO_2(85nm)$/Si structure was shown at temperature above $700^{\circ}$C by XRD, Cu etch pit analysis.

• Journal of the Korean Society for Heat Treatment
• /
• v.30 no.2
• /
• pp.53-60
• /
• 2017

The aim of this study is to examine a feasibility to substitute Ti for Ta in reduced activation ferritic/martensitic (RAFM) steel by comparing a Ti-added RAFM steel with a conventional Ta-added RAFM steel. The microstructures and mechanical properties of Ta-, and Ti-added RAFM steels were investigated and a relationship between microstructures and mechanical properties was considered based on quantitative analysis of precipitates in two RAFM steels. Ta-, and Ti-added RAFM steels were normalized at $1000{\sim}1040^{\circ}C$ for 30 min and tempered at $750^{\circ}C$ for 2 hr. Both RAFM steels had very similar microstructures, that is, typical tempered martensite with relatively coarse $M_{23}C_6$ carbides at boundaries of grain and lath, and fine MX precipitates inside laths. The MX precipitates were identified as TaC in Ta-added RAFM steel and TiC or (Ti, W)C in Ti-added RAFM steel, respectively. It is believed that these RAFM steels show similar tensile and Charpy impact properties due to similar microstructures. Precipitate hardening and brittle fracture strength calculated with quantitative analysis of precipitates elucidated well the similar behaviors on the tensile and Charpy impact properties of Ta-, and Ti-added RAFM steels.

• Journal of the Korean Chemical Society
• /
• v.29 no.6
• /
• pp.599-607
• /
• 1985

Near-ir spectra have been obtained for the $ν_3$+ Amide II combination thioacetamide(TA) band in CC$l_4$ and TA-DMP in CC$l_4$ in the range of 5 to 55${\circ}C$. Absorbance of the weak bands of the DMP and solvent has been compensated. The spectra are analyzed by the computer resolution into two Lorentzian-Gaussian product bands which have been identified with monomeric TA and 1 : 1 TA-DMP complex. Equilibrium constants and thermodynamic parameters for the hydrogen bonding between TA and DMP have been evaluated by the analysis of the concentration and temperature dependent spectra for the very dilute CC$l_4$ solutions. The $ΔH{\circ} and ΔS{\circ}$ of TA and DMT have been found to be -14.6 kJmo$l^{-1}$ and -16.2 Jmo$l^{-1}$ de$g^{-1}$.

• Journal of Environmental Health Sciences
• /
• v.24 no.2
• /
• pp.68-73
• /
• 1998

This is a study on the risk assessment of drinking water using mutagenicity testing. The tests have been carried with the raw water, treated water, and drinking water (tap water) in Kwangju and Mokpo areas. The Ames preincubation test was carried concentrating samples using by Sep-Pak PLUS cartriges in Salmonella typhimurium TA100 and TA98. The samples were tested with several chemical water quality analysis. The THMs have not been measured in raw water, but measured treated water and tap water at a value of 7.135-12.473 $\mu$g/l. It was observed that the number of revertants colonies increased in treated water and tap water on TA100 without S9 and showed weak mutagenicity on TA98 without S9. Indirect mutation was not seen in TA100 and TA98 with S9. The results indicated that formed substances of treatment process's of water that increased mutagenicity.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.619-619
• /
• 2013

The interfacial state between $Ta_2O_5$ and a Si substrate during the growth of $Ta_2O_5$ films by atomic layer deposition (ALD) was investigated using in-situ synchrotron radiation photoemission spectroscopy (SRPES). A newly synthesized liquid precursor Ta($N^tBu$) $(dmamp)_2Me$ was used as the metal precursor, with Ar as a purging gas and $H_2O$ as the oxidant source. After each half reaction cycle, samples were analyzed using in-situ SRPES under ultrahigh vacuum at room temperature. SRPES analysis revealed that Ta suboxide and Si dioxide were formed at the initial stages of $Ta_2O_5$ growth. However, the Ta suboxide states almostdisappeared as the ALD cycles progressed. Consequently, the $Ta^{5+}$ state, which corresponds with the stoichiometric $Ta_2O_5$, only appeared after 4.0 cycles. Additionally, tantalum silicate was not detected at the interfacial states between $Ta_2O_5$ and Si. The measured valence band offset between $Ta_2O_5$ and the Si substrate was 3.22 eV after 3.0 cycles.