• 제목/요약/키워드: SnO thin film

검색결과 361건 처리시간 0.028초

대면적 기판의 투명 전극용 SnO2 박막 증착을 위한 APCVD 공정 (APCVD Process of SnO2 Thin-Film on Glass for Transparent Electrodes of Large-Scale Backplanes)

  • 김병국;김현수;김형준;박준우;김윤석;박승호
    • 대한기계학회논문집 C: 기술과 교육
    • /
    • 제1권1호
    • /
    • pp.7-12
    • /
    • 2013
  • $SnO_2$ (tin oxide) 박막은 물리적, 전기적 성질이 우수하여 첨단산업의 다양한 분야에서 널리 응용/개발되고 있다. 이의 응용대상은 다양한 센서, 윈드쉴드(windshield) 윈도우의 히팅 요소, 태양전지, flat panel diplay에서의 투명전극을 들 수 있다. 본 연구에서는 대면적 기판에 대한 APCVD 공정개발을 위하여 실험용 2세대 크기의 유리기판에 $SnO_2$ 박막증착 실험을 수행하였다. 증착 온도가 증가함에 따라 증착 두께가 두꺼워지고 이에 따라 면저항은 감소, 투과도는 감소, 연무도 (haze)는 증가함을 확인하였다. 증착을 위한 전구체인 $SnCl_4$의 유량이 증가함에 따라 증착 두께 역시 증가하고 이에 따라 면저항은 감소한다. 그러나 투과도와 연무도는 $SnCl_4$ 유량의 영향을 거의 받지 않는다는 것을 확인하였다.

ION BEAM AND ITS APPLICATIONS

  • Koh, S.K.;Choi, S.C.;Kim, K.H.;Cho, J.S.;Choi, W.K.;Yoon, Y.S.;Jung, H.J.
    • 한국진공학회지
    • /
    • 제6권S1호
    • /
    • pp.110-114
    • /
    • 1997
  • Development of metal ion source growth of high quality Cu metal film formation of non-stoichiometric $SnO_2$ films of Si(100), and modification fo polymer surface by low enregy ion beam have been carried out at KIST Ion Beam Lab. A new metal ion source with high ion beam flux has been developed by a hybrid ion beam (HIB) deposition and non-stoichiometric $SnO_2$ films are controlled by supplying energy. The ion assisted reaction (IAR) in which keV ion beam is irradiated in reactive gas environment has been deveolped for modifying the polymers and enhancing adhesion to other materials and advantages of the IAR have been reviewed.

  • PDF

PE-ALD를 이용한 SnO2 Thin Film의 특성 (Characteristics of Tin Oxide Thin Films Deposited by PE-ALD)

  • 박용주;이운영;최용국;이현규;박진성
    • 한국재료학회지
    • /
    • 제14권12호
    • /
    • pp.840-845
    • /
    • 2004
  • Tin dioxide ($SnO_2$) thin films were prepared on Si(100) substrate by PE-ALD using the $DBDTA((CH_{3}CO_2)_{2}Sn[(CH_2)_{3}CH_3]_2)$ Precursor. The properties were studied as a function of source temperature, substrate temperature, and purging time. Scanning probe microscopic images at the source temperature $50^{\circ}C$ and the substrate temperature $300^{\circ}C$ shows lower roughness than those $40/60^{\circ}C$ source and $200/400^{\circ}C$ substrate temperature samples. The purging time for optimum process was 8sec and the deposition rate was about 1 nm per 10 cycles. The conductance of $SnO_2$ thin film showed a constant region in the range of $200^{\circ}C\;to\;500^{\circ}C$. The thin films deposited for 200 cycle show a better sensitivity to CO gas.

SnO/Sn 혼합 타겟으로 스퍼터 증착된 SnO 박막의 열처리 효과 (Study of the effect of vacuum annealing on sputtered SnxOy thin films by SnO/Sn composite target)

  • 김철;조승범;김성동;김사라은경
    • 마이크로전자및패키징학회지
    • /
    • 제24권2호
    • /
    • pp.43-48
    • /
    • 2017
  • SnO:Sn(80:20 mol%) 혼합 타겟을 이용한 RF 반응성 스퍼터링으로 투명하고 전도성이 있는 $Sn_xO_y$ 박막을 증착하였다. 혼합 타겟은 화학적으로 안정한 조성과 높은 투과도를 주는 세라믹 타겟과 Sn과 산소의 반응성 증착으로 박막내 구조적 결함 조절이 용이한 금속 타겟의 장점을 고루 택하고 있다. 산소 분압 0%~12% 구간에서 박막을 증착하였으며, 증착 후 $300^{\circ}C$에서 1시간 동안 진공 열처리를 진행하였다. Sn 함량이 많은 $P_{O2}=0%$의 경우를 제외하고 모든 시편들은 열 처리 전후에 80~90% 이상의 투과도를 보였으며, 안정된 p형 $Sn_xO_y$ 박막은 $P_{O2}=12%$에서 확인하였고, $P_{O2}=12%$에서 열 처리 후 캐리어 농도와 이동도는 각각 $6.36{\times}10^{18}cm^{-3}$$1.02cm^2V^{-1}s^{-1}$ 이었다.

RF-마그네트론 스퍼터링에 의해 제조된 In1.6Zn0.2Sn0.2O3-δ 박막의 투과율 및 전기 전도성에 미치는 증착 온도의 영향 (Effect of the Deposition Temperature on the Transmittance & Electrical Conductivity of In1.6Zn0.2Sn0.2O3-δ Thin Films Prepared by RF-magnetron Sputtering)

  • 서한;지미정;안용태;주병권;최병현
    • 한국세라믹학회지
    • /
    • 제49권6호
    • /
    • pp.663-668
    • /
    • 2012
  • In order to reduce the indium contents in transparent conducting oxide(TCO) thin films of $In_{1.6{\sim}1.8}Zn_{0.2}Sn_{0.2{\sim}0.4}O_3$ (IZTO), $In_{1.6}Zn_{0.2}Sn_{0.2}O_{3-{\delta}}$(IZTO) was prepared by replacing indium with Zn and Sn. The TCO films were deposited via RF-magnetron sputtering of the IZTO target at various deposition temperatures and its film characteristics were investigated. When deposited in an Ar atmosphere at $400^{\circ}C$, the electrical resistivity of the film decreased to $6.34{\times}10^{-4}{\Omega}{\cdot}cm$ and the optical transmittance was 80%. As the deposition temperature increased, the crystallinity of the IZTO film was enhanced. As a result, the electrical conductivity and transmittance properties were improved. This demonstrates the possibility of replacing ITO TCO film with IZTO.

H2S Micro Gas Sensor Based on a SnO2-CuO Multi-layer Thin Film

  • Kim, Sung-Eun;Choi, Woo-Chang
    • Transactions on Electrical and Electronic Materials
    • /
    • 제13권1호
    • /
    • pp.27-30
    • /
    • 2012
  • This paper proposes a micro gas sensor for measuring $H_2S$ gas. This is based on a $SnO_2$-CuO multi-layer thin film. The sensor has a silicon diaphragm, micro heater, and sensing layers. The micro heater is embedded in the sensing layer in order to increase the temperature to an operating temperature. The $SnO_2$-CuO multi layer film is prepared by the alternating deposition method and thermal oxidation which uses an electron beam evaporator and a thermal furnace. To determine the effect of the number of layers, five sets of films are prepared, each with different number of layers. The sensitivities are measured by applying $H_2S$ gas. It has a concentration of 1 ppm at an operating temperature of $270^{\circ}C$. At the same total thickness, the sensitivity of the sensor with multi sensing layers was improved, compared to the sensor with one sensing layer. The sensitivity of the sensor with five layers to 1 ppm of $H_2S$ gas is approximately 68%. This is approximately 12% more than that of a sensor with one-layer.

전자빔증발법에 의한 Ba(Ti,Sn)O3막의 제조 및 특성 (Synthesis and Properties of Ba(Ti,Sn)O3 Films by E-Beam Evaporation)

  • 박상식
    • 한국재료학회지
    • /
    • 제18권7호
    • /
    • pp.373-378
    • /
    • 2008
  • $Ba(Ti,Sn)O_3$ thin films, for use as dielectrics for MLCCs, were grown from Sn doped BaTiO3 sources by e-beam evaporation. The crystalline phase, microstructure, dielectric and electrical properties of films were investigated as a function of the (Ti+Sn)/Ba ratio. When $BaTiO_3$ sources doped with $20{\sim}50\;mol%$ of Sn were evaporated, $BaSnO_3$films were grown due to the higher vapor pressure of Ba and Sn than of Ti. However, it was possible to grow the $Ba(Ti,Sn)O_3$ thin films with {\leq}\;15\;mol%$ of Sn by co-evaporation of BTS and Ti metal sources. The (Ti+Sn)/Ba and Sn/Ti ratio affected the microstructure and surface roughness of films and the dielectric constant increased with increasing Sn content. The dielectric constant and dissipation factor of $Ba(Ti,Sn)O_3$ thin films with {\leq}\;15\;mol%$ of Sn showed the range of 120 to 160 and $2.5{\sim}5.5%$ at 1 KHz, respectively. The leakage current density of films was order of the $10^{-9}{\sim}10^{-8}A/cm^2$ at 300 KV/cm. The research results showed that it was feasible to grow the $Ba(Ti,Sn)O_3$ thin films as dielectrics for MLCCs by an e-beam evaporation technique.

F-Doped SnO2 Thin Film/Ag Nanowire 이중층의 전기적 및 광학적 특성 (Electrical and Optical Properties of F-Doped SnO2 Thin Film/Ag Nanowire Double Layers)

  • 김종민;구본율;안효진;이태근
    • 한국재료학회지
    • /
    • 제25권3호
    • /
    • pp.125-131
    • /
    • 2015
  • Fluorine-doped $SnO_2$ (FTO) thin film/Ag nanowire (NW) double layers were fabricated by means of spin coating and ultrasonic spray pyrolysis. To investigate the optimum thickness of the FTO thin films when used as protection layer for Ag NWs, the deposition time of the ultrasonic spray pyrolysis process was varied at 0, 1, 3, 5, or 10 min. The structural, chemical, morphological, electrical, and optical properties of the double layers were examined using X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, transmission electron microscopy, the Hall effect measurement system, and UV-Vis spectrophotometry. Although pure Ag NWs formed isolated droplet-shaped Ag particles at an annealing temperature of $300^{\circ}C$, Ag NWs covered by FTO thin films maintained their high-aspect-ratio morphology. As the deposition time of the FTO thin films increased, the electrical and optical properties of the double layers degraded gradually. Therefore, the double layer fabricated with FTO thin films deposited for 1 min exhibited superb sheet resistance (${\sim}14.9{\Omega}/{\Box}$), high optical transmittance (~88.6 %), the best FOM (${\sim}19.9{\times}10^{-3}{\Omega}^{-1}$), and excellent thermal stability at an annealing temperature of $300^{\circ}C$ owing to the good morphology maintenance of the Ag NWs covered by FTO thin films.

Effect of CuO-V2O5 Addition on Microwave Dielectric Properties of (Pb0.45Ca0.55(Fe0.5Nb0.5)0.9Sn0.1]O3 Ceramics

  • Ha, Jong-Yoon;Choi, Ji-Won;Yoon, Ki-Hyun;Choi, Doo-Jin;Yoon, Seok-Jin;Kim, Hyun-Jai
    • 한국세라믹학회지
    • /
    • 제41권1호
    • /
    • pp.9-12
    • /
    • 2004
  • The effect of x wt% CuO-y wt% $V_2O_5$ content on the microwave properties of $(Pb_{0.45}Ca_{0.55})[(Fe_{0.5}Nb_{0.5})_{0.9}Sn_{0.1}]O_3$ (PCFNS) ceramics was investigated. In order to decrease the sintering temperature and use as a Low Temperature co-firing Ceramics (LTCC), CuO-$V_2O_5$ are added in the PCFNS. The bulk density, dielectric constant (${\varepsilon}_r$) and quality factor(Q${\cdot}f_0$) increased with increase in CuO content within a limited value. The microwave properties were degraded with increases in $V_2O_5$ content. The temperature coefficient of the resonant frequency (${\tau}_f$) of PCFNS was shifted to positive value abruptly with increasing the $V_2O_5$ content, while the ${\tau}_f$ was slightly shifted to positive value with increasing the CuO content. The optimized microwave properties, ${\varepsilon}_r$ = 88, Q${\cdot}f_0$ = 6100 (GHz), and ${\tau}_f$ = 18 ppm/$^{\circ}C$, were obtained in $(Pb_{0.45}Ca_{0.55})[(Fe_{0.5}Nb_{0.5})_{0.9}Sn_{0.1}]O_3$ with 0.2wt% CuO 0.05 wt% $V_2O_5$ and sintered at $1000^{\circ}C$ for 3 h. The relationship between the microstructure and microwave dielectric properties of ceramics was studied by X-Ray Diffraction (XRD) and Scanning Electron Microscopy (SEM)