ION BEAM AND ITS APPLICATIONS

  • Koh, S.K. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Choi, S.C. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Kim, K.H. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Cho, J.S. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Choi, W.K. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Yoon, Y.S. (Thin Film Technology Research Center Korea Institute of Science and Technology) ;
  • Jung, H.J. (Thin Film Technology Research Center Korea Institute of Science and Technology)
  • Published : 1997.10.01

Abstract

Development of metal ion source growth of high quality Cu metal film formation of non-stoichiometric $SnO_2$ films of Si(100), and modification fo polymer surface by low enregy ion beam have been carried out at KIST Ion Beam Lab. A new metal ion source with high ion beam flux has been developed by a hybrid ion beam (HIB) deposition and non-stoichiometric $SnO_2$ films are controlled by supplying energy. The ion assisted reaction (IAR) in which keV ion beam is irradiated in reactive gas environment has been deveolped for modifying the polymers and enhancing adhesion to other materials and advantages of the IAR have been reviewed.

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