• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.105-106
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• 2013

Surface plasmon resonance (SPR) is classified into the propagating surface plasmon (PSP) excited on flat metal surfaces and the local surface plasmon (LSP) excited by metalnanoparticles. It is known that fluorescence signals are enhanced by these two SPR-fields.On the other hand, fluorescence is quenched by the energy transfer to metal (FRET). Bothphenomena are controlled by the distance between dyes and metals, and the degree offluorescence enhancement is determined by the correlation. In this study, we determined thecondition to achieve the maximum fluorescence enhancement by adjusting the distance of ametal nanoparticle 2D sheet and a quantum dots 2D sheet by the use of $SiO_2$ spacer layers. The 2D sheets consisting of myristate-capped Ag nanoparticles (AgMy nanosheets) wereprepared at the air-water interface and transferred onto hydrophobized gold thin films basedon the Langmuir-Schaefer (LS) method [1]. The $SiO_2$ sputtered films with different thickness (0~100 nm) were deposited on the AgMy nanosheet as an insulator. TOPO-cappedCdSe/CdZnS/ZnS quantum dots (QDs, ${\lambda}Ex=638nm$) [2] were also transferred onto the $SiO_2$ films by the LS method. The layered structure is schematically shown in Fig. 1. The result of fluorescence measurement is shown in Fig. 2. Without the $SiO_2$ layer, the fluorescence intensity of the layered QD film was lower than that of the original QDs layer, i.e., the quenching by FRET was predominant. When the $SiO_2$ thickness was increased, the fluorescence intensity of the layered QD film was higher than that of the original QDs layer, i.e., the SPR enhancement was predominant. The fluorescence intensity was maximal at the $SiO_2$ thickness of 20 nm, particularly when the LSPR absorption wavelength (${\lambda}=480nm$) was utilized for the excitation. This plasmonic nanosheet can be integrated intogreen or bio-devices as the creation point ofenhanced LSPR field.

• Transactions on Electrical and Electronic Materials
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• 제18권5호
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• pp.250-252
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• 2017

High-performance full swing logic inverters were fabricated using amorphous 1 wt% Si doped indium-zinc-oxide (a-SIZO) thin films with different channel layer thicknesses. In the inverter configuration, the threshold voltage was adjusted by varying the thickness of the channel layer. The depletion mode (D-mode) device used a TFT with a channel layer thickness of 60 nm as it exhibited the most negative threshold voltage (-1.67 V). Inverters using enhancement mode (E-mode) devices were fabricated using TFTs with channel layer thicknesses of 20 or 40 nm with excellent subthreshold slope (S.S). Both the inverters exhibited high voltage gain values of 30.74 and 28.56, respectively at $V_{DD}=15V$. It was confirmed that the voltage gain can be improved by increasing the S.S value.

• 한국전기전자재료학회논문지
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• 제26권12호
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• pp.858-862
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• 2013

The front electrode should be used to make solar cell panel so as to collect electron. The front electrode is used by paste type, printed on the Si-solar cell wafer and sintered at about $800^{\circ}C$. The paste is composed Ag powder and glass frit which make the ohmic contact between Ag electrode and n-type semiconductor layer. From the previous study, the Ag electrodes which used two commercial glass frit of Bi-system were so different on the interface resistance. The main composition of them was Bi-Zn-B-Si-O and few additives added in one of them. In this study, glass frit was made with the ratio of $Bi_2O_3$ and ZnO on the main composition, and then paste using glass frit was prepared respectively. And, also, the paste using the glass frit added oxide additives were prepared. The change of interface resistance was not large with the ratio of $Bi_2O_3$ and ZnO. In the case of G6 glass frit, 78 wt% $Bi_2O_3$ addition, the interface resistance was $190{\Omega}$ and most low. In the glass frit added oxide, the case of Ca increased over 10 times than it of G6 glass frit on the interface resistance. It was thaught that after sintering, Ca added glass frit was not flowed to the interface between Ag electrode and wafer but was in the Ag electrode.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2011년도 추계학술발표대회
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• pp.42.1-42.1
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• 2011

박막형 디스플레이구서에 있어서 투명전극은 필수적이다. 투명전극은 정보를 표시하기 위해 빛을 외부로 방출시키거나 태양광 등을 소자 내부로 입사시켜야 한다. 또한 전극을 형성하는 박막은 높은 광투과율과 ${\sim}10-4{\Omega}cm$ 정도의 낮은 전기비저항을 가져야 한다. 가장 널리 사용되는 투명전극으로 ITO (Indium Tin Oxide)는 인듐의 독성, 저온증착의 어려움, 스퍼터링시 음이온 충격에 의한 막 손상으로 저항의 증가 및 액정디스플레이의 투명전극으로 사용될 경우 $400^{\circ}C$정도의 높은 온도와 수소플라즈마 분위기에서 장시간 노출시 열화로 인한 광학적 특성변화가 문제로 지적된다. 이러한 문제 해결의 대안으로 ZnO 산화물 반도체가 있는데 ITO 박막에 비해 비저항이 높기 때문에 도핑을 이용한 비저항을 ${\sim}10-4{\Omega}cm$ 정도로 낮추어야 한다. 투명전도막으로는 ITO, FTO 등과 더블어 체적 저항율은 다소 높으나 환원성 분위기에 대한 내성, 가시광 영역에서의 높은 광투과율과 저렴한 가격 등의 장점 등으로 AZO 박막이 주목 받고 있다. ZnO는 ITO 나 FTO에 비해서 700 kJ/mol의 큰 분해에너지를 가지므로 코팅 때 발생하는 전도도 및 투과율이 나빠지는 현상이 발생하지 않는 특징이 있으며, 위의 두 재료에 비해 밴드갭도 가장 낮아서 자외선 투과율이 낮다. 그러나 내습성이 약하기 때문에 이를 보완하기 위하여 내습성향상과 전도성 향상을 위해서 3족 원소인 B, In, Al, Ga 등을 도핑한 ZnO 투명전도막의 연구가 진행되고 있다. 이러한 원소들 중에서 Al로 도핑했을 때 가장 낮은 비저항을 얻을 수 있다고 알려져 있다. 본 연구에서는 SiOC 박막위에 AZO 박막을 제조하기 위하여 RF 마그네트론 스퍼터링법을 이용하여 박막을 성장시켰으며, 박막의 전기적 및 광학적 특성을 조사하였다. AZO 박막은 rf power가 5~200 W인 RF 마그네트론 스퍼터 방법에 의해서 제작되었다. SiOC 박막은 산소와 DMDMOS 전구체의 유량비를 다르게 하여 플라즈마 발생 화학적 기상 증착방법으로 증착되었다. 증착된 SiOC박막은 UV visible spectroscopy에 의해서 분석하였다. 투명전극의 비저항은 rf 전력이 작을 수록 낮았으며, SiOC 절연막 위에 AZO를 증착시킨 후 반사률은 반대로 바뀌는 것을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.203.1-203.1
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• 2013

Zinc oxide (ZnO) nanocrystalline thin films on various growth temperatures for active layer and different buffer layer thickness were grown by plasma-assisted molecular beam epitaxy (PA-MBE) on Si substrates. The ZnO active layer were grown with various growth temperature from 500 to $800^{\circ}C$ and the ZnO buffer layer were grown for different time from 5 to 40 minutes. To investigate the structural and optical properties of the ZnO thin films, scanning electron microscope (SEM), X-ray diffractometer (XRD), and photoluminescence (PL) spectroscopy were used, respectively. In the SEM images, the ZnO thin films have high densification of grains and good roughness and uniformity at $800^{\circ}C$ for active layer growth temperature and 20 minutes for buffer layer growth time, respectively. The PL spectra of ZnO buffer layers and active layers display sharp near band edge (NBE) emissions in UV range and broad deep level emissions (DLE) in visible range. The intensity of NBE peaks for the ZnO thin films significantly increase with increase in the active layer growth temperature. In addition, the NBE peak at 20 minutes for buffer layer growth time has the largest emission intensity and the intensity of DLE peaks decrease with increase in the growth time.

• 한국세라믹학회지
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• 제52권4호
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• pp.290-293
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• 2015

The properties of the IZTO thin films on the glass were studied with a variation of the $SiO_2$ buffer layer thickness. $SiO_2$ buffer layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on the glass, and the In-Zn-Tin-Oxide (IZTO) thin films were deposited on the buffer layer by RF magnetron sputtering. All the IZTO thin films with the $SiO_2$ buffer layer are shown to be amorphous. Optimum $SiO_2$ buffer layer thickness was obtained through analyzing the structural, morphological, electrical, and optical properties of the IZTO thin films. As a result, the IZTO surface roughness is 0.273 nm with a sheet resistance of $25.32{\Omega}/sq$ and the average transmittance is 82.51% in the visible region, at a $SiO_2$ buffer layer thickness of 40 nm. The result indicates that the uniformity of surface and the properties of the IZTO thin film on the glass were improved by employing the $SiO_2$ buffer layer and the IZTO thin film can be applied well to the transparent conductive oxide for display devices.

• 한국세라믹학회지
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• 제40권11호
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• pp.1127-1131
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• 2003

인삼염유리는 전자부품분야에서 저온소성유리로 그 활용범위가 넓은 편이나 높은 열팽창계수로 알칼리 산화물 등을 첨가하여 그 특성을 조정하고 있다. 본 연구에서는 P$_2$O$_{5}$-SnO-ZnO-SiO$_2$/B$_2$O$_3$ 유리계에 대하여 열적특성으로 선팽창계수와 유리전이온도, 용융온도 등을 측정하여 그들 값의 상관관계를 고찰하였다. 이러한 결과는 다른 인삼염 유리와 비교하였을때 선팽창계수와 유리전이온도의 곱이 일정한 값으로 나타나서 이들 중의 하나의 값으로부터 간접적으로 다른 변수를 측정 할 수 있는 한 방법이 될 수 있다.

• Electronic Materials Letters
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• 제14권6호
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• pp.749-754
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• 2018

Previous studies have reported on the mechanical robustness and chemical stability of flexible amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) on plastic substrates both in flat and curved states. In this study, we investigate how the polyimide (PI) substrate affects hydrogen concentration in the a-IGZO layer, which subsequently influences the device performance and stability under bias-temperature-stress. Hydrogen increases the carrier concentration in the active layer, but it also electrically deactivates intrinsic defects depending on its concentration. The influence of hydrogen varies between the TFTs fabricated on a glass substrate to those on a PI substrate. Hydrogen concentration is 5% lower in devices on a PI substrate after annealing, which increases the hysteresis characteristics from 0.22 to 0.55 V and also the threshold voltage shift under positive bias temperature stress by 2 ${\times}$ compared to the devices on a glass substrate. Hence, the analysis and control of hydrogen flux is crucial to maintaining good device performance and stability of a-IGZO TFTs.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.926-929
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• 2007

A significant progress has been made in the characterization of zinc oxide (ZnO) semiconductor as a new semiconductor layer instead of amorphous Si semiconductor used in thin film transistor due to its high electron mobility at low deposition temperature which is quite suitable for flexible display and OLED devices. The wet pattering of ZnO is another important issue with regard to mass production of ZnO thin film transistor device. However, the wet behavior of ZnO thin film in aqueous wet etching solutions conventionally used un TFT industry has not been reported yet, in this work, wet corrosion behavior of RF magnetron sputtered ZnO thin film in various wet solutions such as phosphoric and nitric acid solutions was studied using by electrochemical analysis. The effects of deposition parameters such as RF power and oxygen partial pressure on corrosion rate are also examined.

• 한국재료학회지
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• 제10권1호
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• pp.49-54
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• 2000

PDP용의 새로운 녹색 $Al_3GdB_4O_{12}:Tb^{3+} 형광체와 Al_3GdB_4O_{12}:Eu_{3+}$ 적색형광체를 제조한 후 광특성을 분석하였다. 또한 이들 형광체의 발광특성을 상용품인 $Zn_2SiO_4:Mn^{2+}$ 녹색 형광체와 $(Y,Gd)BO_3: Eu^{3+}$ 적색의 PDP 형광체와 상호 비교하였다. 형광체는 $1150^{\circ}C$에서 4시간 동안 공상 반응으로 제조하였다. 147nm의 진공자외선 조사시 $Al_3GdB_4O_{12}:Tb^{3+}$(15mol%) 녹색 형광체의 발광휘도는 상용품 $Zn_2SiO_4: Mn^{2+}$ 보다 증가하였으나 색좌표는 상대적으로 저하되었다. 한편 $Al_3GdB_4O_{12}:Eu^{3+}$(15mol%) 적색 형광체의 발광 휘도는 상용품$(Y,Gd)BO_3: Eu^{3+}$ 보다 작았으나 CIE 색좌표는 일부 개선되었다. $Al_3GdB_4O_{12}$ 형광체는 $\lambda=160nm$에서 모체 흡수에 의한 강한 여기밴드가 있으며, 진공자외선 영역에서 $Al_3GdB_4O_{12}:Tb^{3+}$ 녹색형광체의 여기강도는 $Zn_2SiO_4: Mn^{2+}$ 보다 컸으나 $Al_3GdB_4O_{12}:Eu^{3+}$ 적색 형광체의 여기강도는 $(Y,Gd)BO_3: Eu^{3+}$ 보다는 작았다.