• Journal of the Korean Crystal Growth and Crystal Technology
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• v.6 no.4
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• pp.552-557
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• 1996

Microstructural development of $Si_3N_4$/20 vol% SiC nanocomposites doped 2 wt% $Al_2O_3$ and 6 wt% $Y_2O_3$ as sintering additives were analyzed by sintering interruption. Density of samples was significantly increased between $1500^{\circ}C$ and $1700^{\circ}C$, and near full density was achieved at $1800^{\circ}C$. Transformation rate from $\alpha-Si_3N_4$ to $\betha-Si_3N_4$ was increased at $1700^{\circ}C$ and $1800^{\circ}C$, and then elongated matrix grains were appeared. Small size SiC particles had suppressive effect on densification rate and transformation of $Si_3N_4$ phase.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.6
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• pp.558-562
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• 1999

For 6H-SiC crystals which was obtained by sublimation growth, the formation of micropipes and internal planar defects was discussed in consideration of the inter-relationship between mass adsorption behavior and the defects origin on the growth interface on the basis of KSV theory and the the step growth pattern on the vicinal plane. Micropipes and planar defects was formed in the region which the step could not be grown by impurities impinging. It was realized that the internal defects formation was related to the crystallographic step planes formed on the growth interface and the migration of the molecules adsorbed on it.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.6
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• pp.57-62
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• 1989

Sputter-deposited Ti film on Si substrates which were implanted with various doses of As was annealed at the temperature of 600-900$^{circ}C$ for 20 sec in Ar atmosphere. The sheet resistance of Ti-silicides was measured by 4-point probe, the thickness by $alpha$-step, and observed the behavior of As dopant in Si substrates by ASR. With increasing As doses, the thickness of Ti-silicides decreased and the sheet resistance of Ti-silicides increased. And we discussed the relationships between the above results and the factors of Si diffusion.

• Proceedings of the KIEE Conference
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• 1989.11a
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• pp.127-130
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• 1989

This paper reports the theoretical model and the experimental results regarding to the electrical conductivity of hydrogenated amorphous silicon (a-Si:H). The total effective conductance of a-Si:H with a planar structure has been considered as the sum of the conductance of an adsorbate-induced layer, a surface-interface layer, a bulk layer, and a substrate-interface layer. In order to investigate the effects of space charge layers in a-Si:H on the conductivity, the thickness dependence of the conductivity is characterized and the conductivities measured at the upper electrodes deposited on a-Si:H are compared with those measured at the lower electrodes deposited on the glass substrate. From our analysis, the bulk conductivity and the thickness of the space charge layer in a-Si:H are characterized quantitatively.

• Journal of the Korean Institute of Telematics and Electronics
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• v.21 no.6
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• pp.51-55
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• 1984

Band headings, at grain boundary and surface of polycrystalline thin semiconductor films, were assumed. thin film ransistor conduction theory which considered trapping at surface of semiconductor was proposed. CdSe Thin Film Transistors were fabricated. CdSe was thermal evaporated and SiO2 used as insulator was rf sputtered. Output characteristics which was calculated by conduction theory were compared with experimental results.

• The Journal of Korean Philosophical History
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• no.59
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• pp.343-370
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• 2018

Jeong Si-Han(丁時翰) completed "Siqibianzheng"("四七辨證") at the age of 72, and later had the argument over Runwuxingtongyilunzheng(人物性同異論爭) with his disciple, Lee Sik(李?). Jeong Si-Han(丁時翰) had the position of Runwuxingyilun(人物性異論) and Lee Sik(李?) Runwuxingtonglun(人物性同論). Yet, the argument over Runwuxingtongyilunzheng(人物性同異論爭) had been forgotten and "Siqibianzheng"("四七辨證") could be acknowledged because Toegye school(退溪學派) and Yulgok school(栗谷學派) were conflicting and criticizing each other's stance at that time. It seems like Lee Hyeon-Il(李玄逸)'s "Liqulishilunsiduanqiqingshubian"("栗谷李氏論四端七情書辨") had a great influence on the completion of "Siqibianzheng" ("四七辨證"). Lee Yi(李珥)'s thought of Siduan(四端) and Qiqing(七情) was 'the position of Hunlun(渾淪)' that 'Qiqing(七情) includes Siduan(四端)', and Lee Hwang(李滉) had the 'position of Fenkai(分開)' that Siduan(四端) and Qiqing(七情) should be interpreted differently. Jeong Si-Han(丁時翰) criticized the stance of Hunlun(渾淪) from the position of Fenkai(分開). What did Jeong Si-Han(丁時翰) try to pursue through "Siqibianzheng"("四七辨證")? This fact tends to make us forget the controversy over Runwuxingtongyilunzheng(人物性同異論爭) between Jeong Si-Han(丁時翰) and disciple Lee Sik(李?). Now we know the fact that Jeong Si-Han(丁時翰) criticized Lee Yi(李珥) in "Siqibianzheng"("四七辨證"), but don't care much about the fact that Jeong Si-Han(丁時翰) caused the controversy over Runwuxingtongyilun(人物性同異論). Why "Siqibianzheng"("四七辨證") has remained in our memory even though it was an important one? It might be because "Siqibianzheng"("四七辨證") had an impact on Lee Sik(李?), Shin Hu-Dam(愼後聃), and even Jeong Yak-Yong(丁若鏞) in the process of summarizing the arguments over Siduanqiqinglunzheng(四端七情論爭) since Jeong Si-Han(丁時翰) regardless of whether Jeong Si-Han(丁時翰) had hoped it or not.

• Korean Journal of Materials Research
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• v.6 no.3
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• pp.309-317
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• 1996

세가지 다른 방법을 이용하여 형성시킨 비정질 실리콘(SiH4 a-Si, Si2H6 a-Si, Si+ implanted SiH4 a-Si)들에 대한 저온 결정화 기구의 차이를 고전적 이론인 Avrami 식(X=1-exptn, X=결정화 분율, t=열처리 시간, n=지수)을 이용하여 검토하였다. Silane으로 형성된 비정질 실리콘의 결정화 과정에서는 Avrami 식에서의 n의 값이 2.0을 나타내고 있어, 결정성장이 이차원적으로 이루어지면서 핵생성률이 시간에 따라 감소하고 있음을 알 수가 있었다. Si+ 이온 주입에 의하여 형성된 비정질 실리콘의 결정화에서는 3.0의 지수 값이 얻어지고 있어, 정상상태의 핵생성과 함께 2차원적인 결정 성장이 이루어지고 있었다. Disilane으로 형성된 비정질 실리콘에 대한 결정화에서는 2.8의 지수값이 얻어져, 정상상태의 핵 생성이 우세하게 일어나는 2차원적인 결정성장이 일어나고 있음을 알 수 있었다. 또한 TEM을 이용하여 시간에 따라 변하는 핵생성률을 조사하여, Avrami 식의 적용이 타당성 있음을 증명하였다. 마지막으로, 최종 입자의 크기가 열처리 온도에 크게 영향을 받고 있지 않음을 확인하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.186.2-186.2
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• 2014

최근 친환경 에너지에 대한 관심이 증폭되면서 리튬이차전지에 대한 연구가 활발히 진행되고 있다. 특히 음극(anode) 물질의 경우 기존의 흑연(graphite)보다 이론적 용량이 약 10배 이상 높은 실리콘(Silicon)에 대한 관심이 매우 높다. 하지만 Si의 경우 리튬 충전거동 시 400% 이상의 부피팽창으로 몇 번의 충전/방전 싸이클(cycle)에 전극이 파괴되는 문제점을 지니고 있다. 이를 극복하기 위해 Si 나노선이 고려되고 있다. 우수한 전극특성을 갖는 Si 소재를 개발하기 위해서는 원자단위에서 Si 나노선의 리튬 충전 메커니즘을 살펴보는 것이 매우 중요하다. 하지만 기존의 시뮬레이션 기법으로는 Si 나노선의 볼륨팽창에 관한 메커니즘과 리튬 충전과정에서의 상변화(결정질에서 비정질) 과정을 설명하기는 기술적으로 매우 힘들다. 고전적인 분자동역학 방법의 경우 실제 나노스케일을 고려할 수 있지만, empirical potential로는 원자들간의 화학반응을 제대로 묘사할 수 없다. 한편 양자역학에 기반을 둔 제일원리방법의 경우 계산의 복잡성으로 현재의 컴퓨터 환경에서는 나노스케일에서 원자들의 동역학적인 거동을 연구하기 매우 힘들다. 우리는 이러한 문제를 해결하기 위해 실제 나노스케일에서 원자간 화학반응을 예측할 수 있는 Si-Li 시스템의 Reactive force field를 개발하였고, 분자동역학 계산방법을 이용하여 Si 나노선의 Li 충전 메커니즘을 규명하였다.

• Journal of the Korean Ceramic Society
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• v.37 no.4
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• pp.368-375
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• 2000

Fracture toughness of particulate composites of Al2O3/SiC, Al2O3/ZrO2 and Al2O3/ZrO2/SiC was analysed theoretically. According to the suggested particle bridging model for obtaining the R-curve height, the crack extension resistance for the long crack was linearly proportional to the residual calmping stress at the interface between the second phase and the matrix. It was also a function of the particle size and the content. It was confirmed that the rising R-curve behavior of Al2O3 containing 30 vol% SiC particles of 3${\mu}{\textrm}{m}$ was owing to the strong crack bridging by SiC particles. For Al2O3/ZrO2/SiC composites, the tensional stress from the 3${\mu}{\textrm}{m}$ SiC particles was large enough to activate the spontaneous transformation of the ZrO2. The crack extension resistance due to the particle bridging mechanism did not seem to be affected much by the coupled toughening, but its resultant toughness increase could be significantly smaller due to the dependency on the matrix toughness.

• The Journal of Society for e-Business Studies
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• v.17 no.3
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• pp.105-116
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• 2012

In the system integration (SI) industry, improving relationships with outsourcing partners is one of the key challenges faced by SI companies that aim to increase productivity and reduce costs. In the SI industry, over 80% of project development work is performed by these outsourcing partners. Hence, large SI companies focus on fostering high-performing partners through improved cooperation and mutual relations. However, in the SI industry the existing process of managing outsourcing partners is unable to advance to the level of long-term partnerships due to inadequate information sharing and communication in the process of selecting and assessing a potential and existing partner. Based on the theory of partnership, this study identifies the success factors for new strategic partnerships. Further, this study presents a model for assessing partner companies to promote increased productivity and improve the relationship between an SI company and its partner. In addition, this model is used to assess partner relationships for a well-known SI company "A". This study explores the feasibility of a new framework model.