• Journal of the Semiconductor & Display Technology
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• v.21 no.2
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• pp.32-37
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• 2022

As semiconductors become finer, equipment must perform precise and accurate processes to achieve the desired wafer fabrication requirement. Radio frequency power delivery system in plasma system plays a critical role to generate the plasma, and the role of impedance matching unit is critical to terminate the reflected radio frequency power by modifying the impedance of the matching network in the plasma equipment. Impedance matching unit contains one fixed inductor and two variable vacuum capacitors whose positions are controlled two step motors. Controlling the amount of vacuum variable capacitor should be made as soon as possible when the mismatched impedance is detected. In this paper, we present the impedance matching algorithm using the phase sensor.

• KIEE International Transactions on Electrophysics and Applications
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• v.2C no.5
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• pp.246-252
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• 2002

Two-dimensional steady state simulations of planar type radio frequency inductively coupled plasma (RFICP) have been performed. The characteristics of RFICP were investigated in terms of power transfer efficiency, equivalent circuit analysis, spatial distribution of plasma density and electron temperature. Plasma density and electron temperature were determined from the equations of ambipolar diffusion and energy conservation. Joule heating, ionization, excitation and elastic collision loss were included as the source terms of the electron energy equation. The electromagnetic field was calculated from the vector potential formulation of ampere's law. The peak electron temperature decreases from about 4eV to 2eV as pressure increases from 5 mTorr to 100 mTorr. The peak density increases with increasing pressure. Electron temperatures at the center of the chamber are almost independent of input power and electron densities linearly increase with power level. The results agree well with theoretical analysis and experimental results. A single turn, edge feeding antenna configuration shows better density uniformity than a four-turn antenna system at relatively low pressure conditions. The thickness of the dielectric window should be minimized to reduce power loss. The equivalent resistance of the system increases with both power and pressure, which reflects the improvement of power transfer efficiency.

• The Bulletin of The Korean Astronomical Society
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• v.44 no.2
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• pp.51.3-51.3
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• 2019

Its ability to measure the polarization of light at four frequencies makes the KVN a "plasma physics observatory" that can probe the internal physics (e.g., magnetic fields, outflow geometries) of AGN radio jets and cores. We initiated a Key Science Program, the Plasma-physics of Active Galactic Nuclei (PAGaN) project, dedicated to polarimetric monitoring of 14 radio-bright AGN. We have been able to measure the Faraday rotation measure of the cores of our targets as function of frequency; the observed scaling relation is in good agreement with conically expanding outflows to first order. We are further probing a polarized hotspot in the jet of 3C84 and possible systematic differences in the Faraday rotation in BL Lacertae objects and flat spectrum radio quasars.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.02a
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• pp.215-215
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• 1997

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.1
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• pp.81-85
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• 2009

We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

• Journal of Powder Materials
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• v.26 no.4
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• pp.305-310
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• 2019

In the present work, spheroidization of angular vanadium powders using a radio frequency (RF) thermal plasma process is investigated. Initially, angular vanadium powders are spheroidized successfully at an average particle size of $100{\mu}m$ using the RF-plasma process. It is difficult to avoid oxide layer formation on the surface of vanadium powder during the RF-plasma process. Titanium/vanadium/stainless steel functionally graded materials are manufactured with vanadium as the interlayer. Vanadium intermediate layers are deposited using both angular and spheroidized vanadium powders. Then, 17-4PH stainless steel is successfully deposited on the vanadium interlayer made from the angular powder. However, on the surface of the vanadium interlayer made from the spheroidized powder, delamination of 17-4PH occurs during deposition. The main cause of this phenomenon is presumed to be the high thickness of the vanadium interlayer and the relatively high level of surface oxidation of the interlayer.

• Proceedings of the Korea Electromagnetic Engineering Society Conference
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• 2003.11a
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• pp.59-63
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• 2003

Modal properties of guided waves along circular dispersive double negative (DNG) index metamaterial rod waveguides are numerically investigated. Identical forms of dispersive dielectric and magnetic material constants are used for simplicity. For degenerated azimuthally symmetric mode, a multimode region, a single mode region, a band gap region and a forbidden region are found which cannot be observed in the case of the conventional dielectric rod waveguide. As the normalized frequency goes down, discrete guided modes are continuously generated, which is a reverse property of conventional dielectric rod waveguide. Also, there are high-frequency cutoffs, which have been generally examined in dispersive circular geometries such as a plasma column or a plasma Goubau line. In the single mode region, both the low- and high-frequency cutoffs are existed where the propagation constants are continued between the guided oscillating and surface modes.

• Bulletin of the Korean Space Science Society
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• 2009.10a
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• pp.43.1-43.1
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• 2009

Electromagnetic radiation at the plasma frequency and its second harmonic, the so-called plasma emission, is fundamental process responsible for solar type II and III radio bursts. There have also been occasional observations of higher-harmonic plasma emissions in the solar-terrestrial environment. We will present that the simulation effort on characterizing the electron beam-generated plasma emission process at POSTECH. We have developed fully electromagnetic particle-in-cell (PIC) simulation code with three dimensions. We simulated harmonic plasma emission with various beam condition. Qualitative comparison with the traditional plasma frequency and second harmonic radiation theory is in good agreement. Higher harmonic emissions agree with the theory of coalescence of Langmuir and harmonic EM wave.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.13 no.3
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• pp.34-39
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• 1999

Electron temperature and electron density were rreasured in a radio-frequency inductively coupled plasma (RFICP) using a Langmuir probe method. Measurerrent was conducted in an argon discharge for pressures from 10 mTorr to 40 mTorr and input rf rnwer from 100 W to 600 W. Spatial distribution electroo temperature and electron density were rreasured for discharge with satre aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power. Electron density was increased with iocreasing input power, but saturated at 450 W. Electron density was iocreased with iocreasing pressure. Radial distribution of the electron density was peaked at the rnsition which was a little rmved from center toward quartz window. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. The above results could contribute to understand the Mechanism of Radio-Frequency Inductively Discharge Plasma.Plasma.

• Proceedings of the KIEE Conference
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• 1998.07e
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• pp.1803-1805
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• 1998

Electron temperature, electron density and electron energy distribution function were measured in Radio-Frequency Inductively Coupled Plasma(RFICP) using a probe method. Measurements were conducted in argon discharge for pressure from 10 mTorr to 40 mTorr and input rf power from 100W to 600W and flow rate from 3 sccm to 12 sccm. Spatial distribution electron temperature and electron density and electron energy distribution function were measured for discharge with same aspect ratio(R/L=2). Electron temperature was found to depend on pressure, but only weakly on power. Electron density and electron energy distribution function strongly depended on both pressure and power. Electron density and electron energy distribution function increased with increasing flow rate. Radial distribution of the electron density and electron energy distribution function were peaked in the plasma center. Normal distribution of the electron density electron energy distribution function were peaked in the center between quartz plate and substrate. These results were compared to a simple model of ICP, then we found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.