• 제목/요약/키워드: Radio frequency magnetron sputtering

검색결과 230건 처리시간 0.029초

Ar 이온빔 조사에 따른 SnO2 박막의 물성 연구 (Effect of Ar Ion Irradiation on the Hydrogen Gas Sensitivity of SnO2 Thin Films)

  • 허성보;이영진;김선광;유용주;최대한;이병훈;김민규;김대일
    • 열처리공학회지
    • /
    • 제25권6호
    • /
    • pp.279-282
    • /
    • 2012
  • $SnO_2$ thin films were prepared on the Si substrate by radio frequency (RF) magnetron sputtering and then surface of the films were irradiated with intense Ar ion beam to investigate the effect of Ar ion irradiation on the properties and hydrogen gas sensitivity of the films. From atomic force microscope observation, it is supposed that intense Ar bombardments promote rough surface and increase gas sensitivity of $SnO_2$ films for hydrogen gas. The films that Ar ion beam irradiated at 6 keV show the higher sensitivity than the films were irradiated at 3 keV and 9 keV. These results suggest that the $SnO_2$ thin films irradiated with optimized Ar ion beam are promising for practical high-performance hydrogen gas sensors.

GZO/ZnO 적층박막의 두께변화에 따른 구조적, 전기적, 광학적 물성 변화 (Influence of Film Thickness on the Structural, Electrical and Optical Properties of the GZO/ZnO Films)

  • 김승홍;김선경;김소영;전재현;공태경;최동혁;손동일;김대일
    • 열처리공학회지
    • /
    • 제27권1호
    • /
    • pp.23-26
    • /
    • 2014
  • Ga doped ZnO (GZO) single layer and GZO/ZnO bi-layered films were deposited on glass substrates by radio frequency magnetron sputtering and then the influence of film thickness on the structural, electrical, and optical properties of the films was considered. Thicknesses of the GZO/ZnO films was varied as GZO 100 nm, GZO 85 nm/ZnO 15 nm and GZO 70 nm/ZnO 30 nm, respectively. The observed result means that optical transmittance and electrical resistivity of the films were influenced with film thickness and GZO 85 nm/ZnO 15 nm bilayered films show the higher figure of merit than that of the films prepared other films in this study.

A Study of the Optimal Process Conditions of AZO:H2 Thin Film for Maximization of the Transmittance of a Blue GaN Light-Emitting Diode with a Wavelength of 470 nm

  • Hwang, Seung-Taek;Park, Choon-Bae;Hoang, Geun-C.
    • Transactions on Electrical and Electronic Materials
    • /
    • 제11권6호
    • /
    • pp.279-284
    • /
    • 2010
  • This study has been carried out to determine the optimal process conditions of $AZO:H_2$ thin films for the maximization of the transmittance of a blue GaN light-emitting diode (LED) with a wavelength of 470 nm. The Al-doped zinc oxide $(AZO):H_2$ thin films were deposited on a sapphire substrate by radio-frequency magnetron sputtering system with varying substrate temperatures, working pressures and annealing temperatures temperature, working pressure and annealing imposed on a AZO (2wt% $Al_2O_3$) ceramic target. The effect of these variables was investigated in order to improve the light extraction efficiency of the LED. As a result, the (002)-oriented peak was found in all the $AZO:H_2$ thin films. The lowest resistivity and the best transmittance at a wavelength of 470 nm was found to be $4.774\;{\times}\;10^{-4}\;{\Omega}cm$ and 92% at a substrate temperature of $500^{\circ}C$, working pressure of 7 mTorr and annealing temperature of $400^{\circ}C$. The transmittance of the $AZO:H_2$ thin film for the Blue GaN LED was improved by approximately 13% relative to that of a ITO thin film (T = 79%).

상온에서 연속 조성 확산법에 의해 증착된 $Ta_2O_5-SiO_2$ 유전특성 (Dielectric Properties of $Ta_2O_5-SiO_2$ Thin Films Deposited at Room Temperature by Continuous Composition Spread)

  • 김윤회;정근;윤석진;송종한;박경봉;최지원
    • 마이크로전자및패키징학회지
    • /
    • 제17권2호
    • /
    • pp.35-40
    • /
    • 2010
  • CCS방법이 적용된 off-axis RF 마그네트론 스퍼터를 이용하여 증착된 $Ta_2O_5-SiO_2$의 유전체 박막에 관하여 연구를 하였다. 1500 ${\mu}m$ 의 간격으로 비유전율 및 유전손실을 측정하여 $Ta_2O_5-SiO_2$에 조성의 변화에 따른 유전특성의 변화를 나타내었다. 1MHz 에서 높은 유전상수(k~19.5) 와 낮은 유전손실(tan${\delta}$<0.05)을 보이는 영역들을 찾았는데, 이는 증착된 기판($75{\times}25mm^2$ sized Pt/Ti/$SiO_2$(100))에서 $SiO_2$/Si 타겟 영역으로부터 각각 16 mm, 22 mm 떨어진 영역에서 찾을 수 있었다.

고감도 ZnO 박막센서의 수소가스 검출 특성 연구 (Characterization of Hydrogen Gas Sensitivity of ZnO Thin Films)

  • 공영민;이학민;허성보;김선광;유용주;김대일
    • 한국재료학회지
    • /
    • 제20권12호
    • /
    • pp.636-639
    • /
    • 2010
  • ZnO thin films were prepared on a glass substrate by radio frequency (RF) magnetron sputtering without intentional substrate heating and then surfaces of the ZnO films were irradiated with intense electrons in vacuum condition to investigate the effect of electron bombardment on crystallization, surface roughness, morphology and hydrogen gas sensitivity. In XRD pattern, as deposited ZnO films show a higher ZnO (002) peak intensity. However, the peak intensity for ZnO (002) is decreased with increase of electron bombarding energy. Atomic force microscope images show that surface morphology is also dependent on electron bombarding energy. The surface roughness increases due to intense electron bombardment as high as 2.7 nm. The observed optical transmittance means that the films irradiated with intense electron beams at 900 eV show lower transmittance than the others due to their rough surfaces. In addition, ZnO films irradiated by the electron beam at 900 eV show higher hydrogen gas sensitivity than the films that were electron beam irradiated at 450 eV. From XRD pattern and atomic force microscope observations, it is supposed that intense electron bombardment promotes a rough surface due to the intense bombardments and increased gas sensitivity of ZnO films for hydrogen gas. These results suggest that ZnO films irradiated with intense electron beams are promising for practical high performance hydrogen gas sensors.

Enhancement of Methanol Gas Sensitivity of Cu Intermediate ITO Film Gas Sensors

  • Shin, Chang-Ho;Chae, Joo-Hyun;Kim, Yu-Sung;Jeong, Cheol-Woo;Kim, Dae-Il
    • 한국재료학회지
    • /
    • 제20권5호
    • /
    • pp.267-270
    • /
    • 2010
  • Sn doped $In_2O_3$ (ITO) and ITO/Cu/ITO (ICI) multilayer films were prepared on glass substrates with a reactive radio frequency (RF) magnetron sputter without intentional substrate heating, and then the influence of the Cu interlayer on the methanol gas sensitivity of the ICI films were considered. Although both ITO and ICI film sensors had the same thickness of 100 nm, the ICI sensors had a sandwich structure of ITO 50 nm/Cu 5 nm/ITO 45 nm. The ICI films showed a ten times higher carrier density than that of the pure ITO films. However, the Cu interlayer may also have caused the decrement of carrier mobility because the interfaces between the ITO and Cu interlayer acted as a barrier to carrier movement. Although the ICI films had two times a lower mobility than that of the pure ITO films, the ICI films had a higher conductivity of $3.6{\cdot}10^{-4}\;{\Omega}cm$ due to a higher carrier density. The changes in the sensitivity of the film sensors caused by methanol gas ranging from 50 to 500 ppm were measured at room temperature. The ICI sensors showed a higher gas sensitivity than that of the ITO single layer sensors. Finally, it can be concluded that the ICI film sensors have the potential to be used as improved methanol gas sensors.

동시증착법에 의해 성장된 붕화마그네슘 박막의 증착속도에 따른 효과 (Effect of Deposition Rate on $MgB_2$ Thin Films Growth by Co-deposition Method)

  • 박성창;강성구;정대길;정준기;임영진;김찬중;김철진
    • Progress in Superconductivity
    • /
    • 제10권1호
    • /
    • pp.29-34
    • /
    • 2008
  • Magnesium diboride ($MgB_2$) is an inexpensive and simple superconductor. This material was first synthesized and its structure confirmed in 1953 but its superconducting properties were not discovered until 2001 when they caused great excitement. In this study, superconducting $MgB_2$ thin films on the r-$Al_{2}O_3$ substrates have been grown by the combination of radio frequency magnetron sputtering of B and thermal evaporation of Mg. The deposition conditions were varied by changing deposition rate. Before the co-deposition of Mg and B, the deposition rates of each element have been measured separately. The $MgB_2$ layers had 400nm in thickness and superconducting transition temperatures have been measured around $\sim$38.6K. Superconducting properties have been measured by PPMS, XRD, and SEM.

  • PDF

Changes in Electrical and Optical Properties and Chemical States of the Amorphous In-Ga-Zn-O Thin Films Depending on Growth Temperature

  • Yoo, Han-Byeol;Thakur, Anup;Kang, Se-Jun;Baik, Jae-Yoon;Lee, Ik-Jae;Park, Jae-Hun;Kim, Ki-Jeong;Kim, Bong-Soo;Shin, Hyun-Joon
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
    • /
    • pp.346-346
    • /
    • 2012
  • We investigated electrical and optical properties and chemical states of amorphous In-Ga-Zn-O (a-IGZO) thin films deposited at different substrate temperatures (from room temperature to $300^{\circ}C$). a-IGZO thin films were fabricated by radio frequency magnetron sputtering using $In_2O_3$ : $Ga_2O_3$ : ZnO = 1 : 1 : 1 target, and their electrical and optical properties and chemical states were investigated by Hall-measurement, UV-visible spectroscopy and x-ray photoelectron spectroscopy (XPS), respectively. The data showed that as substrate temperature increased, carrier concentration increased, but mobility, conductivity, transmittance in the shorter wavelength region (>350 nm), and the Tauc-plot-estimated optical bandgap decreased. XPS data indicated that the intensity of In 3d peak compared to Ga 3d peak increased but the intensity of Zn 3d peak compared to Ga 3d decreased, and that, from the deconvoluted O 1s peak, defects or oxygen vacancies and non-quaternary contents increased as the temperature increased. The relative intensity changes of the In, Zn, and O 1s sub-component are suggested to explain the changes in electrical and optical properties.

  • PDF

전자빔 조사 및 Ag 완충층에 의한 ZnO/Ag 박막의 구조적·광학적·전기적 특성 개선 효과 (The Effect of Electron Beam Irradiation and Ag Buffer Layer on the Structural, Optical, and Electrical Properties of ZnO/Ag Thin Films)

  • 최진영;엄태영;박윤제;최수현;김대현;조윤주;김대일
    • 한국전기전자재료학회논문지
    • /
    • 제31권4호
    • /
    • pp.221-225
    • /
    • 2018
  • In this work, in order to effectively improve the electrical conductivity and visible light transmittance of ZnO thin films, ZnO single layer and ZnO/Ag bi-layer films were deposited on glass substrates by radio frequency and direct current magnetron sputtering, and then, the effects of an Ag buffer layer and electron beam irradiation on the electrical and optical properties of the films were investigated. The observed results indicate that ZnO 100 nm / Ag 7 nm films show higher opto-electrical performance than the ZnO single layer film. In addition, electron beam irradiation also effectively enhanced the visible transmittance and electrical conductivity of the ZnO/Ag bi-layer films.

Synthesis of rhombohedral-structured zinc germanate thin films and characteristics of divalent manganese-activated electroluminescence

  • Yoon, Kyung-Ho;Kim, Joo-Han
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
    • /
    • pp.453-453
    • /
    • 2010
  • In this study, zinc germanate ($Zn_2GeO_4$) thin films has been synthesized by using radio frequency magnetron sputtering and the divalent manganese-activated luminescence was characterized. X-ray diffraction patterns of the as-deposited $Zn_2GeO_4$:Mn films showed only a broad feature, indicative of an amorphous structure. Scanning electron microscopy images revealed that the as-deposited $Zn_2GeO_4$:Mn has a smooth surface morphology. The $Zn_2GeO_4$:Mn films were found to be crystallized by annealing in air ambient at temperatures as low as $700^{\circ}C$. The annealed $Zn_2GeO_4$:Mn possessed a rhombohedral polycrystalline structure. The broad-band photoluminescent emission spectrum from 470 to 650nm was obtained at room temperature from the $Zn_2GeO_4$:Mn films. The emission peak was centered at around 535nm in the green range, which originates from the intrashell transition of manganese $3d^5$ electrons from $^4T_1$ excited-state level to the $^6A_1$ ground state. The PL emission spectrum had an asymmetric line shape, which results from the $^3d_5$ electron transitions of divalent manganese ions located at different sites of the zinc germanate host crystal lattice. Electroluminescent devices were fabricated using $Zn_2GeO_4$:Mn as an emission layer. The fabricated devices showed a green EL emission similar to the PL emission. The CIE chromaticity color coordinates of the EL emission were determined to be x=0.308 and y=0.657.

  • PDF