• Title/Summary/Keyword: RLC interconnect

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A Buffer Insertion Method for RLC Interconnects (RLC 연결선의 버퍼 삽입 방법)

  • 김보겸;김승용;김석윤
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.2
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    • pp.67-75
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    • 2004
  • This paper presents a buffer insertion method for RLC-class interconnect structured as a sin91e line or a tree. First, a closed form expression for the interconnect delay of a CMOS buffer driving single RLC line is represented. This expression has been derived by the n-th power law for deep submicrometer technology and occurs to be within 9 percentage of maximal relative error in accuracy compared with the results of HSPICE simulation for various RLC loads. This paper proposes a closed form expression based on this for the buffer insertion of single RLC lines and the buffer sizing algorithms for RLC tree interconnects to optimize path delays. The proposed buffer insertion algorithms are applied to insert buffers for several interconnect trees with a 0.25${\mu}{\textrm}{m}$ CMOS technology and the results are compared against those of HSPICE.

A Delay Estimation Method using Reduced Model of RLC Interconnects (RLC 연결선의 축소모형을 이용한 지연시간 계산방법)

  • Jung Mun-Sung;Kim Ki-Young;Kim Seok-Yoon
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.54 no.8
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    • pp.350-354
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    • 2005
  • This paper proposes a new method for delay time calculation in RLC interconnects. This method is simple, but precise. The proposed method can calculate delay time of RLC interconnects by simple numerical formula calculation without complex moment calculation using reduced model in RLC interconnects. The results using the proposed method for RLC circuits show that average relative error is within $10\%$ in comparison with HSPICE simulation results.

A New TWA-Based Efficient Signal Integrity Verification Technique for Complicated Multi-Layer RLC Interconnect Lines (복잡한 다층 RLC 배선구조에서의 TWA를 기반으로 한 효율적인 시그널 인테그러티 검증)

  • Jo Chan-Min;Eo Yung-Seon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.7 s.349
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    • pp.20-28
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    • 2006
  • A new TWA(Traveling-wave-based Waveform Approximation)-based signal integrity verification method for practical interconnect layout structures which are composed of non-uniform RLC lines with various discontinuities is presented. Transforming the non-uniform lines into virtual uniform lines, signal integrity of the practical layout structures can be very efficiently estimated by using the TWA-technique. It is shown that the proposed technique can estimate the signal integrity much more efficiently than generic SPICE circuit model with 5% timing error and 10% crosstalk error.

An Analysis of Maximum Cross Talk Noise in RLC Interconnects (RLC 연결선에서 최대 누화 잡음 예측을 위한 해석적 연구)

  • 김애희;김승용;김석윤
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.2
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    • pp.77-83
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    • 2004
  • Cross-talk noise which can occur between on-chip interconnects is significant factor which influence signal integrity. Therefore, this paper presents an analytical method for estimating maximum cross-talk noise. We consider inductance effect of interconnects and use arbitary ramp inputs to estimate noise magnitude exactly. Also, we have used a virtual source for the easy of analytically caculating maximum cross-talk noise from complex cross-talk noise model. The accuracy of the has been shown that be within 4.3 percent maximum relative error compared with the results of HSPICE simulation. Hence, this study can be utilized in various CAD tools for guaranteeing signal integrity.

Effective Power/Ground Network Design Techniques to suppress Resonance Effects in High-Speed/High-Density VLSI Circuits (고속/고밀도 VLSI 회로의 공진현상을 감소시키기 위한 효율적인 파워/그라운드 네트워크 설계)

  • Ryu Soon-Keol;Eo Yung-Seon;Shim Jong-In
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.7 s.349
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    • pp.29-37
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    • 2006
  • This paper presents a new analytical model to suppress RLC resonance effects which inevitably occur in power/ground lines due to on-chip decoupling capacitor and other interconnect circuit parasitics (i.e., package inductance, on-chip decoupling capacitor, and output drivers, etc.). To characterize the resonance effects, the resonance frequency of the circuit is accurately estimated in an analytical manner. Thereby, a decoupling capacitor size to suppress the resonance for a suitable circuit operation is accurately determined by using the estimated resonance frequency. The developed novel design methodology is verified by using $0.18{\mu}m$ process-based-HSPICE simulation.

Signal Transient and Crosstalk Model of Capacitively and Inductively Coupled VLSI Interconnect Lines

  • Kim, Tae-Hoon;Kim, Dong-Chul;Eo, Yung-Seon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.7 no.4
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    • pp.260-266
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    • 2007
  • Analytical compact form models for the signal transients and crosstalk noise of inductive-effect-prominent multi-coupled RLC lines are developed. Capacitive and inductive coupling effects are investigated and formulated in terms of the equivalent transmission line model and transmission line parameters for fundamental modes. The signal transients and crosstalk noise expressions of two coupled lines are derived by using a waveform approximation technique. It is shown that the models have excellent agreement with SPICE simulation.

Macromodels for Efficient Analysis of VLSI Interconnects (VLSI 회로연결선의 효율적 해석을 위한 거시 모형)

  • 배종흠;김석윤
    • Journal of the Korean Institute of Telematics and Electronics C
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    • v.36C no.5
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    • pp.13-26
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    • 1999
  • This paper presents a metric that can guide to optimal circuit models for interconnects among various models, given interconnect parameters and operating environment. To get this goal, we categorize interconnects into RC~c1ass and RLC-c1ass model domains based on the quantitative modeling error analysis using total resistance, inductance and capacitance of interconnects as well as operating frequency. RC~c1ass circuit models, which include most on~chip interconnects, can be efficiently analyzed by using the model~order reduction techniques. RLC-c1ass circuit models are constructed using one of three candidates, ILC(Iterative Ladder Circuit) macromodels, MC(Method of Characteristics) macromodels, and state-based convolution method, the selection process of which is based upon the allowable modeling error and electrical parameters of interconnects. We propose the model domain diagram leading to optimal circuit models and the division of model domains has been achieved considering the simulation cost of macromodels under the environmental assumption of the general purpose circuit simulator such as SPICE. The macromodeling method presented in this paper keeps the passivity of the original interconnects and accordingly guarantees the unconditional stability of circuit models.

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Transmission Line Parameter Extraction and Signal Integrity Verification of VLSI Interconnects Under Silicon Substrate Effect (실리콘 기판 효과를 고려한 VLSI 인터컨넥트의 전송선 파라미터 추출 및 시그널 인테그러티 검증)

  • 유한종;어영선
    • Journal of the Korean Institute of Telematics and Electronics C
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    • v.36C no.3
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    • pp.26-34
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    • 1999
  • A new silicon-based IC interconnect transmission line parameter extraction methodology is presented and experimentally examined. Unlike the PCB or MCM interconnects, a dominant energy propagation mode in the silicon-based IC interconnects is not quasi-TEM but slow wave mode(SWM). The transmission line parameters are extracted taking the silicon substrate effect (i.e., slow wave mode) into account. The capacitances are calculated considering silicon substrate surface as a ground. Whereas the inductances are calculated by using an effective dielectric constant. In order to verify the proposed method, test patterns were designed. Experimental data have agreement within 10%. Further, crosstalk noise simulation shows excellent agreements with the measurements which are performed with high-speed time domain measurement ( i.e., TDR/TDT measurements) for test pattern, while RC model or RLC model without silicon substrate effect show about 20~25% underestimation error.

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