• Title/Summary/Keyword: RF properties

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Effects of the Substitution of Wet-Milled Rice Flour for Wheat Flour on the Physicochemical Properties and Acceptability of Yellow Layer Cake (습식제분 쌀가루의 첨가가 옐로 레이어 케이크의 이화학 특성과 소비자 기호도에 미치는 영향)

  • Kim, Ji-Young;Jeon, Jae-Eun;Lee, In-Seon
    • Journal of the Korean Society of Food Culture
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    • v.36 no.5
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    • pp.492-501
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    • 2021
  • This study investigated the physicochemical properties and acceptability of yellow layer cake prepared using various levels of wet-milled rice flour (RF). RF was used to substitute 0% (control group), 15% (RF-15 group), 30% (RF-30 group) and 45% (RF-45 group) of wheat flour (WF) to manufacture yellow layer cakes. The substitution of WF with RF showed no significant effect on the pH but decreased the specific gravity and viscosity of the batter. Baking loss rates ranged from 4.65% to 5.03%, showing no significant difference among samples. In the color measurement, the experimental groups showed higher redness (a) and yellowness (b) than the control group (p<0.05). The experimental groups showed lower gumminess and chewiness than the control group. According to the results of intensity measurement of sensory properties, the RF-30 and RF-45 groups showed stronger intensities for darkness, sweetness, moistness and softness than the control group. The acceptance test found that the RF-45 group had significantly higher or similar results for all acceptance attributes than the control group. These results indicate that RF addition as a replacement of WF at a ratio of 45% is optimal for producing yellow layer cakes.

A Comparison of RF Properties of Bonding Pad in Flip-Chip Packaging (플립 칩 실장에 있어 본딩 패드 패턴의 고주파 특성 비교)

  • 박현식;성규제;김진성;이진구
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.27-31
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    • 2003
  • RF characteristics of CPW(coplanar waveguide) pattern with bonding pads used in flip-chip packaging of GaAs is studied in the frequency range of 1 GHz to 35 GHz. Simulation, fabrication and evaluation are performed for the proposed patterns. Measurement results show proposed patterns have similar properties of $S_{11}$below -31 dB and $S_{21}$ above -0.19 dB with typical CPW In addition RF properties are improved with the increase of width of ground line. This indicates CPW structure with bonding pads keeps RF characteristics of typical CPW.

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Electrical and Optical properties of TiO2-doped ZnO Films prepared on PEN by RF-magnetron Sputtering Method (고주파 마그네트론 스퍼터링에 의해 성막된 TiO2가 도핑된 ZnO 박막의 전기적 및 광학적 특성)

  • Kim, Hwa-Min;Sohn, Sun-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.10
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    • pp.837-843
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    • 2009
  • $TiO_2$(2 wt.%)-doped ZnO(TZO) films with thickness from 100 nm to 500 nm were prepared on polyethylene naphthalate(PEN) substrate under various rf-power range from 40 W to 80 W. Their electrical and optical properties were investigated as a function of rf-power. We think that these properties were closely related with the crystallization and the film density of TZO films. It was also presumed that the vaporization of the water vapor and other adsorbed particles such as an organic solvents can affect the electrical properties of the conventional transparent conductive oxide(TCO) films. On the other hand, since the TZO film deposited on glass substrate at room temperature with rf-power of 80 W shows a very low resistivity of $7.5\times10^{-4}\;\Omega{\cdot}cm$ and a very excellent transmittance over an average 85% in the visible range, that is comparable to that of ITO films. Therefore, we expect that the TZO films can be used as transparent electrode for optoelectronic devices such as touch-panels, flat-panel displays, and thin-film solar cells.

Feasibility of RF Sensor Application for On-line Monitoring of Tomato Paste Processing (토마토 패이스트 가공공정의 온라인 모니터링용 RF 센서의 활용 가능성)

  • Kim, Seong-Min;Garvey, Casey;Leary, Thomas;McCarthy, Michael
    • Journal of Biosystems Engineering
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    • v.33 no.6
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    • pp.410-415
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    • 2008
  • On-line monitoring of fresh tomato paste processing was done using two radio frequency (RF) sensors resonant at 85 and 110 MHz. Fresh tomato juice with soluble solid content of about $5^{\circ}Brix$ was evaporated up to $23^{\circ}Brix$ and diluted down to about $5^{\circ}Brix$ again with a pilot scale evaporator. The RF sensors were installed in a processing pipe and monitored. The pastes at a specific $^{\circ}Brix$ level were sampled and analyzed for physical properties such as soluble solid content and viscosity. The relationships between sensor outputs and measured physical properties were analyzed. Analysis results showed RF sensor is feasible to apply on-line monitoring of tomato paste processing.

Effects of RF Power on Physical and Electrical Characteristics of TiC Thin Films Deposited by Magnetron Sputtering (마그네트론 스퍼터링법으로 증착시킨 TiC 박막의 물리적, 전기적 특성에서 RF 파워의 영향)

  • Kim, Nam-Hoon;Park, Yong Seob
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.7
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    • pp.458-461
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    • 2014
  • TiC thin films were deposited on Si wafer by unbalanced magnetron sputtering (UBMS) system with two targets of graphite and titanium. During the TiC sputtering, the RF power was varied from 100 W to 175 W and the physical and electrical properties of TiC films were investigated. The hardness and rms surface roughness of TiC films were improved with increasing RF power and the maximum hardness about 24 GPa and the minimum rms surface roughness about 1.2 nm were obtained. The resistivity of TiC films was decreased with increasing RF power. Consequently, the physical and electrical properties of TiC film wewe improved with increasing RF power.

Electrical and Optical Properties of ITO Films Sputtered by RF -bias Voltage and In-Sn Alloy Target

  • Kim, Hyun-Hoo;Shin, Sung-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.4
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    • pp.153-157
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    • 2004
  • ITO thin films were deposited on PET and soda-lime glass substrates by a dc reactive magnetron sputtering of In-Sn alloy metal target without substrate heater and post-deposition thermal treatment. The dependency of rf-bias voltage and substrate power during deposition processing was investigated to control the electrical and optical properties of ITO films. The range of rf bias voltage is from 0 to -80 V and the substrate power is applied from 10 to 50 W. The minimum resistivity of ITO film is 5.4${\times}$10$^{-4}$ $\Omega$cm at 50 W power and rf-bias voltage of -20 V. The best transmittance of ITO films at 550 nm wavelength is 91 % in the substrate power of 30 W and rf-bias voltage of -80 V.

Surface Morphology and Dielectric Properties of SBN Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 SBN 박막의 표면형상 및 유전특성)

  • Kim, Jin-Sa;Kim, Chung-Hyeok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.8
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    • pp.671-676
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    • 2009
  • The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various deposition conditions. We investigated the effect of deposition condition on the surface morphology and dielectric properties of SBN thin films. The optimum of the rougness showed about 4.33 nm in 70/30 of Ar/$O_2$ ratio. The crystallinity and rougness of SBN thin films were increased with the increase of rf power. Also, Deposition rate of SBN thin films was about 4.17 nm/min in 70 W of rf power. The capacitance of SBN thin films were increased with the increase of Ar/$O_2$ ratio, rf power and deposition temperature respectively.

Study on RF power dependence of BST thin film by the different substrates (기판에 따른 BST 박막의 RF Power 의존성)

  • 최명률;이태일;박인철;김홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.22-25
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    • 2002
  • In this paper, we deposited MgO buffer layer on p-type (100)Si substrate in the condition of substrate temperature 400$^{\circ}C$, working gas ratio Ar:O$_2$=80:20, RF Power 50W, working pressure 10mtorr, and the thickness of the film was about 300${\AA}$. Then we deposited Ba$\sub$0.5/Sr$\sub$0.5/TiO$_3$ thin film using RF Magnetron sputtering method on the MgO/Si substrate in various RF power of 25W, 50W, 75W. The film deposited in 50W showed the best crystalline from the XRD measurement. To know the electrical properties of the film, we manufactured Al/BSTMgO(300${\AA}$)/Si/Al structure capacitor. In the result of I-V measurement, The leakage current density of the capacitor was lower than 10$\^$-7/A/$\textrm{cm}^2$ at the range of ${\pm}$150kV/cm. From C-V characteristics of the capacitor, can calculate the dielectric constant and it was 305. Finally we deposited BST thin film on bare Si substrate and (100)MgO substrate in the same deposition condition. From the comparate of the properties of these samples, we found the properties of BST thin film which deposited on MgO/Si substrate were better than on bare Si substrate and similar to on MgO substrate.

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The effect of electrical properties by gas ratio on $Bi_{3.25}La_{0.75}Ti_3O_{12}$ thin films deposited by RF magnetron sputtering during being annealed (RF magnetron sputtering으로 제작한 BLT 박막의 후열처리 시 가스비 변화에 따른 전기적 특성에 관한 연구)

  • Lee, Kyu-Il;Kim, Eung-Kwon;Kang, Hyun-Il;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.49-52
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    • 2003
  • The role of gas ratio with the crystallization behavior and electrical properties in $Bi_{3.25}La_{0.75}Ti_3O_{12}$(BLT) thin films by rf magnetron sputtering method has not been precisely defined. In this work, the ferroelectric properties of these films with gas variation was investigated. BLT thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method and then they were crystallized by rapid thermal annealing (RTA). The experiment showed that all BLT films indicated perovskite polycrystalline structure with preferred orientation (020) and (0012). And no pyrochlore phase was observed. The fabricated film annealed with $O_2$ of 15 sccm showed that value of leakage current was $9.67{\times}10^{-7}A/cm^2$ at 50kV /em, and the value of remanent polarization (2Pr=Pr+-Pr-) was $11.8{\mu}C/cm^2$. Therefore we induce access to memory device application by rf-magnetron sputtering method in this report.

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Study of Pd Target Power Effects on Physical Characteristics of Pd-Doped Carbon Thin Films Using Dual Magnetron Sputtering Method (듀얼 마그네트론 스퍼터링 법으로 제조된 Pd-Doped Carbon 박막의 물리적 특성에서 Pd 타겟 전력의 영향에 대한 연구)

  • Choi, Young-Chul;Park, Yong Seob
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.5
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    • pp.488-493
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    • 2022
  • Generally, diamond-like carbon films (a-C:H, DLC) have been shown to have a low coefficient of friction, a high hardness and a low wear rate. Pd-doped C thin film was fabricated using a dual magnetron sputtering with two targets of graphite and palladium. Graphite target RF power was fixed and palladium target RF power was varied. The structural, physical, and surface properties of the deposited thin film were investigated, and the correlation among these properties was examined. The doping ratio of Pd increased as the RF power increased, and the surface roughness of the thin film decreased somewhat as the RF power increased. In addition, the hardness value of the thin film increased, and the adhesive strength was improved. It was confirmed that the value of the contact angle indicating the surface energy increases as the RF power increases. It was concluded that the increase in RF power contributed to the improvement of the physical properties of Pd-doped C thin film.