• Title/Summary/Keyword: RF model

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Simulation Method for Radio-Frequency Single-Electron Transistor (RF-SET) Operation (고주파 단일전자 트랜지스터 (RF-SET) 동작의 시뮬레이션 방법)

  • Yu Yun Seop;Park Hyun-Sik
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.5 s.335
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    • pp.9-14
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    • 2005
  • Simulation method for a pure radio-frequency (rf) mode of reflection-type and a pure rf mode of transmission-type radio-frequency single-electron transistor (RF-SET) operation is introduced. In this method, the solutions of differential equations based on Kirchhoff's law are obtained self-consistently at frequency-domain. Also, the steady-sate single-electron transistor (SET) current model and the time-dependent SET current model are used in this method. The reflected wave of a typical reflection-type RF-SET and the transmitted wave of a typical transmission-type RF-SET are calculated, and the accuracy of our developed method including the steady-state SET current model is verified with the method introduced by reference 2. At high frequency over GHz, results of our developed method including the time-dependent SET current model are considerably different from that including the steady-state SET current model. At high frequency over GHz, an exact time-dependent SET current model is needed to analyze RF-SET operation.

A Study on Improved SPICE MOSFET RF Model Considering Wide Width Effect (Wide Width Effect를 고려하여 개선된 SPICE MOSFET RF Model 연구)

  • Cha, Ji-Yong;Cha, Jun-Young;Lee, Seong-Hearn
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.2
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    • pp.7-12
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    • 2008
  • In this study, the wide width effect that the increasing rate of drain current and the value of cutoff frequency decrease with larger finger number is observed. For modeling this effect, an improved SPICE MOSFET RF model that finger number-independent external source resistance is connected to a conventional BSIM3v3 RF model is developed. Better agreement between simulated and measured drain current and cutoff frequency at different finger number is obtained for the improved model than the conventional one, verifying the accuracy of the improved model for $0.13{\mu}m$ multi-finger MOSFET.

A New CMOS RF Model for RF IC Design (RF IC 설계를 위한 새로운 CMOS RF 모델)

  • 박광민
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.8
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    • pp.555-559
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    • 2003
  • In this paper, a new CMOS RF model for RF IC design including the capacitance effect, the skin effect, and the proximity effect between metal lines on the Si surface is proposed for tile first time for accurately predicting the RF behavior of CMOS devices. The capacitances between metal lines on the Si surface are modeled with the layout. And the skin effect is modeled with a parallel branch added in equivalent circuit of metal line. The proximity effect is modeled by adding the mutual inductance between cross-coupled inductances in the ladder circuit representation. Compared to the BSIM 3v3. the proposed RF model shows good agreements with the measured data and shows well the frequency dependent behavior of devices in GHz ranges.

The CMOS RF model parameter for high frequency communication circuit design (고주파통신회로 설계를 위한 CMOS RF 모델 파라미터)

  • 여지환
    • Journal of Korea Society of Industrial Information Systems
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    • v.6 no.3
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    • pp.123-127
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    • 2001
  • The prediction method of the parameter C/sub gs/ of CMOS transistor is proposed by calculating the mobil charge in inversion layer of COMS transistor. This parameter C/sub gs/ decided on the cutoff frequency in MOS transistor in RF range and coupled input and output. This parameter C/sub gs/ in RF range is very important parameter in small signal circuit model. This proposed method is contributed to developing software of extracting parameter value in equivalent circuit model. The method provide the important information to construct a RF nonlinear model for multifinger gate MOSFET. This method will be very valuable to develop a large signal MOSFET model for nonlinear RF IC design.

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A Layout-Based CMOS RF Model for RFIC's

  • Park Kwang Min
    • Transactions on Electrical and Electronic Materials
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    • v.4 no.3
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    • pp.5-9
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    • 2003
  • In this paper, a layout-based CMOS RF model for RFIC's including the capacitance effect, the skin effect, and the proximity effect between metal lines on the Si surface is proposed for the first time for accurately predicting the RF behavior of CMOS devices. With these RF effects, the RF equivalent circuit model based on the layout of the multi-finger gate transistor is presented. The capacitances between metal lines on the Si surface are modeled with the layout. And the skin effect is modeled to the equivalent ladder circuit of metal line. The proximity effect is modeled by adding the mutual inductance between cross-coupled inductances in the ladder circuit representation. Compared to the BSIM 3v3 and other models, the proposed RF model shows better agreements with the measured data and shows well the frequency dependent behavior of devices in GHz ranges.

The Properties of Ar RF Plasma Using 1- and 2-dimensional Model (1,2차 모델링을 이용한 Ar RF 플라즈마의 응답 특성)

  • 박용섭;정해덕
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.8
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    • pp.622-628
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    • 2001
  • We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

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Object Location Sensing using Signal Pattern Matching Methods (신호 패턴 매칭 방법을 이용한 이동체 위치 인식)

  • Byun, Yung-Cheol;Park, Sang-Yeol
    • Journal of Korea Multimedia Society
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    • v.10 no.4
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    • pp.548-558
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    • 2007
  • This paper presents a method of location sensing of mobile objects using RF devices. By analyzing signal strengths between a certain number of fixed RF devices and a moving RF device, we can recognize the location of a moving object in real time. Firstly, signal strength values between RF devices are gathered, and then the values are normalized and constructed as a model feature vector for specific location. A number of model patterns are acquired and registered for all of the location which we want to recognize. For location sensing, signal strength information for an arbitrary moving RF device is acquired and compared with model feature vectors registered previously. In this case, distance value is calculated and the moving RF device is classified as one of the known model patterns. Experimental results show that our methods have performed the location sensing successfully with 100% rate of recognition when the number of fixed RF devices is 10 or more than 12. In terms of cost and applicability, experimental results seem to be very encouraging.

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A Study on RF Large-Signal Model for High Resistivity SOI MOS Varactor (High Resistivity SOI MOS 버랙터를 위한 RF 대신호 모델 연구)

  • Hong, Seoyoung;Lee, Seonghearn
    • Journal of the Institute of Electronics and Information Engineers
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    • v.53 no.9
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    • pp.49-53
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    • 2016
  • A new large-signal model including the voltage-dependent extrinsic gate capacitance for RF channel distribution effect is developed for a high resistivity(HR) silicon-on-insulator(SOI) RF accumulation-mode MOS varactor. The data of voltage-dependent parameters are extracted by using accurate S-parameter optimization, and empirical model equations are constructed by data fitting process. The RF accuracy of this new model is validated by observing excellent agreements between modeled and measured Y11-parameter data in the wide voltage range up to 20 GHz.

Scaling Accuracy Analysis of Substrate SPICE Model for RF MOSFETs (RF MOSFET을 위한 SPICE 기판 모델의 스케일링 정확도 분석)

  • Lee, Hyun-Jun;Lee, Seonghearn
    • Journal of the Institute of Electronics and Information Engineers
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    • v.49 no.12
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    • pp.173-178
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    • 2012
  • Using accurate MOSFET substrate parameters obtained by a RF direct extraction method, it is demonstrated that a BSIM4 model with only substrate resistances is not physically valid to apply in the wide range of gate length because of scaling inaccuracy. In order to remove the unphysical problem of the BSIM4, a modified BSIM4 model with additional dielectric substrate capacitance is used and its physical validity is verified by observing excellent gate length scalability.

Accuracy Analysis of Substrate Model for Multi-Finger RF MOSFETs Using a New Parameter Extraction Method (새로운 파라미터 추출 방법을 사용한 Multi-Finger RF MOSFET의 기판 모델 정확도 비교)

  • Choi, Min-Kwon;Kim, Ju-Young;Lee, Seong-Hearn
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.2
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    • pp.9-14
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    • 2012
  • In this study, multi-finger RF MOSFET substrate parameters are accurately extracted by using S-parameters measured from common source-bulk and common source-gate test structures. Using this extraction method, the accuracy of an asymmetrical model with three substrate resistances is verified by observing better agreement with measured Y-parameters than a simple model with a single substrate resistance. The modeled S-parameters of the asymmetrical model also show excellent agreement with measured ones up to 20GHz.