• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.135-135
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• 2015

Tubes are of extreme importance in industries as for fluid channels or wave guides. Furthermore, some weapon systems such as cannons use the tubes as gun barrels. To increase the service life of such tubes, a protective coating must be applied to the tubes' inner surface. However, the coating methods applicable to the inner surface of the tubes are very limited due to the geometrical restriction. A small-diameter cylindrical magnetron sputtering gun can be used to deposit coating layers on the inner surface of the large-bore tubes. However, for small-bore tubes with the inner diameter of one inch (~25 mm), the magnetron sputtering method can hardly be accommodated due to the space limitation for permanent magnet assembly. In this study, a new approach to coat the inner surface of small-bore tubes with the inside diameter of one inch was developed. Instead of using permanent magnets for magnetron operation, an external electro-magnet assembly was adopted around the tube to confine the plasma and to sustain the discharge. The electro-magnet was operated in pulse mode to provide the strong axial magnetic field for the magnetron operation, which was synchronized with the negative high-voltage pulse applied to the water-cooled coaxial sputtering target installed inside the tube. By moving the electro-magnet assembly along the tube's axial direction, the inner surface of the tube could be uniformly coated. The inner-surface coating system in this study used the tube itself as the vacuum chamber. The SS-304 tube's inner diameter was 22 mm and the length was ~1 m. A water-cooled Cu tube (sputtering target) of the outer diameter of 12 mm was installed inside of the SS tube (substrate) at the axial position. The 50 mm-long electro-magnet assembly was fed by a current pulse of 250 A at the frequency and pulse width of 100 Hz and 100 usec, respectively. The calculated axial magnetic field strength at the center was ~0.6 Tesla. The central Cu tube was synchronously driven by a HiPIMS power supply at the same frequency of 100 Hz as the electro-magnet and the applied pulse voltage was -1200 V with a pulse width of 500 usec. At 150 mTorr of Ar pressure, the Cu deposition rate of ~10 nm/min could be obtained. In this talk, a new method to sputter coat the inner surface of small-bore tubes would be presented and discussed, which might have broad industrial and military application areas.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.1755-1758
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• 2004

Misfiring is often observed during the high temperature quality assurancetest of plasma display panel. This limits the productivity of PDP industry. In this paper, experimental observations on the misfiring at high panel temperature have been performed through time dependent discharge light output and static margin measurement. For the high temperature condition, firing voltage increment is found in both surface and facing discharges. This in turn increases lime lag in address discharge, and results m increment of misfiring probability. In order to reduce this kind of misfiring, a new method that applies automatically different slope of ramp erasing pulse on the common electrode according to temperature variation is proposed. The experimental results show that controlling the slope of ramp erasing pulse is quite effective for compensating temperature-dependent variation of reset and address discharge.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.164-170
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• 2004

Misfiring is often observed during the high temperature quality assurance test of plasma display panel. This limits the productivity of PDP industry. In this paper, experimental observations on the misfiring at high panel temperature have been performed through time dependent discharge light output and static margin measurement. For the high temperature condition, firing voltage increment is found in both surface and facing discharges. This in turn increases time lag in address discharge, and results in increment of misfiring probability. In order to reduce this kind of misfiring, a new method that applies automatically different slope of ramp erasing pulse on the common electrode according to temperature variation is proposed. The experimental results show that controlling the slope of ramp erasing pulse is quite effective for compensating temperature-dependent variation of reset and address discharge.

• The Transactions of the Korean Institute of Power Electronics
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• v.20 no.2
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• pp.130-136
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• 2015

This study describes the structure and operation modes of vertical stabilization (VS) converter for international thermonuclear experimental reactor (ITER) and proposes a protection method. ITER VS converter supplies voltage (${\pm}1000V$)/current (${\pm}22.5kA$) to superconducting magnets for plasma current vertical stabilization. A four-quadrant operation must be achieved without zero-current discontinuous section. The operation mode of the VS converter is separated in 12-pulse mode, 6-pulse mode and circulation current mode according to the magnitude of the load current. Protection measures, such as bypass and discharge, are proposed for abnormal conditions, such as over current, over voltage, short circuit, and voltage sag. VS converter output voltage is controlled to satisfy voltage response time within 20 msec. Bypass operation is completed within 60 msec and discharge operation is performed successfully. The feasibility of the proposed control algorithm and protection measure is verified by assembling a real controller and implementing a power system including the VS converter in RTDS for a hardware-in-loop (HIL) facility.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.5
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• pp.387-391
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• 2012

Graphene was fabricated onto Ni/Si substrate using a rapid-thermal pulse CVD and they were transferred onto the Ti/PES flexible substrate. For top electrode applications of the BMNO dielectric films, graphene was patterned using a argon plasma. Through an AFM image and a leakage current density of the BMNO films grown onto various bottom electrodes before and after bending test, BMNO films grown onto the graphene bottom electrode showed no change of the microstructure and the leakage current density after the bend.

• KIEE International Transactions on Electrophysics and Applications
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• v.4C no.1
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• pp.5-9
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• 2004

In this paper, pulsed discharge is used to control the luminous color in gas discharge tubes. The luminous color of the positive column in gas discharge tubes filled with Hg-Ar-Ne (1: 9, 60［Torr］) and having no phosphor material, varies from red to blue emitted by the Ne and Hg from the pulsed discharge. With changing of pulse-width and frequency, the electron temperature in the transient period affects changes to the residual ion and metastable atom densities. The first metastable atoms containing energy levels of about 16.6 ［eV］have a very high probability that a collision will result in the ionization potential of Ar being 15.8 [eV]. The change of locus in the CIE chromaticity diagram with increasing pulse-width and frequency approves the variation of luminous color.

• Laser Solutions
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• v.17 no.4
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• pp.7-13
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• 2014

In this work, the application of laser induced breakdown spectroscopy (LIBS) for the composition analysis of thin $Cu(In,Ga)Se_2$ (CIGS) solar cell films ($1-2{\mu}m$ thickness) is reported. For the ablation of CIGS films, femtosecond (fs) laser (wavelength = 343nm, pulse width = 500fs) and nanosecond (ns) laser (wavelength = 266nm, pulse width = 5ns) were used under atmospheric environment. The emission spectra were detected with an intensified charge coupled device (ICCD) spectrometer and multichannel CCD spectrometer for fs-LIBS and ns-LIBS, respectively. The calibration curves for fs-LIBS and ns-LIBS intensity ratios of Ga/Cu, In/Cu, and Ga/In were generated with respect to the concentration ratios measured by inductively coupled plasma optical emission spectrometry (ICP-OES).

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.5
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• pp.239-244
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• 2006

To drive the high-image quality plasma displays of XGA and/or full-HD, we must effectively improve the driving waveform, which get the reset period for the stabilized control of wall charges, the address period to select discharge or non-discharge, and sustain period for luminance in 1 TV-frame, and also the display quality. To accomplish them, the development of the technology for the fast address discharge is required. In this paper, the correlation between the sustain-electrode gap and address discharge characteristics for the high-speed addressing was analyzed using the measurements of dynamic voltage margins. Results showed that the narrower the gap between the sustain electrodes, the narrower the with of the scan pulse became and a dynamic margin of data voltage of 29.2 V was obtained at scan pulse width of $1.0{\mu}s\;and\;V_{ramp}$ of 240 V for driving 4-inch test penal, which the gap between sustain electrodes was $65{\mu}m$.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.6
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• pp.23-29
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• 2013

In this paper, pure $I_{ph}$ and hybrid carbon nanotube reinforced $I_{ph}$ were sintered using the SPS(spark plasma sintering) method for high densification. A nanosecond laser (${\lambda}=1063nm$, ${\tau}P=10ns$) and a femtosecond laser (${\lambda}=1027nm$, ${\tau}P=380fs$) were installed on an optical system for the micromachining test. The ablation characteristics of the pure $I_{ph}$ and CNT/$I_{ph}$ composites, such as thermal effect and ablation depth, were investigated using FE-SEM and a confocal microscope device. Laser machining results for the two mating materials showed improved performances: CNT/$I_{ph}$ composites showed good surface morphology of hole drilling without a melting zone due to the composites' high thermal properties; also, the ablated depth of CNT/$I_{ph}$ was higher than that of pure $I_{ph}$.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.193-193
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• 2010

HIPIMS(High sputtering impulse magnetron sputtering)은 수십 ${\mu}s$의 짧은 pulse 동안 수kw의 매우 높은 파워를 인가할 수 있어 밀도 $10^{13}/cm^3$ 이상의 고밀도 플라즈마 방전이 가능하여 스퍼터된 타겟 이온들의 이온화율이 매우 높은 특징을 가진다. HIPIMS를 통해 증착한 박막의 경우 매우 치밀한 조직을 가지고 있어 기존 DC, Pulsed DC, RF 증착을 통한 박막에 비해 우수한 물성을 보여준다. 본 실험에서는 대면적의 고품위 Al:ZnO 박막을 증착하기위하여 HIPIMS 증착법을 사용하였다. 1000mm폭 타겟상에서 균일한 증착을 위하여 Balanced B-field, Unbalanced field를 각각 인가하여 실험하였다. 시뮬레이션을 통하여 타겟 중심부와 가장자리의 자기장을 결정하였으며, target edge에서의 증착율과 cathode erosion 방지를 위하여 원형 트랙형으로 보조 자석을 설치하였다. $Al_2O_3$(2wt%)가 첨가된 planar target을 사용하였고, power는 700 W~2 kW, 그리고 pulse 폭은 $50-150 {\mu}s$정도로 변화시켜 가면서 상온에서 증착하였다. 플라즈마 가스로는 Ar만을 사용하여 두께는 60-100 nm정도로 증착하였다. Plasma emission monitoring을 통해 측정한 결과 Balanced B-field 에 비해 Unbalanced B-field 조건 에서 스퍼터된 이온들의 균일도가 우수하였으며 증착된 박막의 균일도 또한 증가하였다.