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Bending Properties of the Flexible BMNO (Bi2Mg2/3Nb4/3O7) Capacitor Using Graphene Electrode

그래핀 전극을 이용한 유연한 BMNO (Bi2Mg2/3Nb4/3O7) 캐패시터의 굽힘 특성

  • Song, Hyun-A (Department of Materials Science and Engineering, Chungnam National University Daeduk Science Town) ;
  • Park, Byeong-Ju (Department of Materials Science and Engineering, Chungnam National University Daeduk Science Town) ;
  • Yoon, Soon-Gil (Department of Materials Science and Engineering, Chungnam National University Daeduk Science Town)
  • Received : 2012.04.03
  • Accepted : 2012.04.18
  • Published : 2012.05.01

Abstract

Graphene was fabricated onto Ni/Si substrate using a rapid-thermal pulse CVD and they were transferred onto the Ti/PES flexible substrate. For top electrode applications of the BMNO dielectric films, graphene was patterned using a argon plasma. Through an AFM image and a leakage current density of the BMNO films grown onto various bottom electrodes before and after bending test, BMNO films grown onto the graphene bottom electrode showed no change of the microstructure and the leakage current density after the bend.

Keywords

References

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