• Title/Summary/Keyword: Pt$TiO_{2}$

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The Dielectric Properties of the PZT Multilayered Thin Films for FRAM (FRAM 응용을 위한 PZT 다층 박막의 유전 특성)

  • Nam, Sugn-Pill;Lee, Sang-Chul;Lee, Sang-Heon;Bea, Seon-Gi;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1618-1620
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    • 2004
  • The $Pb(Zr_{0.4}Ti_{0.6})O_3/Pb(Zr_{0.6}Ti_{0.4})O_3$ [PZT(4060)/(6040)] multilayered thin films were deposited by RF Sputtering method on the Pt/Ti/$SiO_2$/Si substrate. This procedure was repeated several times to form PZT(4060)/(6040) heterolayerd thin films. The effects on the structural and dielectric properties of PZT multilayered thin films were investigated. The MFM(Metal Ferroelectric Metal) type capacitors were made using the PZT(4060)/(6040) multilayered thin films deposited with optimum deposition condition. An enhanced dielectric property was observed in the PZT(4060)/(6040) multilayered thin films. The relative dielectric constant and dielectric loss at 100Hz of the PZT(4060)/(6040)-5 multilayered thin films were about 1106 and 0.016, respectively.

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A Fabrication and ferroelectric properties of BLT Thin Films for FRAM (FRAM 응용을 위한 BLT 박막의 제작 및 특성)

  • Kim, Kyoung-Tae;Kwon, Ji-Woon;Shim, Il-Wun;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.565-568
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    • 2001
  • We have fabricated $Bi_{3.25}La_{0.75}Ti_{3}O_{12}(BLT)$ thin(200nm) films on the $Pt/Ti/SiO_{2}/Si$ substrates using a MOD(Metalorganic decomposition) method with annealing temperature from $550^{\circ}C$ to $750^{\circ}C$. The structural properties of the films examined by x-ray diffraction. The layered-perovskite phase obtained above $600^{\circ}C$. Scanning electron micrographs showed uniform surface composed of rodlike grains. The grain size increased with increasing annealing temperature. The BLT thin films showed little polarization fatigue test up to $3.5{\times}10^{9}$ bipolar cycling at a 5V and 100kHz.

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A Fabrication and ferroelectric properties of BLT Thin Films for FRAM (FRAM 응용을 위한 BLT박막의 제작 및 특성)

  • 김경태;권지운;심일운;김창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.565-568
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    • 2001
  • We have fabricated $Bi_{3.25}$$La_{0.75}$ti$_3$O$_{12}$ (BLT) thin(200nm) films on the Pt/Ti/SiO$_2$/Si substrates using a MOD(Metalorganic decomposition) method with annealing temperature from 55$0^{\circ}C$ to 75$0^{\circ}C$. The structural properties of the films examined by x-ray diffraction. The layered-perovskite phase obtained above $600^{\circ}C$. Scanning electron micrographs showed uniform surface composed of rodlike grains. The grain size increased with increasing annealing temperature. The BLT thin films showed little polarization fatigue test up to 3.5x10$^{9}$ bipolar cycling at a 5V and 100kHz.kHz.

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Hydrogen Annealing effect on the dielectric properties of $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ thin film

  • Lee, Eun-Sun;Chung, Hyun-Woo;Lim, Sung-Hoon;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.41-43
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    • 2004
  • Dielectric thin films of $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ were deposited on $Pt(111)/Ti/SiO_2/Si$ substrates in situ by pulsed laser deposition(PLD) and annealed with different gases which are forming gas and oxygen gas, respectively. The diffusion of hydrogen into the ferroelectric film was caused by annealing process and resulted in the destruction of polarization. The dielectric properties of forming gas annealed PLT thin films, which are dielectric constant, ferroelectric characteristic, and leakage current characteristics, were degraded

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Schottky Barrier Diode Fabricated on Single Crystal β-Ga2O3 Semiconductor (단결정 β-Ga2O3 반도체를 이용한 쇼트키 배리어 다이오드 제작)

  • Kim, Hyun-Seop;Jo, Min-Gi;Cha, Ho-Young
    • Journal of the Institute of Electronics and Information Engineers
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    • v.54 no.1
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    • pp.21-25
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    • 2017
  • In this study, we have fabricated Schottky barrier diodes (SBD) on single-crystal ${\beta}-Ga_2O_3$ semiconductor that has received much attention for use in next-generation power devices. The SBD had a Pt/Ti/Au Schottky contact on a $2{\mu}m$ Sn-doped low concentration N-type epitaxial layer. The fabricated device exhibited a breakdown voltage of > 180 V, a specific on-resistance of $1.26m{\Omega}{\cdot}cm^2$, and forward current densities of $77A/cm^2$ at 1 V and $473A/cm^2$ at 1.5 V, which proved the potential for use in power device fabrication.

Observation of Domain Structure and Polarization Switching in (001)-oriented Pb(Mg1/3Nb2/3)O3-x%PbTiO3 Single Crystals by Scanning Force Microscope (주사 힘 현미경에 의한 (001) Pb(Mg1/3Nb2/3)O3-x%PbTiO3 단결정의 도메인 구조 및 분극 스위칭 관찰)

  • Lee, Eun-Gu
    • Journal of the Korean Ceramic Society
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    • v.47 no.4
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    • pp.333-337
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    • 2010
  • Domain structure and polarization switching in (001)-oriented $Pb(Mg_{1/3}Nb_{2/3})O_3-x%PbTiO_3$ (PMN-x%PT) crystals for x=20 and 35at% have been investigated in-situ by scanning force microscope (SFM) in a piezoresponse mode under a step DC electrical voltage. In the initial annealed condition, polar nano domains (PND) and domain striations oriented along {110} were observed in x=20 and x=35, respectively. For x=20, domain switching occurs by heterogeneous nucleation, where nucleation is not confined in the vicinity of domain boundaries, but rather can occur throughout the crystal volume. However, for x=35, domain switching tends to be preferentially initiated near pre-existing twin boundaries. With increasing the applying voltage, the nuclei density increased and assembled into {110} striations, indicating a stress-accommodated domain growth process. At higher voltage, nucleation occurs heterogeneously throughout the crystal volume.

A Study on fabrication of Ferroelectric SBT Thin Films by Liquid Delivery MOCVD Process (Liquid Delivery MOCVD 공정을 이용한 강유전체 SBT 박막의 제조기술에 관한 연구)

  • 강동균;백승규;송석표;김병호
    • Journal of the Korean Ceramic Society
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    • v.40 no.1
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    • pp.46-51
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    • 2003
  • Ferroelectric $Sr_{0.7}Bi_{2.1}Ta_{2.0}O_9$ thin films with 200 nm thicknesses were deposited on $Pt/Ti/SiO_2/Si$ substrate by liquid delivery MOCVD process. In these experiments, $Sr(TMHD)_2{\cdot}pmdeta,\; Bi(ph)_3$ and $Ta(O^i/Pr)_4(TMHD)$ were used as precursors, which were dissolved in n-butyl acetate and pentamethyldiethylenetriamine. Substrate temperature and reactor pressure of this experiment was $570^{\circ}C$and 5 Torr, respectively. The remanent polarization value (2Pr) of SBT thin film with annealed at $780^{\circ}C$was$7.247{\mu}C/cm^2$and$8.485 {\mu}C/cm^2$by applying 3 V and 5 V, respectively.

Improvement of Efficiency of Photoelectrochemical Cells by Blocking Layer Coatings (차단막 코팅을 이용한 광전기화학셀 효율 개선)

  • Moon, Byung-Ho;Kwak, Dong-Joo;Park, Cha-Soo;Sung, Youl-Moon
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1485-1486
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    • 2011
  • A layer of $TiO_2$ thin film less than ~500nm in thickness, as a blocking layer, was coated by sol-gel method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells (DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte (I-/I3-). The effects of heat treatment conditions of the gel and as-coated film on the thickness and consolidation to substrate were studied. The flexible DSCs were fabricated with working electrode of Ti thin foil coated with blocking $TiO_2$ layer, dye-attached mesoporous $TiO_2$ film, gel electrolyte and counter electrode of Pt-deposited indium doped tin oxide/polyethylene naphthalate (ITO/PEN). The photo-current conversion efficiency of the cell was 5.3% ($V_{oc}=0.678V$, $J_{sc}=12.181mA/cm^2$, ff=0.634) under AM1.5, 100 mW/$cm^2$ illumination.

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Microwave Annealing in Ag/HfO2/Pt Structured ReRAM Device

  • Kim, Jang-Han;Kim, Hong-Ki;Jang, Ki-Hyun;Bae, Tae-Eon;Cho, Won-Ju;Chung, Hong-Bay
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.373-373
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    • 2014
  • Resistive-change random access memory (ReRAM) device is one of the promising candidates owing to its simple structure, high scalability potential and low power operation. Many resistive switching devices using transition metal oxides materials such as NiO, Al2O3, ZnO, HfO2, $TiO_2$, have attracting increased attention in recent years as the next-generation nonvolatile memory. Among various transition metal oxides materials, HfO2 has been adopted as the gate dielectric in advanced Si devices. For this reason, it is advantageous to develop an HfO2-based ReRAM devices to leverage its compatibility with Si. However, the annealing temperature of these high-k thin films for a suitable resistive memory switching is high, so there are several reports for low temperature process including microwave irradiation. In this paper, we demonstrate the bipolar resistive switching characteristics in the microwave irradiation annealing processed Ag/HfO2/Pt ReRAM device. Compared to the as-deposited Ag/HfO2/Pt device, highly improved uniformity of resistance values and operating voltage were obtained from the micro wave annealing processed HfO2 ReRAM device. In addition, a stable DC endurance (>100 cycles) and a high data retention (>104 sec) were achieved.

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Depolarization Mechanism of Alternating-current-poled Pb(Mg1/3Nb2/3)O3-PbTiO3 Single Crystals Measured using in-situ thermally Stimulated Depolarization Current (TSDC 방법을 이용한 AC 폴링된 PMN-PT 단결정의 디폴링 메커니즘 분석)

  • Lee, Geon-Ju;Kim, Hwang-Pill;Lee, Sang-Goo;Lee, Ho-Yong;Jo, Wook
    • Journal of Sensor Science and Technology
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    • v.29 no.1
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    • pp.59-62
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    • 2020
  • Currently, increasing attention is being paid to relaxor-based ferroelectric single crystals in photoacoustic images, especially for high-end applications. Among the crystals are (1-x)Pb(Mg1/3Nb2/3)O3-xPbTiO3 (PMN-100xPT) single crystals located near their morphotropic phase boundary (x = 0.30-0.35) because of their ultrahigh piezoelectric and electromechanical coupling properties. The alternating current poling (ACP) treatment, rather than the conventional direct current poling treatment, has recently been spotlighted due to its effectiveness in enhancing the piezoelectric properties. So far, it has been suggested that the enhanced piezoelectricity originates from either a domain miniaturization to nanodomains or from an electric-field-induced monoclinic symmetry. In this study, we demonstrate by thermally stimulated depolarization current measurements that the effect of ACP is too complex to be explained using a single mechanism and that the proposed electric-field-induced monoclinic symmetry is unlikely to exist.