• 제목/요약/키워드: Pseudomorphic high electron mobility transistor

검색결과 31건 처리시간 0.02초

분자선 에피탁시법으로 성장된 $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAs 슈우도형 고 전자 이동도 트랜지스터 구조의 광학적 특성 (The optical characteristics of $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAspseudomorphic high electron mobility transistor structure grown by molecular beam epitaxy)

  • 이동율;이철욱;김기홍;김종수;김동렬;배인호;전헌무;김인수
    • 한국진공학회지
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    • 제9권2호
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    • pp.130-135
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    • 2000
  • Photoluminescence(PL)와 photoreflectance(PR)를 이용하여 $Al_{0.25}/Ga_{0.75}/As/In_{0.15}/Ga_{0.85}$/AS/GaAS 슈우도형 고 전자 이동도 트랜지스터 구조에 대한 특성을 조사하였다. 온도 10K의 PL측정에서 InGaAs 양자우물에 의한 e2-hl 및 e2-hl 전이 피크가 각각 1.322 및 1.397 eV에서 관측되었다. 온도 의존성으로부터 첫번째 가전자 띠와 두번째 가전자 띠의 에너지 차이는 약 23'meV로 나타났다. 또한 300 K에서의 PR 측정으로 e2-h2및 e2-hl 전이에 의한 피크를 관측하였고, 두번째 전도 띠의 에너지 준위에 의한 피크가 띠 채움으로 인해 첫번째 전도 띠의 에너지 준위에 의한 피크보다 상대적으로 우세하였다. 반면에 PL 측정에서는 전자 가리개 효과 때문에 첫번째 전도 띠에 의한 피크가 우세하였다.

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A Fast and Robust Approach for Modeling of Nanoscale Compound Semiconductors for High Speed Digital Applications

  • Ahlawat, Anil;Pandey, Manoj;Pandey, Sujata
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제6권3호
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    • pp.182-188
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    • 2006
  • An artificial neural network model for the microwave characteristics of an InGaAs/InP hemt for 70 nm gate length has been developed. The small-signal microwave parameters have been evaluated to determine the transconductance and drain-conductance. We have further investigated the frequency characteristics of the device. The neural network training have been done using the three layer architecture using Levenberg-Marqaurdt Backpropagation algorithm. The results have been compared with the experimental data, which shows a close agreement and the validity of our proposed model.

Application of GaAs Discrete p-HEMTs in Low Cost Phase Shifters and QPSK Modulators

  • Kamenopolsky, Stanimir D.
    • ETRI Journal
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    • 제26권4호
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    • pp.307-314
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    • 2004
  • The application of a discrete pseudomorphic high electron mobility transistor (p-HEMT) as a grounded switch allows for the development of low cost phase shifters and phase modulators operating in a Ku band. This fills the gap in the development of phase control devices comprising p-i-n diodes and microwave monolithic integrated circuits (MMICs). This paper describes a discrete p-HEMT characterization and modeling in switching mode as well as the development of a low-cost four-bit phase shifter and direct quadrature phase shift keying (QPSK) modulator. The developed devices operate in a Ku band with parameters comparable to commercially available MMIC counterparts. Both of them are CMOS compatible and have no power consumption. The parameters of the QPSK modulator are very close to the requirements of available standards for satellite earth stations.

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A 4W GaAs Power Amplifier MMIC for Ku-band Satellite Communication Applications

  • Ryu, Keun-Kwan;Ahn, Ki-Burm;Kim, Sung-Chan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권4호
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    • pp.501-505
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    • 2015
  • In this paper, we demonstrated a 4W power amplifier monolithic microwave integrated circuit (MMIC) for Ku-band satellite communication applications. The used device technology relies on $0.25{\mu}m$ GaAs pseudomorphic high electron mobility transistor (PHEMT) process. The 4W power amplifier MMIC has linear gain of over 30 dB and saturated output power of over 36.1 dBm in the frequency range of 13.75 GHz ~ 14.5 GHz. Power added efficiency (PAE) is over 30 %.

Single Balanced Monolithic Diode Mixer using Marchand Balun for Millimeter-wave Applications

  • Ryu, Keun-Kwan;Kim, Sung-Chan
    • 전기전자학회논문지
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    • 제16권2호
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    • pp.127-130
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    • 2012
  • In this paper, we reported on a single balanced monolithic diode mixer using Marchand balun for millimeter-wave applications. The single balanced monolithic mixer was fabricated using drain-source-connected pseudomorphic high electron mobility transistor (PHEMT) diodes considering the PHEMT MMIC full process. The average conversion loss is 16 dB in the RF frequency range of 81~86 GHz at LO frequency of 75 GHz with LO power of 10 dBm. The RF-to-LO isolation characteristics are greater than -30 dB and the total chip size is $1.0mm{\times}1.35mm$.

MBE로 성장된 Al0.25Ga0.75As/In0.2Ga0.8As pHEMT 에피구조의 RTA에 따른 전도 특성 (RTA Effect on Transport Characteristics in Al0.25Ga0.75As/In0.2Ga0.8As pHEMT Epitaxial Structures Grown by Molecular Beam Epitaxy)

  • 김경현;홍성의;백문철;조경익;최상식;양전욱;심규환
    • 한국전기전자재료학회논문지
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    • 제19권7호
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    • pp.605-610
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    • 2006
  • We have investigated $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ structures for pseudomorphic high electron mobility transistor(pHEMT), which were grown by molecular beam epitaxy(MBE) and consequently annealed by rapid thermal anneal(RTA), using Hall measurement, photoluminescence, and transmission electron microscopy (TEM). According to intensity and full-width at half maximum maintained stable at the same energy level, the quantized energy level in $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ quantum wells was independent of the RTA conditions. However, the Hall mobility was decreased from $6,326cm^2/V.s\;to\;2,790cm^2/V.s\;and\;2,078cm^2/V.s$ after heat treatment respectively at $500^{\circ}C\;and\;600^{\circ}C$. The heat treatment which is indispensable during the fabrication procedure would cause catastrophic degradation in electrical transport properties. TEM observation revealed atomically non-uniform interfaces, but no dislocations were generated or propagated. From theoretical consideration about the mobility changes owing to inter-diffusion, the degraded mobility could be directly correlated to the interface scattering as long as samples were annealed below $600^{\circ}C$ lot 1 min.

ECR 플라즈마에서 $BCI_3/SF_6$ 혼합 가스를 이용한 $Al_{0.25}Ga_{0.75}As$에 대한 GaAs의 선택적 식각에 대한 연구 (An Investigation of Selective Etching of GaAs to Al\ulcornerGa\ulcornerAs Using BCI$_3$SF\ulcorner Gas Mixture in ECR Plasma)

  • 이철욱;이동율;손정식;배인호;박성배
    • 한국전기전자재료학회논문지
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    • 제11권6호
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    • pp.447-452
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    • 1998
  • The selective dry etching of GaAs to Al\ulcornerGa\ulcornerAs using $BCI_3/SF_6$ gas mixture in electron cyclotron resonance(ECR) plasma is investigated. A selectivity of GaAs to AlGaAs of more than 100 and maximum etch rate of GaAs are obtained at a gas ratio $SF_6/BCI_3+SF_6$ of 25%. We verified the formation of $AlF_3$ on $Al_{0.25}Ga_{0.75}As$from the Auger spectra which enhanced the etch selectivity. In order to investigate surface damage of AlGaAs caused by ECR plasma, we performed a low temperature photoluminescence(PL) measurement as a function of RF power. As the RF power. As the RF power increases, the PL intensity decreases monotonically from 50 to 100 Wand then repidly decreases until 250 W. This behavior is due to surface damage by plasma treatment. This dry etching technique using $BCI_3/SF_6$ gas mixture in ECR plasma is suitable for gate recess formation on the GaAs based pseudomorphic high electron mobility transistor(PHEMT)

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分子線에피택셜 方法으로 成長한 I $n_{0.53}$GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT 構造內의 V 및 X字形 缺陷에 關한 硏究 (A study on the V and X shpe defects in I $n_{0.53}$GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT structure grown by molecular beam epitaxy method)

  • 이해권;홍상기;김상기;노동원;이재진;편광의;박형무
    • 전자공학회논문지D
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    • 제34D권7호
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    • pp.56-61
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    • 1997
  • I $n_{0.53}$G $a_{0.47}$As/I $n_{0.52}$A $l_{0.48}$As pseudomorphic high electron mobility transistor (P-HEMT) structures were grown on semi-insulating InP substrates by molecular beam epitzxy method. The hall effect measuremetn was used to measure the electrical properties and the photoluminescence (PL) measurement was used to measure the electrical properties and the photoluminescence(PL) measurement for optical propety. By the cross-sectional transmission electron microscopy (XTEM) investigation of the V and X shape defects including slip with angle of 60.deg. C and 120.deg. C to surface in the sampel, the defects formation mecahnism in the I $n_{0.52}$A $l_{0.48}$As epilayers on InP substrates could be explained with the different thermal expansion coefficients between I $n_{0.52}$A $l_{0.48}$As epilayers and InP substrate.d InP substrate.

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Low Noise and High Linearity GaAs LNA MMIC with Novel Active Bias Circuit for LTE Applications

  • Ryu, Keun-Kwan;Kim, Yong-Hwan;Kim, Sung-Chan
    • Journal of information and communication convergence engineering
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    • 제15권2호
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    • pp.112-116
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    • 2017
  • In this work, we demonstrated a low noise and high linearity low noise amplifier (LNA) monolithic microwave integrated circuit (MMIC) with novel active bias circuit for LTE applications. The device technology used in this work relies on a process involving a $0.25-{\mu}m$ GaAs pseudomorphic high electron mobility transistor (PHEMT). The LNA MMIC with a novel active bias circuit has a small signal gain of $19.7{\pm}1.5dB$ and output third order intercept point (OIP3) of 38-39 dBm in the frequency range 1.75-2.65 GHz. The noise figure (NF) is less than 0.58 dB over the full bandwidth. Compared with the characteristics of the LNA MMIC without using the novel active bias circuit, the OIP3 is improved about 2-3 dBm. The small signal gain and NF showed no significant change after using the active bias circuit. The novel active bias circuit indeed improves the linearity performance of the LNA MMIC without degradation.

E-Band Wideband MMIC Receiver Using 0.1 ${\mu}m$ GaAs pHEMT Process

  • Kim, Bong-Su;Byun, Woo-Jin;Kang, Min-Soo;Kim, Kwang Seon
    • ETRI Journal
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    • 제34권4호
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    • pp.485-491
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    • 2012
  • In this paper, the implementations of a $0.1{\mu}m$ gallium arsenide (GaAs) pseudomorphic high electron mobility transistor process for a low noise amplifier (LNA), a subharmonically pumped (SHP) mixer, and a single-chip receiver for 70/80 GHz point-to-point communications are presented. To obtain high-gain performance and good flatness for a 15 GHz (71 GHz to 86 GHz) wideband LNA, a five-stage input/output port transmission line matching method is used. To decrease the package loss and cost, 2nd and 4th SHP mixers were designed. From the measured results, the five-stage LNA shows a gain of 23 dB and a noise figure of 4.5 dB. The 2nd and 4th SHP mixers show conversion losses of 12 dB and 17 dB and input P1dB of -1.5 dBm to 1.5 dBm. Finally, a single-chip receiver based on the 4th SHP mixer shows a gain of 6 dB, a noise figure of 6 dB, and an input P1dB of -21 dBm.