A Study on Characteristics of Microcrystalline-silicon Films Fabricated by PECVD Method (플라즈마 화학증착법으로 제작한 미세결정질 실리콘 박막 특성에 관한 연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.21 no.9
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- pp.848-852
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- 2008