• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 C
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• pp.1292-1294
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• 1994

With the contact angle of phase epoxy resin on the inorganic filler(glass plate) surface treated with air plasma, we have studied about the interface between epoxy resin and glass plate as simple model of a glass fiber reinforced composite materials. The contact angle on the inorganic filler surface varied with surface treatment conditions. The contact angle significantly depends on plasma treating time and environment temperature of the oven.

• 공업화학
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• 제17권1호
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• pp.1-11
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• 2006

본 논문에서는 대기압 저온 플라즈마를 이용하여 저농도의 유해물질로서 배출되는 NOx, SOx, 휘발성 유기화학물(VOCs), 악취, 매연입자를 처리하는 대기환경설비기술에 대해 살펴보았다. 대기압 저온 플라즈마는 대부분 코로나 및 유전체방전을 통해 발생되며, 저온 플라즈마는 배출가스의 99% 이상을 차지하는 산소, 질소, 이산화탄소 및 수증기의 엔탈피를 증가시키지 않고서도 즉, 낮은 공정온도 조건에서 유해가스를 선택적으로 처리하는 장점이 있다. 본 논문에서는 저온 플라즈마 발생 및 이로 인해 유도된 화학반응의 특성을 수치해석 및 실험결과를 통해 살펴봄으로서 유해물질을 처리하는데 적합한 플라즈마의 조건(전자 에너지 밀도)을 제시하였고, 이를 구체적으로 달성하기 위한 반응기 형상 및 전력조건을 제시하였다. 본 논문의 후반부에서는 해당기술의 개발사례 및 현재 이들 기술이 갖는 기술 및 경제적인 한계점을 제시함으로서 향후 관련기술의 완성도를 높이는데 도움이 되고자 하였다.

• 조명전기설비학회논문지
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• 제23권12호
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• pp.184-190
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• 2009

표면의 친수성 작용기 형성과 접촉각 향상을 위하여 대기압 플라즈마를 이용하여 Tri-acetyl-cellulose(TAC) 필름에 대한 표면개질을 연구하였다. TAC 필름의 표면개질 목적으로 대기압에서 플라즈마를 발생시키기 위한 Dielectric barrier discharge(DBD) 구조의 플라즈마 반응기 내에서 이온화된 질소 플라즈마를 사용하였다. 플라즈마 처리 공정변수인 처리속도, 방전전력, 방전 갭 및 질소 가스 유속을 변화시켜가며 접촉각을 측정하여 접촉각과 표면에너지 변화를 검토하였다. 대기압 플라즈마 처리속도 100[mm/sec], 방전 전력 1.5[kW], 방전 갭 2[mm] 및 $N_2$ 가스유량 140[LPM] 에서 가장 높은 접촉각과 표면에너지 값을 보였다. 표면친수화의 정도는 플라즈마 방전 전력과 처리 시간에 의존하였다.

• Macromolecular Research
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• 제12권6호
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• pp.553-558
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• 2004

An ultrafiltration membrane (polyethersulfone, PM 10) was surface-modified by treating it with low-tem­perature plasmas of oxygen, acrylic acid (AA), acetylene, diaminocyolohexane (DACH), and hexamethyldisiloxane (HMDSO). The effects that these modifications have on the filtration efficiency of a membrane in waste water treat­ment were investigated. The oxygen, AA, and DACH plasma-treated membranes became more hydrophilic. The water contact angles ranged from < $10^{\circ}\;to\;55^{\circ}$ depending on the type of plasma and the treatment conditions. The oxygen plasma-treated membranes displayed a higher initial flux $(312-429\%),$ but lower rejection $(6-91\%),$ than did an untreated membrane. The AA plasma-treated membranes displayed lower or higher initial flux $(42-156\%),$ depending upon the treatment conditions, but higher rejection $(224-295\%)$ in all cases. The DACH plasma-treated membranes displayed lower initial flux. All of them, especially the AA plasma-treated membrane, displayed improved fouling resistance with either a slower or no flux decline. Acetylene and HMDSO plasma-treated membranes became more hydrophobic and displayed both lower initial flux and lower fouling resistance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.246-246
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• 2010

As the trench width in the interconnect technology decreases down to nano-scale below 50 nm, superconformal gap-filling process of Cu becomes very critical for Cu interconnect. Obtaining superconfomral gap-filling of Cu in the nano-scale trench or via hole using MOCVD is essential to control nucleation and growth of Cu. Therefore, nucleation of Cu must be suppressed near the entrance surface of the trench while Cu layer nucleates and grows at the bottom of the trench. In this study, suppression of Cu nucleation was achieved by treating the Ru barrier metal surface with capacitively coupled hydrogen plasma. Effect of hydrogen plasma pretreatment on Cu nucleation was investigated during MOCVD on atomic-layer deposited (ALD)-Ru barrier surface. It was found that the nucleation and growth of Cu was affected by hydrogen plasma treatment condition. In particular, as the plasma pretreatment time and electrode power increased, Cu nucleation was inhibited. Experimental data suggests that hydrogen atoms from the plasma was implanted onto the Ru surface, which resulted in suppression of Cu nucleation owing to prevention of adsorption of Cu precursor molecules. Due to the hydrogen plasma treatment of the trench on Ru barrier surface, the suppression of Cu nucleation near the entrance of the trenches was achieved and then led to the superconformal gap filling of the nano-scale trenches. In the case for without hydrogen plasma treatments, however, over-grown Cu covered the whole entrance of nano-scale trenches. Detailed mechanism of nucleation suppression and resulting in nano-scale superconformal gap-filling of Cu will be discussed in detail.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2001년도 제34회 추계학술대회 개최
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• pp.35-42
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• 2001

Nanotribological characteristics between a Si$_3$N$_4$ AFM tip and hydrophobic thin films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various ranges of normal load. Plasma-modified thin polymeric films were deposited on Si-wafer (100). Results showed that wetting angle of plasma-modified thin polymeric film increased with the treating time, which resulted in the hydrophobic surface and the decrease of adhesion and friction. Nanotribological characteristics of these surfaces were compared with those of other hydrophobic surfaces, such as DLC, OTS and IBAD-Ag coated surfaces. Those of OTS coated surface was superior to those of others, though wetting angle of plasma-modified thin polymeric film is higher.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1993년도 하계학술대회 논문집 B
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• pp.581-583
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• 1993

One of the principal problems encountered in the use of fiber reinforced composites is to establish an active fiber surface to achieve maximum adhesion between resin and fiber surface. In order to improve the interface bonding, the surface of glass fiber should be treated with silane coupling agent in ordinary composite manufacturing processes. However, the price of the coupling agent is very high and in the treating process voids are formed, which decreasees electrical and mechanical strength. We want to develope new process that will overcome the disadvantage of the coupling agent and achieve maximum adhesion at the interface between resin and fiber by active plasma treatment on the glass fiber surface. In this study, we investigate the improvement of contact angle on the glass plate surface as the first step in developing new GFRP.

• Maxillofacial Plastic and Reconstructive Surgery
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• 제28권3호
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• pp.262-267
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• 2006

The term temporomandibular disorders is used to describe a group of conditions that involve the temporomandibular joint, masticatory muscles, and associated structures. Many modalities have been proposed for treating temporomandibular disorders, including medication, physical therapy, occlusal stabilization splints with or without manual repositioning, surgery, and arthrocentesis. Temporomandibular disorders are treated in a step-wise manner. Initially, conservative treatment is used. Depending on the response, more aggressive interventions may be necessary. This usually takes the form of arthrocentesis. Arthrocentesis is used in the treatment of not only acute, closed, and locked TMJs but also various other temporomandibular disorders. Recently, the intra-articular injection of sodium hyaluronate after arthrocentesis was shown to have long-term palliative effects on TMJ symptoms. Synovial fluid consists of plasma and glycosaminoglycan, including hyaluronic acid derived from synovial cells. Sodium hyaluronate, the sodium salt of hyaluronic acid, is a high-molecular-weight polysaccharide and a major component of synovial fluid. This highly viscous substance has analgesic properties, lubricant effects, and anti-inflammatory actions; it causes cartilage formation and plays a role in the nutrition of avascular parts of the disc and condylar cartilage. We conclude that the intra-articular injection of sodium hyaluronate is effective for treating temporomandibular disorders.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.17-18
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• 2011

Plasma in liquid phase has attracted great attention in the last few years by the wide domain of applications in material processing, decomposition of organic and inorganic chemical compounds and sterilization of water. The plasma in liquid is characterized by three main regions which interact each - other during the plasma operation: the liquid phase, which supply the plasma gas phase with various chemical compounds and ions, the plasma in the gas phase at atmospheric pressure and the interface between these two regions. The most complex region, but extremely interesting from the fundamental, chemical and physical processes which occur here, is the boundary between the liquid phase and the plasma gas phase. In our laboratory, plasma in liquid which behaves as a glow discharge type, is generated by using a bipolar pulsed power supply, with variable pulse width, in the range of 0.5~10 ${\mu}s$ and 10 to 30 kHz repetition rate. Plasma in water and other different solutions was characterized by electrical and optical measurements. Strong emissions of OH and H radicals dominate the optical spectra. Generally water with 500 ${\mu}S/cm$ conductivity has a breakdown voltage around 2 kV, depending on the pulse width and the repetition rate of the power supply. The characteristics of the plasma initiated in ultrapure water between pairs of different materials used for electrodes (W and Ta) were investigated by the time-resolved optical emission and the broad-band absorption spectroscopy. The deexcitation processes of the reactive species formed in the water plasma depend on the electrode material, but have been independent on the polarity of the applied voltage pulses. Recently, Coherent anti-Stokes Raman Spectroscopy method was employed to investigate the chemistry in the liquid phase and at the interface between the gas and the liquid phases of the solution plasma system. The use of the solution plasma allows rapid fabrication of the metal nanoparticles without being necessary the addition of different reducing agents, because plasma in the liquid phase provides a reaction field with a highly excited energy radicals. We successfully synthesized gold nanoparticles using a glow discharge in aqueous solution. Nanoparticles with an average size of less than 10 nm were obtained using chlorauric acid solutions as the metal source. Carbon/Pt hybrid nanostructures have been obtained by treating carbon balls, synthesized in a CVD chamber, with hexachloro- platinum acid in a solution plasma system. The solution plasma was successfully used to remove the template remained after the mesoporous silica synthesis. Surface functionalization of the carbon structures and the silica surface with different chemical groups and nanoparticles, was also performed by processing these materials in the liquid plasma.

• 전기의세계
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• 제22권3호
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• pp.35-48
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• 1973

This paper deals with wave propagations in solid state electron plasmas from the view point of treating the plasma as a conducting fluid, and especially consideration is extended to the effect of diffusion on the permittivities and dispersion relations. The analysis is based on the conception of the self-consistent field approximation. It is shown for the cases of the specific physical configurations that the positions of the null elements in the permittivity tensors are not affected by the diffusion terms, and the diffusion effect appears only in the case of the space-charge wave. It is also shown that the magnitude of the real part of wave vector is in proportion to the 3/2nds power of the field in some regions.