• Journal of electromagnetic engineering and science
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• 제12권1호
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• pp.45-54
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• 2012

When the cylindrical wave is incident on a plane dielectric interface from a denser medium to a rarer one, the asymptotic solution for the transmitted wave in the near region is different from the one in the far region. In this paper, we have derived a novel uniform asymptotic solution represented by using the parabolic cylinder function for the transmitted and scattered waves observed in the rarer medium when the cylindrical wave is incident on the plane dielectric interface from the denser medium. The validity of the uniform asymptotic solution has been confirmed by comparing with the reference solution calculated numerically. It has been clarified that the transition wave plays an important role to connect smoothly the asymptotic solution in the near region to the one in the far region through the transition region. We have shown the very interesting phenomenon that the lateral wave type transmitted wave is observed in the far and shallow region.

• 한국광학회:학술대회논문집
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• 한국광학회 2009년도 동계학술발표회 논문집
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• pp.233-234
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• 2009

The theoretical study of a surface-plasmon wave at a planar metal-chiral interface is presented in this communication. It is found that a surface-plasmon wave can be excited at the planar interface of a thin metal film and a structurally dielectric chiral medium, if the exciting plane wave is P-polarized.

• 한국정보통신학회논문지
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• 제16권6호
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• pp.1141-1147
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• 2012

본 논문에서는 Debye 분산 특성을 가지는 복제 방지용 PUF를 설계하기 위한 전자계 해석 방안을 고려하였다. 공기층과 유전체 기판 위에 형성된 분산매질(Si)로 구성된 1차원 모델 내에 전파하는 펄스를 모형하기 위해 FDTD법을 이용하였다. 불연속 경계면에 도달한 펄스는 일부 반사되고 일부는 투과되어 빠르게 감쇠되는 것으로 나타났다. 그 결과 FDTD법에 의한 유전체 기판을 고려한 Debye 분산특성을 가지는 1차원 복제방지용 PUF 모델링에 적용 가능한 것을 확인하였다.

• Journal of the Optical Society of Korea
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• 제17권1호
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• pp.27-32
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• 2013

Based on the dispersive feature of the dielectric function of noble metals and the wave vector conservation in physics, both the plasma effect and the complex refractive index, which are profoundly correlated to the complex dielectric function and permeability, have been studied and analyzed. The condition to induce a bulk or a surface plasma in the visible region will not be satisfied, and there will be one solution for the real and the imaginary parts of the refractive index, restricting it only to region I of the complex plane. The results given in this work will aid in understanding the properties of light transmission at the metal/dielectric interface as characterized by the law of refraction in nature.

• 한국전기전자재료학회논문지
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• 제11권12호
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• pp.1122-1127
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• 1998

Group II-AF_2$films such as $CaF_2$, $SrF_2$, and $BaF_2$ have been commonly used many practical applications such as silicon on insulatro(SOI), three-dimensional integrated circuits, buffer layers, and gate dielectrics in filed effect transistor. This paper presents electrical and structural properties of fluoride films as a gate dielectric layer. Conventional gate dielectric materials of TFTs like oxide group exhibited problems on high interface trap charge density($D_it$), and interface state incorporation with O-H bond created by mobile hydrogen and oxygen atoms. To overcome such problems in conventional gate insulators, we have investigated $CaF_2$ films on Si substrates. Fluoride films were deposited using a high vacuum evaporation method on the Si and glass substrate. $CaF_2$ films were preferentially grown in (200) plane direction at room temperature. We were able to achieve a minimum lattice mismatch of 0.74% between Si and $CaF_2$ films. Average roughness of $CaF_2$ films was decreased from 54.1 ${\AA}$ to 8.40 ${\AA}$ as temperature increased form RT and $300^{\circ}C$. Well fabricated MIM device showed breakdown electric field of 1.27 MV/cm and low leakage current of $10^{-10}$ A/$cm^2$. Interface trap charge density between $CaF_2$ film and Si substrate was as low as $1.8{\times}10^{11}cm^{-2}eV^{-1}$.

• 접착 및 계면
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• 제20권4호
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• pp.155-161
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• 2019

공액분자 나노구조체 계면에서의 전하이동 이방성을 이해하는 것은 유기전계효과트랜지스터(OFET)에서 구조-물성 상관관계를 규명하는데 중요하다. 본 연구에서는 대표적인 코페이셜 적층구조를 가진 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-pentacene) 유기반도체 단결정과 산화물 계면에서 전하이동도 이방성을 연구하였다. 용매치환공정을 이용해 유기단결정을 산화실리콘 절연체 표면에 성장시키고 유기단결정/산화물 계면에서 전하이동을 유도할 수 있도록 OFET 소자를 완성하였다. TIPS-pentacene OFET에서 최고/최저 전하이동도 이방성은 5.2로 관찰되었다. TIPS-pentacene의 전하이동을 담당하는 공액부의 최인접부와의 상호작용을 분석한 결과, HOMO 준위 커플링과 전하의 호핑 궤도가 전하이동도 이방성에 기여하는 것으로 밝혀졌다. HOMO 준위 커플링에 기반한 전하이동도 이방성의 정량적 예측은 실험결과와 유사하게 나타났다.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1998년도 PROCEEDINGS OF THE 14TH KACG TECHNICAL MEETING AND THE 5TH KOREA-JAPAN EMGS (ELECTRONIC MATERIALS GROWTH SYMPOSIUM)
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• pp.145-148
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• 1998

Fluoride({{{{ { CaF}_{2 } }}}}) films exhibited a cubic structure with similar lattice constant to that of Si and have sufficient breakdown electric field as gate dielectric material. Therefore, {{{{ { CaF}_{2 } }}}} are expected to replace conventional insulator such {{{{ { SiO}_{ 2},{Ta}_{2}{O}_{ 2} and{Al}_{2}{O}_{5}. However, {CaF}_{2}}}}} films showed hystereisis properties due to mobile charges in the film. To solve this problem we performed thermal treatment and achieves field. C-v results indicate a reduced hystereisis window of {{{{ }}}}ΔV =0.2v, LOW INTERFACE STATE {{{{{D}_{it}=2.0 TIMES {10}^{11}{cm}^{-1}{eV}^{-1}}}}} in midgap, and good WIS diode properties. We observed a preferential crystallization of(200) plane from XRD analysis. RTA treatment effects on various material properties of {{{{{CaF}_{2}}}}} are presented in this paper.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1996년도 The 9th KACG Technical Annual Meeting and the 3rd Korea-Japan EMGS (Electronic Materials Growth Symposium)
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• pp.258-292
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• 1996

In the last year great interest appears to YBCO thin films preparation on different substrate materials. Preparation of epitaxial film is a very difficult problem. There are many requirements to substrate materials that must be fullfilled. Main problems are lattice mismatch (misfit) and similarity of structure. From paper [1] or follows that difference in interatomic distances and angles of substrate and film is mire important problem than similarity of structure. In this work we present interatomic distances and angle relations between substrate materials belonging to ABCO4 group (where A-Sr or Ca, B-rare earth element, C-Al or Ga) of different orientations and YBCO thin films. There are many materials used as substrates for HTsC thin films. ABCO4 group of compounds is characterized by small dielectric constants (it is necessary for microwave applications of HTsC films), absence of twins and small misfit [2]. There most interesting compounds CaNdAlO4, SrLaAlO4 and SrLaGaO4 were investigated. All these compounds are of pseudo-perovskite structure with space group 14/mmm. This structure is very similar to structure of YBCO. SLG substrate has the lowest misfit (0.3%) and dielectric constant. For preparation of then films of substrates of this group of compound plane of <100> orientation are mainly used. Good quality films of <001> orientations are obtained [3]. In this case not only a-a misfit play role, but c-3b misfit is very important too. Sometimes, for preparation of thin films substrates of <001> and <110> orientations were manufactured [3]. Different misfits for different YBCO faces have been analyzed. It has been found that the mismatching factor for (100) face is very similar to that for (001) face so there is possibility of preparation of thin films on both orientations. SrLaAlO4(SLA) and SrLaGaO4(SLG) crystals of general formula ABCO4 have been grown by the Czochralski method. The quality of SLA and SLG crystals strongly depends on axial gradient of temperature and growth and rotation rates. High quality crystals were obtained at axial gradient of temperature near crystal-melt interface lower than 50℃/cm, growth rate 1-3 mm/h and the rotation rate changing from 10-20pm[4]. Strong anisotropy in morphology of SLA and SLG single crystals grown by the Czochralski method is clearly visible. On the basics of our considerations for ABCO4 type of the tetragonal crystals there can appear {001}, {101}, and {110} faces for ionic type model [5]. Morphology of these crystals depend on ionic-covalent character of bonding and crystal growth parameters. Point defects are observed in crystals and they are reflected in color changes (colorless, yellow, green). Point defects are detected in directions perpendicular to oxide planes and are connected with instability of oxygen position in lattice. To investigate facets formations crystals were doped with Cr3+, Er3+, Pr3+, Ba2+. Chromium greater size ion which is substituted for Al3+ clearly induces faceting. There appear easy {110} faces and SLA crystals crack even then the amount of Cr is below 0.3at.% SLG single crystals are not so sensitive to the content of chromium ions. It was also found that if {110} face appears at the beginning of growth process the crystal changes its color on the plane {110} but it happens only on the shoulder part. The projection of {110} face has a great amount of oxygen positions which can be easy defected. Pure and doped SLA and SLG crystals measured by EPR in the<110> direction show more intensive lines than in other directions which allows to suggest that the amount of oxygen defects on the {110} plane is higher. In order to find the origin of colors and their relation with the crystal stability, a set of SLA and SLG crystals were investigated using optical spectroscopy. The colored samples exhibit an absorption band stretching from the UV absorption edge of the crystal, from about 240 nm to about 550 m. In the case of colorless sample, the absorption spectrum consists of a relatively weak band in the UV region. The spectral position and intensities of absorption bands of SLA are typical for imperfection similar to color centers which may be created in most of oxide crystals by UV and X-radiation. It is pointed out that crystal growth process of polycomponent oxide crystals by Czochralski method depends on the preparation of melt and its stoichiometry, orientation of seed, gradient of temperature at crystal-melt interface, parameters of growth (rotation and pulling rate) and control of red-ox atmosphere during seeding and growth (rotation and pulling rate) and control of red-ox atmosphere during seeding and growth. Growth parameters have an influence on the morphology of crystal-melt interface, type and concentration of defects.

• The Korean Journal of Ceramics
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• 제6권2호
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• pp.138-142
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• 2000

Thin film $LiNbO_3$MFS (metal-ferroelectric-semiconductor) capacitor showed improved characteristics such as low interface trap density, low interaction with Si substrate, and large remanent polarization. This paper reports ferroelectric $LiNbO_3$thin films grown directly on p-type Si (100) substrates by 13.56 MHz RF magnetron sputtering system for FRAM (ferroelectric random access memory) applications. RTA (rapid thermal anneal) treatment was performed for as-deposited films in an oxygen atmosphere at $600^{\circ}C$ for 60sec. We learned from X-ray diffraction that the RTA treated films were changed from amorphous to poly-crystalline $LiNbO_3$which exhibited (012), (015), (022), and (023) plane. Low temperature film growth and post RTA treatments improved the leakage current of $LiNbO_3$films while keeping other properties almost as same as high substrate temperature grown samples. The leakage current density of $LiNbO_3$films decreased from $10^{-5}$ to $10^{-7}$A/$\textrm{cm}^2$ after RTA treatment. Breakdown electric field of the films exhibited higher than 500 kV/cm. C-V curves showed the clockwise hysteresis which represents ferroelectric switching characteristics. Calculated dielectric constant of thin film $LiNbO_3$illustrated as high as 27.9. From ferroelectric measurement, the remanent polarization and coercive field were achieved as 1.37 $\muC/\textrm{cm}^2$ and 170 kV/cm, respectively.

• 한국재료학회지
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• 제8권11호
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• pp.1067-1073
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• 1998

CO와 $H_2$의 탄소원을 사용한 마이크로파 플라즈마 화학기상증착 방법으로 SOD 구조에 적용될 양질의 다이아몬드 박막을 형성하였고, SOD 구조를 형성하기 위해 diamond/Si(100) 구조 위에 poly-Si 박막을 저압화학기상 증착법으로 제작하였다. CO/$H_2$탄소원의 유량비 증가에 따라 다이아몬드의 결정은 octahedron 구조에서 cubo-octahedron 구조로 바뀌었으며, 결정면은 {111}과 {100}으로 혼합되어 형성되었다. 비정질 carbon과 non-diamond성분이 없는 양질의 다이아몬드 박막은 CO/$H_2$의 유량비가 0.18일 때 형성되었으며, 주 결정상은 (111) 면이었다. diamond/Si(100) 계면은 void가 없는 평활한 계면을 이루었으며, 다이아몬드 박막의 유전상수, 누설전류와 비저항은 각각 $5.31\times10^{-9}A/cm^2$ 그리고 $9\times{10^7}{\Omega}cm$이었다.