• Title/Summary/Keyword: PET Substrate

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Characterization of the Crystallized ITO Thin Films Grown at Different Temperatures by Off-axis RF Magnetron Sputtering (유연성 기판 위에 증착된 ITO 박막의 공정 온도에 따른 전기적·광학적 특성 평가)

  • Choi, Hyung-Jin;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.5
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    • pp.397-400
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    • 2013
  • Off-axis magnetron sputtering was used for the crystallized ITO thin films deposition at various temperatures from 25 to $120^{\circ}C$. The ITO thin films were crystallized at $50^{\circ}C$ for Si (001) substrates and at $75^{\circ}C$ for PET substrate. The ITO thin films grown onto PET substrate at $120^{\circ}C$ were crystallized with a (222) preferred orientation. The 160-nm thick ITO films showed a resistivity of about $7{\times}10^{-4}{\Omega}{\cdot}cm$ and a transmittance of about 84% at a wavelength of 550 nm. Off-axis sputtering can be applied for low temperature crystallization of the ITO films.

Bendable ac-PDP using Fence-Structured Electrodes on Polyethylene Terephthalate Substrate

  • Choi, Won-Yeol;Hong, Cho-Rong;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.593-596
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    • 2007
  • A possibility of manufacturing bendable ac-PDP using aluminum electrode with anodic aluminum oxide dielectric material system on PET film substrate was explored. For this structure, PET film with fence-structured aluminum electrodes was used for front plate and PET film with barrier ribs of UV curable resin for the rear plate. The results demonstrate that it is feasible to manufacture the bendable ac-PDPs using those material system and are expected to expand the applications of plasma display panels.

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Electrical Properties of ZnO:Al Transparent Conducting Thin Films for Film-Typed Dye Sensitized Solar Cell

  • Kwak, Dong-Joo
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.22 no.11
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    • pp.36-43
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    • 2008
  • In this parer aluminium-doped zinc oxide(ZnO:Al) conducting layer was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method. The effects of gas pressure and r. f. sputtering power on the structural and electrical properties of ZnO:Al thin film were investigated experimentally. Especially the effect of position of PET substrate on the electrical properties of the film was studied and fixed to improve the electrical properties and also to increase the deposition rate. The results show that the structural and electrical properties of ZnO:Al thin film were strongly influenced by the gas pressure and sputtering power. The minimum resistivity of $1.1{\times}10^{-3}[{\Omega}-cm]$ was obtained at 5[mTorr] of gas pressure, and 18D[W] of sputtering power. The deposition rate of ZnO:Al film at 5[mTorr] of gas pressure was 248[nm/min]. and is higher by around 3 times compared to that at 25[mTorr].

Electrical property improvement of ZnO:Al transparent conducting oxide thin film as surface treatment of polymer substrate (폴리머 기판의 표면개질을 통한 ZnO:Al 투명전도막의 전기적 특성 개선)

  • Paeng, Sung-Hwan;Jung, Ki-Young;Park, Byung-Wook;Kwak, Dong-Joo
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1352-1353
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    • 2008
  • In this study, aluminium - doped zinc oxide (ZnO:Al) transparent conducting film was deposited on PET(polyethylen terephthalate) substrate by r.f. magnetron sputtering method. PET substrate was surface-treated in an atmospheric pressure DBD(dielectric barrier discharge) plasma to increase deposition rate and to improve electrical propesties. Morphological changes by DBD plasma were obsered using contact angle measurement. The contact angle of water on PET was reduced from 62$^{\circ}$ to 42$^{\circ}$ by DBD plasma surface treatment. The plasma treatment also increased deposition rate and electrical propesties. The electrical resistivity as low as $4.97{\times}10^{-3}[{\Omega}-cm]$ and the deposition rate of 234[${\AA}$-m/min] were obtained in ZnO:Al film with surface treatment time of 5min, and 20min., respectively.

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Electrical Properties of PET(polyethylene teraphthalate) by Ion Implantation (이온주입에 의한 PET(polyethylene teraphthalate)의 표면결합상태 변화와 표면전기전도도 특성)

  • 이재형;길재근
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.7
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    • pp.382-386
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    • 2004
  • A study has been made of surface modification of organic materials by ion implantation to increase the surface electrical properties. The substrate used were PET(polyethylene teraphtalate). N$^{+}$, Ar$^{+}$ implantation was peformed at energies of 40 keV and 50 keV with fluences from $5{\times}10^{15}$, $1{\times}10^{16}$,$7{\times}10^{16}$, $1{\times}10^{17}$/ ions/$cm^2$. UV/Vis, FT-IR and XPS spectroscopy measured for surface structure changes. Surface resistance decrease of implanted polymers was affected by ion implantation energy, ion species and ion dose rate. Surface conductivity of PET increased $2{\times}10^{9}$/∼$2{\times}10^{10}$/$\Omega$/sq by ion implantation. Result of various spectroscopy analysis, the cause of increasing PET surface conductivity was expected to breaking C=O bonds. It was formation carbon network structure by promote cross-linking and create C-C, C=C bonds.

Preparation and Properties of UV Curable Hard Coating Materials on PET (자외선 경화형 고경도 PET 필름의 제조 및 특성)

  • Kim, Hyunjoon
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.1
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    • pp.35-41
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    • 2014
  • UV curable transparent hard coating materials have been developed to improve the mechanical and optical properties of PET substrate. The coating materials were synthesized using various urethane acrylate oligomers, monomers, photo initiators, and leveling agents. The materials were coated on PET substrates and UV cured. The hard coated PET films were shown to have the good scratch resistance and transparency. When the urethane acrylate oligomer with more functional groups was introduced into the coating solution, the mechanical and optical properties were improved. However the higher concentration of 9-functional oligomer resulted in the decrease of workability. The addition of trimethylolpropane ethoxylate$(EO/OH)_9$ triacrylate(TMPETA) to coating solution improved the workability and properties. As a result, the UV cured film from the formulation of urethane acrylate oligomer with 9-functional groups, TMPETA as a monomer, IRACURE 754 as a photo initiator and BYK-340 as a leveling agent showed the best mechanical and optical properties in this study.

Electrical and Optical Properties of CdS Thin Films grown on the Flexible Substrate (유연한 기판위에 성장된 CdS 박막의 전기적, 광학적 특성)

  • Kim, Young-Dong;Na, Young-Il;Lee, Jae-Heong;Jung, Hak-Kee;Jung, Dong-Su;Lim, Dong-Gun;Yang, Kea-Joon;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.276-279
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    • 2004
  • CdS thin films on polymer substrates such as polycarbonate(PC) and polyethylene terephthalat(PET) have many merits such as light weight, small volume and can make the obtained devices folded, easily carried. In present work, CdS thin films on glass, PC, and PET substrates have been prepared by chemical bath deposition. The structural and optical propertied of the films depending on substrate types have been investigated.

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Dependence of Substrate Type on the Properties of ZnO Films deposited by r.f. magnetron sputtering (ZnO 박막의 기판종류에 따른 구조적, 광학적 특성)

  • Lee, Dong-Jin;Lee, Jae-Hyeong;Ju, Jung-Hun;Song, Jun-Tae;Lee, Kyu-Il;Yang, Kea-Joon;Lim, Dong-Gun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.125-126
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    • 2006
  • ZnO Films have been prepared on polycarbonate (PC), polyethylene terephthalate (PET), and Coming 7059 substrates by r.f. magnetron sputtering technique. A comparison of the properties of the films deposited on polymer and glass substrates was performed. In addition, the effect of the sputter power on the structural and optical properties of these films was evaluated.

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Structural Properties of chemically deposited CdS Films on plasma treated PET (고밀도 산소 플라즈마 처리된 폴리머 기판에 성장시킨 CdS 박막의 특성 분석)

  • Song, Woo-Chang;Park, Seung-Beom;Lim, Dong-Gun;Lee, Jae-Hyeong;Park, Jong-Kuk;Park, Ha-Yong;Kim, Jeong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.228-228
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    • 2008
  • CdS is II-VI semiconductor with a wide band gap of approximately 2.42 eV. CdS is the most popularly employed heterojunction partner to p-CdTe due to its similar chemical properties. In this work, to improvement of the surface properties of the CdS films, PET substrate is treated by high density $O_2$ plasma. CdS films are prepared by chemical bath deposition(CBD) method. In case of the PET substrate with plasma treatment for 2min, the crystalline orientation of CdS films exhibits a strong hexagonal(002). Grain size was increased from 300nm without $O_2$ plasma treatment to 380nm with an $O_2$ plasma treatment.

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