Characteristics of $Cl_2/O_2$ Inductively Coupled Plasma and Application to Silicon etch
($Cl_2/O_2$ 유도결합형 플라즈마 특성 및 실리콘 식각에의 응용)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1996.05a
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- pp.20-20
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- 1996