Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1996.05a
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- Pages.20-20
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- 1996
Characteristics of $Cl_2/O_2$ Inductively Coupled Plasma and Application to Silicon etch
$Cl_2/O_2$ 유도결합형 플라즈마 특성 및 실리콘 식각에의 응용
Abstract
Keywords