• Title/Summary/Keyword: Normal process

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STRONG CONVERGENCE OF AN IMPLICIT ITERATIVE PROCESS FOR AN INFINITE FAMILY OF STRICT PSEUDOCONTRACTIONS

  • Cho, Yeol-Je;Kang, Shin-Min;Qin, Xiaolong
    • Bulletin of the Korean Mathematical Society
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    • v.47 no.6
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    • pp.1259-1268
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    • 2010
  • In this paper, we consider an implicit iterative process with errors for an in nite family of strict pseudocontractions. Strong convergence theorems are established in the framework of Banach spaces. The results presented in this paper improve and extend the recent ones announced by many others.

SOME LIMITING RESULTS OF REFLECTED ORNSTEIN-UHLENBECK PROCESSES WITH TWO-SIDED BARRIERS

  • Zhu, Chenglian
    • Bulletin of the Korean Mathematical Society
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    • v.54 no.2
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    • pp.573-581
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    • 2017
  • Reflected Ornstein-Uhlenbeck process is a process that returns continuously and immediately to the interior of the state space when it attains a certain boundary. In this work, we are concerned with the study of asymptotic behaviours of parametric estimation for ergodic reflected Ornstein-Uhlenbeck processes with two-sided barriers. Moreover, we also focus on the relations between regulators and the local time process.

Characteristic of Transistor Using Ti-SALICIDE Process and Its Application to Oscillator I,C(I) (티타늄 살리사이드 공정을 이용한 트랜지스터의 특성 및 오실레이터 I.C에의 적용(I))

  • 이상흥;구경완;홍봉식
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.11
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    • pp.910-914
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    • 1991
  • This paper describes the improvement of frequency characteristic of crystal oscillator I.C using Ti-Salicide. The characteristics of transistor(drive current) using Ti-Salicide process are better than Poly-Si process, because the mobility. To know frequency characteristic of oscillator I.C, the simulation is performed using inverter buffer chain of Fan-out 10 TTL. Its result shows at once the generation of normal clock pulse in input signal and the improvement of rising and falling time.

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A Comparative Study on the Evaluation of Process Capability for Non-Normal Distributions (비정규분포에 대한 공정능력 평가에 관한 비교 연구)

  • 이상용;채규용
    • Journal of Korea Society of Industrial Information Systems
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    • v.5 no.3
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    • pp.77-86
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    • 2000
  • The main objectives of this dissertation is to propose a forth generation index C for the case where the target value T is not equal to the midpoint of the specification limits (i.e. asymmetric tolerances), and show that this index is more sensitive compared to the standard PCI's in detacting small shifts of the process mean from the target value. In conclusion, in this dissertation , a new methods for estimating a measure of process capability for non-normally distributed variable data is proposed using the percentage nonconforming.

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PRECISE LARGE DEVIATIONS FOR AGGREGATE LOSS PROCESS IN A MULTI-RISK MODEL

  • Tang, Fengqin;Bai, Jianming
    • Journal of the Korean Mathematical Society
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    • v.52 no.3
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    • pp.447-467
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    • 2015
  • In this paper, we consider a multi-risk model based on the policy entrance process with n independent policies. For each policy, the entrance process of the customer is a non-homogeneous Poisson process, and the claim process is a renewal process. The loss process of the single-risk model is a random sum of stochastic processes, and the actual individual claim sizes are described as extended upper negatively dependent (EUND) structure with heavy tails. We derive precise large deviations for the loss process of the multi-risk model after giving the precise large deviations of the single-risk model. Our results extend and improve the existing results in significant ways.

Malfunction detection in plasma etching process using EPD signal trace (EPD 신호검출에 의한 플라즈마식각공정의 이상검출)

  • 이종민;차상엽;최순혁;우광방
    • 제어로봇시스템학회:학술대회논문집
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    • 1996.10b
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    • pp.1360-1363
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    • 1996
  • EPD(End Point Detection) is used to decide etching degree of layer which must be removed at wafer etching process in plasma etching process which is one of the most important process in semiconductor manufacturing. In this thesis, the method which detects malfunction of etching process in real-time will be discussed. Several EPD signal traces are collected in normal plasma etching condition and used as reference EPD signal traces. Critical points can be detected by applying differentiation and zero-crossing techniques to reference EPD signal. Mean and standard deviation of critical parameters which is memorized from reference EPD signal are calculated and these determine the lower and higher limit of control chart. And by applying statical control chart to EPD signals which are collected in real etching process malfunctions of process are detected in real-time. By means of applying this method to the real etching process we prove our method can accurately detect the malfunction of etching process and can compensate disadvantage of current industrial method.

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Better Statistical Test for Process Capability Index $C_p$ (공정능력지수 $C_p$에 대한 효율적인 가설검정)

  • Cho, Joong-Jae;Lim, Soo-Duck
    • Journal of Korean Society for Quality Management
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    • v.34 no.3
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    • pp.66-72
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    • 2006
  • The process capability indices are widely used to measure the capability of the process to manufacture items within the specified tolerance. Most evaluations on process capability indices focus on point estimates, which may result in unreliable assessments of process performance. The index $C_p$ has been widely used in various industries to assess process performance. In this paper, we propose new testing procedure on assessing $C_p$ index for practitioners to use in determining whether a given process is capable. The provided approach is easy to use and the decision making is more reliable. Whether a process is clearly normal or nonnormal, our bootstrap testing procedure could be applied effectively without the complexity of calculation. A numerical result based on the proposed approach is illustrated.

Design of Robust Expected Loss Control Chart (로버스트 기대손실 관리도의 설계)

  • Lee, Hyeung-Jun;Chung, Young-Bae
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.39 no.3
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    • pp.10-17
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    • 2016
  • Control Chart is a graph which dots the characteristic values of a process. It is the tool of statistical technique to keep a process in controlled condition. It is also used for investigating the state of a process. Therefore many companies have used Control Chart as the tool of statistical process control (SPC). Products from a production process represent accidental dispersion values around a certain reference value. Fluctuations cause of quality dispersion is classified as a chance cause and a assignable cause. Chance cause refers unmanageable practical cause such as operator proficiency differences, differences in work environment, etc. Assignable cause refers manageable cause which is possible to take actions to remove such as operator inattention, error of production equipment, etc. Traditionally ${\bar{x}}-R$ control chart or ${\bar{x}}-s$ control chart is used to find and remove the error cause. Traditional control chart is to determine whether the measured data are in control or not, and lets us to take action. On the other hand, RNELCC (Reflected Normal Expected Loss Control Chart) is a control chart which, even in controlled state, indicates the information of economic loss if a product is in inconsistent state with process target value. However, contaminated process can cause control line sensitive and cause problems with the detection capabilities of chart. Many studies on robust estimation using trimmed parameters have been conducted. We suggest robust RNELCC which used the idea of trimmed parameters with RNEL control chart. And we demonstrate effectiveness of new control chart by comparing with ARL value among traditional control chart, RNELCC and robust RNELCC.

ON CONVERGENCE THEOREMS FOR THE MCSHANE INTEGRAL ON TIME SCALES

  • You, Xuexiao;Zhao, Dafang
    • Journal of the Chungcheong Mathematical Society
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    • v.25 no.3
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    • pp.393-400
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    • 2012
  • In this paper, we study the process of McShane delta integrals on time scales and discuss the relation between McShane delta integral and Henstock delta integral. We also prove the mono- tone convergence theorem, Fatou's Lemma and the dominated con- vergence theorems for the McShane delta integral.

Computer Program Development for Probability Distribution

  • Choi, Hyun-Seok;Song, Gyu-Moon
    • Journal of the Korean Data and Information Science Society
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    • v.16 no.3
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    • pp.581-589
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    • 2005
  • The purpose of this thesis is to develop and introduce Add-in program which we can systematically, visually and dynamically study discrete probability distribution of binomial distribution, poisson distribution and hypergeometric distribution, and continuous probability distribution of normal distribution, exponential distribution, and the definition and characteristics of t distribution, F distribution and ${\chi}^2$ distribution to be driven from normal distribution, and graphs, the computation process of probability by using VBA which is the device of Excel.

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