• Title/Summary/Keyword: Non-Volatile memory

검색결과 272건 처리시간 0.034초

Effect of Nitrogen, Titanium, and Yttrium Doping on High-K Materials as Charge Storage Layer

  • Cui, Ziyang;Xin, Dongxu;Park, Jinsu;Kim, Jaemin;Agrawal, Khushabu;Cho, Eun-Chel;Yi, Junsin
    • 한국전기전자재료학회논문지
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    • 제33권6호
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    • pp.445-449
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    • 2020
  • Non-volatile memory is approaching its fundamental limits with the Si3N4 storage layer, necessitating the use of alternative materials to achieve a higher programming/erasing speed, larger storage window, and better data retention at lower operating voltage. This limitation has restricted the development of the charge-trap memory, but can be addressed by using high-k dielectrics. The paper reviews the doping of nitrogen, titanium, and yttrium on high-k dielectrics as a storage layer by comparing MONOS devices with different storage layers. The results show that nitrogen doping increases the storage window of the Gd2O3 storage layer and improves its charge retention. Titanium doping can increase the charge capture rate of HfO2 storage layer. Yttrium doping increases the storage window of the BaTiO3 storage layer and improves its fatigue characteristics. Parameters such as the dielectric constant, leakage current, and speed of the memory device can be controlled by maintaining a suitable amount of external impurities in the device.

Improved Uniformity in Resistive Switching Characteristics of GeSe Thin Film by Ag Nanocrystals

  • Park, Ye-Na;Shin, Tae-Jun;Lee, Hyun-Jin;Lee, Ji-Soo;Jeong, Yong-Ki;Ahn, So-Hyun;Lee, On-You;Kim, Jang-Han;Nam, Ki-Hyun;Chung, Hong-Bay
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.237.2-237.2
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    • 2013
  • ReRAM cell, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of conductive filament in a solid electrolyte [1,2]. Especially, Chalcogenide-based ReRAM have become a promising candidate due to the simple structure, high density and low power operation than other types of ReRAM but the uniformity of switching parameter is undesirable. It is because diffusion of ions from anode to cathode in solid electrolyte layer is random [3]. That is to say, the formation of conductive filament is not go through the same paths in each switching cycle which is one of the major obstacles for performance improvement of ReRAM devices. Therefore, to control of nonuniform conductive filament formation is a key point to achieve a high performance ReRAM. In this paper, we demonstrated the enhanced repeatable bipolar resistive switching memory characteristics by spreading the Ag nanocrystals (Ag NCs) on amorphous GeSe layer compared to the conventional Ag/GeSe/Pt structure without Ag NCs. The Ag NCs and Ag top electrode act as a metal supply source of our devices. Excellent resistive switching memory characteristics were obtained and improvement of voltage distribution was achieved from the Al/Ag NCs/GeSe/Pt structure. At the same time, a stable DC endurance (>100 cycles) and an excellent data retention (>104 sec) properties was found from the Al/Ag NCs/GeSe/ Pt structured ReRAMs.

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하이브리드 하드디스크를 위한 효율적인 데이터 블록 교체 및 재배치 기법 (An Efficient Data Block Replacement and Rearrangement Technique for Hybrid Hard Disk Drive)

  • 박광희;이근형;김덕환
    • 한국정보과학회논문지:컴퓨팅의 실제 및 레터
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    • 제16권1호
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    • pp.1-10
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    • 2010
  • 최근 낸드 플래시 메모리가 하드디스크 수준으로 읽기 성능이 향상되고, 전력소비가 훨씬 적음에 따라, 플래시메모리와 하드디스크를 같이 사용하는 하이브리드 하드디스크와 같은 이기종 저장장치들이 출시되고 있다. 하지만 낸드 플래시 메모리의 쓰기 및 삭제 속도가 기존 자기디스크의 쓰기 성능에 비해 매우 느릴 뿐 아니라, 사용자 층에서 쓰기 요청이 집중될 경우 CPU, 메인 메모리에 심각한 오버헤드를 발생시킨다. 본 논문에서는 비휘발성 캐시의 역할을 하는 낸드 플래시 메모리의 성능을 향상시키기 위해 읽기의 참조 빈도는 낮고, 쓰기의 갱신 빈도가 높은 데이터 블록들을 교체하는 LFU(Least Frequently Used)-Hot 기법을 제시하고, 교체 될 데이터 블록들을 재배치하여 자기디스크로 플러싱하는 기법을 제시한다. 실험 결과, 본 논문에서 제안하는 LFU-Hot 블록 교체 기법과 멀티존 기반의 데이터 블록 재배치기법 실행시간이 기존 LRU, LFU 블록 교체 기법들보다 입출력 성능 면에서 최대 38% 빠르고, 비휘발성 캐시의 수명을 약 40% 이상 향상 시킴을 증명하였다.

Resistive Memory Switching in Ge5Se5 Thin Films

  • Kim, Jang-Han;Hwang, Yeong-Hyeon;Chung, Hong-Bay
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.326-326
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    • 2014
  • It has been known since the mid 1960s that Ag can be photodissolved in chalcogenide glasses to form materials with interesting technological properties. In the 40 years since, this effect has been used in diverse applications such as the fabrication of relief images in optical elements, micro photolithographic schemes, and for direct imaging by photoinduced Ag surface deposition. ReRAM, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of a conductive filament in a solid electrolyte. Especially, Ag-doped chalcogenide glasses and thin films have become attractive materials for fundamental research of their structure, properties, and preparation. Ag-doped chalcogenide glasses have been used in the formation of solid electrolyte which is the active medium in ReRAM devices. In this paper, we investigated the nature of thin films formed by the photo-dissolution of Ag into Ge-Se glasses for use in ReRAM devices. These devices rely on ion transport in the film so produced to create electrically programmable resistance states [1-3]. We have demonstrated functionalities of Ag doped chalcogenide glasses based on their capabilities as solid electrolytes. Formation of such amorphous systems by the introduction of Ag+ ions photo-induced diffusion in thin chalcogenide films is considered. The influence of Ag+ ions is regarded in terms of diffusion kinetics and Ag saturation is related to the composition of the hosting material. Saturated Ag+ ions have been used in the formation of conductive filaments at the solid electrolyte which is the active medium in ReRAM devices. Following fabrication, the cell displays a metal-insulator-metal structure. We measured the I-V characteristics of a cell, similar results were obtained with different via sizes, due to the filamentary nature of resistance switching in ReRAM cell. As the voltage is swept from 0 V to a positive top electrode voltage, the device switches from a high resistive to a low resistive, or set. The low conducting, or reset, state can be restored by means of a negative voltage sweep where the switch-off of the device usually occurs.

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A Light Incident Angle Stimulated Memristor Based on Electrochemical Process on the Surface of Metal Oxide

  • 박진주;용기중
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.174-174
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    • 2014
  • Memristor devices are one of the most promising candidate approaches to next-generation memory technologies. Memristive switching phenomena usually rely on repeated electrical resistive switching between non-volatile resistance states in an active material under the application of an electrical stimulus, such as a voltage or current. Recent reports have explored the use of variety of external operating parameters, such as the modulation of an applied magnetic field, temperature, or illumination conditions to activate changes in the memristive switching behaviors. Among these possible choices of signal controlling factors of memristor, photon is particularly attractive because photonic signals are not only easier to reach directly over long distances than electrical signal, but they also efficiently manage the interactions between logic devices without any signal interference. Furthermore, due to the inherent wave characteristics of photons, the facile manipulation of the light ray enables incident light angle controlled memristive switching. So that, in the tautological sense, device orienting position with regard to a photon source determines the occurrence of memristive switching as well. To demonstrate this position controlled memory device functionality, we have fabricated a metal-semiconductor-metal memristive switching nanodevice using ZnO nanorods. Superhydrophobicity employed in this memristor gives rise to illumination direction selectivity as an extra controlling parameter which is important feature in emerging. When light irradiates from a point source in water to the surface treated device, refraction of light ray takes place at the water/air interface because of the optical density differences in two media (water/air). When incident light travels through a higher refractive index medium (water; n=1.33) to lower one (air; n=1), a total reflection occurs for incidence angles over the critical value. Thus, when we watch the submerged NW arrays at the view angles over the critical angle, a mirror-like surface is observed due to the presence of air pocket layer. From this processes, the reversible switching characteristics were verified by modulating the light incident angle between the resistor and memristor.

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BCD 공정 기반 저면적 MTP 설계 (Design of Small-Area MTP Memory Based on a BCD Process)

  • 권순우;리룡화;김도훈;하판봉;김영희
    • 전기전자학회논문지
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    • 제28권1호
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    • pp.78-89
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    • 2024
  • 차량용 반도체에서 사용되는 BCD 공정 기반의 PMIC 칩은 아날로그 회로를 트리밍하기 위해 추가 마스크가 필요없는 MTP(Multi-Time Programmable) IP(Intellectual Property)를 요구한다. 본 논문에서는 저면적 MTP IP 설계를 위해 2개의 트랜지스터와 1개의 MOS 커패시터를 갖는 single poly EEPROM 셀인 MTP 셀에서 NCAP(NMOS Capacitor) 대신 PCAP(PMOS Capacitor)을 사용한 MTP 셀을 사용하여 MTP 셀 사이즈를 18.4% 정도 줄였다. 그리고 MTP IP 회로 설계 관점에서 MTP IP 설계의 CG 구동회로와 TG 구동회로에 2-stage voltage shifter 회로를 적용하였고, DC-DC 변환기 회로의 면적을 줄이기 위해 전하 펌핑 방식을 사용하는 VPP(=7.75V), VNN(=-7.75V)와 VNNL(=-2.5V) 전하 펌프 회로에서 각각의 전하 펌프마다 별도로 두고 있는 ring oscillator 회로를 하나만 둔 회로를 제안하였으며, VPPL(=2.5V)은 전하펌프 대신 voltage regulator 회로를 사용하는 방식을 제안하였다. 180nm BCD 공정 기반으로 설계된 4Kb MTP IP 사이즈는 0.493mm2이다.

졸겔법에 의한 티탄산납 제조 및 유기산 흡착특성 (Preparation of Lead Titanate by Sol-Gel Method and Characteristic of Organic Acid Adsorption)

  • 김주호;송지훈;신보철;한상오;송근호;이광래
    • 산업기술연구
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    • 제21권B호
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    • pp.133-139
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    • 2001
  • Generally $PbTiO_3$ is manufactured in a form of thin films which is useful for the application of infrared sensors and non-volatile memory devices. Moreover $PbTiO_3$ has a characteristic of adsorption for organic acid as well as electronic property. Organic acid adsorption properties of $PbTiO_3$ powder prepared by sol-gel method was compared with the powder purchased from Aldrich Co. Crystallization and particle size of $PbTiO_3$ are influenced by process variables, such as dilution of sol solution, catalysis, calcination temperature, calcination time, etc. As the size of $PbTiO_3$ power decreased until several nanometers, adsorption of acetic acid and formic acid was increased 1.5-fold and 1.2-fold respectively.

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전자식 전력량계와 무선모듈을 이용한 전력품질 표시 및 모니터링 (Power Quality Monitoring with Electronic Watt-hour meter and Wireless communication module)

  • 정득일;손영대
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 추계학술대회 논문집 전기기기 및 에너지변환시스템부문
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    • pp.172-174
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    • 2007
  • An electronic watt-hour meter with high-precision measurement technology can provide many valuable metering data of a real-time system measurements, such as per-phase voltage, ampere, active power, reactive power, apparent power, power factor, and system frequency. Also many of accumulated metering data such as active energy, reactive energy, apparent energy, and load profile can be gettable from an electronic watt-hour meter[1]. This paper presents an approach of the small-sized AMR (Automatic Meter Reading) that provides customers with a very valuable electrical service. This AMR service transmits lots of a valuable metering data by using ZigBee communication module, so that users resided in their premises can use the information to audit a power quality and improve their electrical conditions by using the PQ monitoring device equipped with ZigBee receiver. This PQ monitoring device shows metering data on LCD and transmits to the PC through an internal network. Also, the device can keep the valuable meter data into a built-in non-volatile memory. The final goal of this paper is to better understand the power quality of electrical systems and offer the power qualify information for the convenience of all power consumers.

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안티퓨즈 MOS capacitor를 이용한 OTP 소자의 프로그래밍 후의 저항특성 (The resistance characterization of OTP device using anti-fuse MOS capacitor after programming)

  • 장성근;김윤장
    • 한국산학기술학회논문지
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    • 제13권6호
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    • pp.2697-2701
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    • 2012
  • 안티퓨즈 MOS 커패시터를 기반으로 제작된 OTP 소자의 수율은 프로그램 과정에서 입력 저항(Rin)값과 통과 트랜지스터(Pass Tr)의 크기, 데이터 읽기 과정에서 읽기 트랜지스터(Read Tr)와 읽기 전압에 영향을 받는다. 따라서 수율에 영향을 주는 요소를 분석하기 위해 여러 가지 실험 조건을 달리하여 각각의 조건에 대해 블로잉 후 실효소자의 저항 특성에 대한 풀 맵(full map) 데이터를 얻어 OTP 소자가 어떻게 동작하는지를 분석하여 수율 개선에 필요한 최적 조건을 연구하였다. 최적 조건은 입력저항이 $50{\Omega}$, 통과 트랜지스터의 W값이 $10{\mu}m$, 읽기 전압이 2.8 V 일 때이다.

NVMe 드라이버 구현 방식에 따른 I/O 응답시간 분석 (Analysis of I/O Response Time Throughout NVMe Driver Implementation Architectures)

  • 강인구;주용수;임성수
    • 대한임베디드공학회논문지
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    • 제12권3호
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    • pp.139-147
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    • 2017
  • In recent years, non-volatile memory express (NVMe), a new host controller interface standard, has been adapted to overcome performance bottlenecks caused by the acceleration of solid state drives (SSD). Recently, performance breakthrough cases over AHCI based SATA SSDs by adapting NVMe based PCI Express (PCIe) SSD to servers and PCs have been reported. Furthermore, replacing legacy eMMC-flash storage with NVMe based storage is also considered for next generation of mobile devices such as smartphones. The Linux kernel includes drivers for NVMe support, and as the kernel version increases, the implementation of the NVMe driver code has changed. However, mobile devices are often equipped with older versions of Android operating systems (OSes), where the newest features of NVMe drivers are not available. Therefore, different features of different NVMe driver implementations are not well evaluated on Android OSes. In this paper, we analyze the response time of the NVMe driver for various Linux kernel version.