• 제목/요약/키워드: National measurements standards

검색결과 169건 처리시간 0.027초

Robustness of Display Hemispherical Reflectance Measurement Apparatus

  • Penczek, John;Kelley, Edward F.;Kim, Seung-Kwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1355-1357
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    • 2008
  • Reflection measurements are critical to the evaluation of display performance under ambient illumination conditions. Various hemispherical reflection methods are evaluated for their suitability and robustness across display technologies. The standard integrating sphere method is compared to a sampling sphere apparatus.

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Roughness Measurement Performance Obtained with Optical Interferometry and Stylus Method

  • Rhee Hyug-Gyo;Lee Yun-Woo;Lee In-Won;Vorburger Theodore V.
    • Journal of the Optical Society of Korea
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    • 제10권1호
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    • pp.48-54
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    • 2006
  • White-light scanning interferometry (WLI) and phase shifting interferometry (PSI) are increasingly used for surface topography measurements, particularly for areal measurements. In this paper, we compare surface profiling results obtained from above two optical methods with those obtained from stylus instruments. For moderately rough surfaces ($Ra{\approx}500\;nm$), roughness measurements obtained with WLI and the stylus method seem to provide close agreement on the same roughness samples. For surface roughness measurements in the 50 nm to 300 nm range of Ra, discrepancies between WLI and the stylus method are observed. In some cases the discrepancy is as large as 109% of the value obtained with the stylus method. By contrast, the PSI results are in good agreement with those of the stylus technique.

내륙 differential ASF 측정을 통한 Loran-C 시각 정확도 향상 (Improvement of Loran-C Timing Accuracy by Inland Differential ASF Measurements)

  • 이창복;황상욱;이종구;이영규;이상정;양성훈
    • 한국항해항만학회지
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    • 제40권1호
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    • pp.15-20
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    • 2016
  • 본 연구에서는 내륙에서 수신한 로란 9930M 포항 송신국의 로란신호를 이용하여 Loran differential ASF를 측정하였고, 이를 통해 로란 신호의 시각동기 정확도를 향상시켰다. Differential ASF는 한국표준과학연구원(KRISS)의 UTC(KRIS) 기준 TOA 데이터에서 충남대학교와 국립해양측위정보원에 설치된 원자시계를 기준으로 동시에 측정된 TOA 데이터를 각각 차분함으로써 구하였다. 자기장 안테나를 이용한 충남대학교에서의 60분 평균 TOA 측정결과는 $0.1{\mu}s$ 이내의 변동성을 보였고 국립해양측위정보원에서의 TOA 측정결과는 $0.05{\mu}s$ 이내의 변동성을 보였다. 또한 충남대학교와 국립해양측위정보원에서의 60분 평균 differential ASF 측정결과는 수신국의 주변 환경 영향에 의해 최대 $0.1{\mu}s$ 정도까지 시각 변동성을 나타냈다. 따라서 UTC(KRIS)를 기준으로 측정한 TOA 데이터로 충남대학교와 국립해양측위정보원 측정 데이터를 각각 보상하면 differential ASF 변화가 상쇄되어 로란 신호를 이용한 시각동기 정확도를 10 ns 정도 이내로 향상시킬 수 있다. 그리고 세슘원자시계를 기준으로 포항 송신국 로란 신호의 기준위상과 KRISS에서의 로란 수신기의 출력 기준위상을 측정하여 두 지점 사이의 ASF는 약 $3.5{\mu}s$로 나타났다.

Pitch Measurement of 150 nm 1D-grating Standards Using an Nano-metrological Atomic Force Microscope

  • Jonghan Jin;Ichiko Misumi;Satoshi Gonda;Tomizo Kurosawa
    • International Journal of Precision Engineering and Manufacturing
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    • 제5권3호
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    • pp.19-25
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    • 2004
  • Pitch measurements of 150 nm one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the 'nano-metrological AFM'. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$ stabilized He-Ne laser at a wavelength of 633 nm. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 nm. The average pitch value was 146.65 nm and the combined standard uncertainty was less than 0.262 nm. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

Results of the key comparison in absolute pressure from 1 Pa to 1000 Pa

  • Hong, Seung-Soo;Shin, Yong-Hyeon;Chung, Kwang-Hwa;A. P. Miiller
    • Journal of Korean Vacuum Science & Technology
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    • 제6권3호
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    • pp.109-115
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    • 2002
  • This paper describes a CCM key comparison of low absolute-pressure standards at seven National Measurement Institutes that was carried out during the period March 1998 to September 1999 in order to determine their degrees of equivalence at pressures in the range 1 Pa to 1000 Pa. The Korea Research Institutes of Standards and Science(KRISS) participated from 10 Pa to 1000 Pa pressure range in 1999. The primary standards, which represent two principal measurement methods, included five liquid-column manometers and four static expansion systems. The transfer standard package consisted of four high-precision pressure transducers, two capacitance diaphragm gauges to provide high resolution at low pressures, and two resonant silicon gauges to provide the required calibration stability.

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포항 로란-C (9930M) 신호를 이용한 ASF 해상측정 (ASF Measurements on Maritime by the Signal of the Pohang Loran-C (9930M))

  • 이창복;이종구;김영재;황상욱;이상정;양성훈
    • 한국항해항만학회지
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    • 제35권8호
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    • pp.619-624
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    • 2011
  • Loran(LOang RAnge Navigation) 신호를 이용한 측위 시에 정확도에 가장 큰 영향을 미치는 오차요소는 TOA(Time of Arrival) 측정에서의 ASF(Additional Secondary Factor)이다. 따라서 공항접근이나 항만 접안 등의 측위 정확도를 만족시키려면 먼저 정확한 ASF측정이 선행되어야 하는데, 본 연구에서는 해상에서 ASF를 측정하는 기법을 연구하였다. 그 측정방법으로 포항 Loran-C 주국(9930M)에서 송신하는 로란 신호와 로란 수신기의 기준신호를 세슘원자시계를 기준으로 측정함으로써 해상에서의 ASF를 측정하였고 영일만 해상의 12 곳의 측정지점을 3 km 간격으로 설정하여 측정하였다. 해상측정에서 정확도를 높이기 위해서 전기장 안테나와 자기장 안테나를 동시에 사용하였으며 정확한 위치측정을 위해서 DGPS(Differential GPS)수신기를 이용하였다. 이런 방법을 이용하여 해상에서 ASF를 측정함으로써 ASF 예측값과 비교한 결과를 얻었다.

An international Comparison Measurement of Silicon Wafer Sheet Resistance using the Four-point Probe Method

  • Kang, Jeon-Hong;Ying, Gao;Cheng, Yuh-Chuan;Kim, Chang-Soo;Lee, Sang-Hwa;Yu, Kwang-Min
    • Journal of Electrical Engineering and Technology
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    • 제10권1호
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    • pp.325-330
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    • 2015
  • With approval from the Asia Pacific Metrology Program Working Group on Materials Metrology (APMP WGMM), an international comparison for sheet resistance standards for silicon wafers was firstly conducted among Korea Research Institute of Standards and Science (KRISS) in Korea, CMS/ITRI in Taiwan, and NIM in China, which are national metrology institutes (NMIs), from August 2011 to January 2012. The sheet resistance values of the standards are $10{\Omega}$, $100{\Omega}$, and $1000{\Omega}$; the measurement was conducted in sequence at KRISS, CMS/ITRI, NIM, and KRISS again using the four-point probe method with single and dual configuration techniques. The reference value for the measurement results of the three NMIs was obtained through averaging the values of the three results for each sheet resistance range. The differences between the reference value and the measured values is within 0.22% for $10{\Omega}$, 0.17% for $100{\Omega}$, and 0.12% for $1000{\Omega}$. Therefore, the international consistency for conducting sheet resistance measurements is confirmed within 0.22% through the APMP WGMM approved comparison.