• Journal of electromagnetic engineering and science
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• 제11권3호
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• pp.227-233
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• 2011

This paper describes the development of a broadband quasi-Yagi antenna using a folded dipole driver. The antenna is designed on a low-permittivity substrate to reduce the surface wave effect, and hence the gain can be enhanced easily by adding directors. The folded dipole driver is connected to a 50-${\Omega}$ microstripline via a simple broadband microstrip-to-coplanar stripline transition with a quarter radial stub. The key motivation for the use of a folded dipole is to increase the input impedance at the driver, allowing a smaller mismatch loss between the antenna driver and the coplanar stripline feed. The proposed antenna has a measured bandwidth of 4.67~6.26 GHz for the -10 dB reflection coefficient, and a flat gain of 4.86~5.15 dB within the bandwidth.

• 한국해양공학회지
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• 제16권2호
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• pp.60-66
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• 2002

The remote measurement system(RMS) as a new experimental method is limited in its application to crack measurement at elevated temperatures because of the oxide layer on the specimen surface. Since TiAIN and Cr coating layers have a high resistance to oxidation and wear, this paper proposed a TiAIN and Cr coating technique for specimens to facilitate the measurement of crack growth behavior using RMS. To investigate the effects of the coating layer, tension and fatigue tests were carried out at room temperature and at $538^{\circ}C$. The test material was 1Cr-1Mo-0.25V steel which is widely used as a turbine rotor material. From the experimental results, it was found that the mechanical properties of the TiAIN and Cr coated specimens were similar to those of the substrate. Accordingly, the TiAIN and Cr coated layer had hardly any influence on the fatigue crack propagation.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.378-381
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• 2009

As a Joule-heat source, a conductive Mo layer was used to crystallize amorphous silicon for AMOLED backplanes. This Joule-heating induced crystallization (JIC) process could produce poly-Si having a grain size ranging from tens of nanometers to greater than several micrometers. Here, the blanket (single-shot whole-plane) crystallization could be achieved on the $2^{nd}$ and the $4^{th}$ generation glass substrate.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.366-369
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• 1999

Synthetic diamond films have been deposited on the silicon(100) surface and molybdenum substrates using an microwave plasma enhanced vapor deposition (MWPECVD) method. The effect of deposition time, surface morphology, X-ray diffraction pattrm, infrared transmittance and Raman Scattering have been studied, The diamond film deposited on Mo substrate for (100) hours at 40 torr H$_2$-CH$_4$O$_2$ gas system have been shown 1${\mu}{\textrm}{m}$/h of growth rate and good crystallization

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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• pp.69-70
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• 2006

The ITO thin films were prepared by Facing Targets Sputtering(FTS) method on polyethersulfon(PES) substrate. The ITO thin films were deposited with the film thickness of 100nm at room temperature and working gas pressure of 1 mTorr. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were evaluated by Hall Effect Measurement(EGK) and UV-VIS spectrometer(HP), respectively. From the results, the ITO thin films was deposited was with a resistivity $8.3{\times}10^{-4}[{\Omega}-cm]$ and transmittance over 80% in the visible range.

• 반도체디스플레이기술학회지
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• 제13권1호
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• pp.91-95
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• 2014

(F,Ga) co-doped ZnO thin film on glass substrate was fabricated via a simple non-alkoxide sol-gel spin-coating. Contrary to the F single doped ZnO thin film, the (F,Ga) co-doped thin film showed a significant reduce in electrical resistivity after a second post-heat-treatment in reducing environment. The resulting decrease in electrical resistivity with Ga co-doping is considered to be resulted from the increases both carrier density and mobility. The optical transmittance of the (F,Ga) co-doped thin film in the visible range showed higher transmittance with Ga co-doping compared with F single doped ZnO thin film.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2004년도 춘계학술대회 발표 논문집
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• pp.129-131
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• 2004

극자외선 리소그래피(EUV lithography) 기술은 50nm 이하의 선폭을 가지는 차세대 소자 제작에 있어서 선도적인 기술 중 하나이다. EUVL 에서 필수적인 요소중의 하나가 mirror 로 사용되는 blank mask 이다. Blank mask 에 있어서 가장 중요한 요소는 반사도이다. 이 blank mask 는 Si substrate 위에 반사를 위한 Mo/Si pair 가 40pair 이상 적층되어있다. Blank mask 는 매우 청결해야한다. 만약 결함이 있다면 blank mask 에는 치명적이다 결함은 blank mask 에 있어서 반사도를 떨어뜨리는 주 요소이기 때문이다. 그 결함에는 amplitude defect 과 phase defect 이 있다. FIB 에서는 amplitude defect 을 수정하는 것이 가능하다. 우리는 FIB 를 이용하여 mage mode, spot mode, bar rotation mode 를 사용하여 amplitude defect을 수정하였다. 그리고, 그 결과 효과적으로 amplitude defect을 수정하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1577-1579
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• 2003

AlN thin films are prepared on Si (111) substrate by RF magnetron sputtering. Two-step deposition method is proposed to obtain AlN thin films with high c-axis (002)-TC value and low surface roughnesses. For all the deposited AlN films, the c-axis (002)-orientation, surface mophology, and roughness are characterized in terms of deposition conditions FEAR devices with Al/AlN/Mo/Si(111) configuration are also fabricated. From the frequency response characteristics, the return loss and electromechanical coupling contant($k_t{^2}$) are estimated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.385-386
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• 2007

We prepared the Al doped ZnO coating Ag multilayer thin films on glass without substrate heating using FTS system. The structure of multilayer thin films has Al doped ZnO/Ag/Al doped ZnO(AZO/Ag/AZO). The thickness of top and bottom AZO thin films were fixed to 50 nm, respectively and controlled the thickness of Ag thin films with deposition time. As-doped multilayer thin films were prepared at 1mTorr and input power (DC) of 100W at room temperature. To investigate the film properties, we employed four-point probe, UVNIS spectrometer, X-ray diffractometer (XRD), scanning electron microscopy (SEM), Hall Effect measurement system and Atomic Force Microscope (AFM).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.438-439
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• 2007

In this study, we prepared ITO thin film on the polycarbonate(PC) substrate by using Facing Targets sputtering (FTS) system. After the external bending force was applied to as-deposited ITO thin films with fixed face-plate distance (L), we investigated how properties of those change. As a result, the crack density of films was increasing as bending frequency increased. In accordance with crack distribution, we observed that the resistivity value of ITO thin film increased.