Investigation of the Shallow Trench Etch Process for the Device Isolation of Deep sub-micron CMOS (Deep sub-micron CMOS의 소자고립을 위한 Shallow Trench 식각공정에 관한 연구)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1996.05a
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- pp.64-64
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- 1996