Dry Etch Characteristic of Ferroelectric $YMnO_3$ Thin Films Using High Density $Ar/Cl_{2}CF_{4}\;PAr/Cl_{2}/CF_{4}$ 고밀도lasma
($Ar/Cl_{2}/CF_{4}$ 고밀도 플라즈마를 이용한 강유전체 $YMnO_3$ 의 건식식각 특성연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2001.11b
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- pp.213-216
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- 2001