Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.11b
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- Pages.213-216
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- 2001
Dry Etch Characteristic of Ferroelectric $YMnO_3$ Thin Films Using High Density $Ar/Cl_{2}CF_{4}\;PAr/Cl_{2}/CF_{4}$ 고밀도lasma
$Ar/Cl_{2}/CF_{4}$ 고밀도 플라즈마를 이용한 강유전체 $YMnO_3$ 의 건식식각 특성연구
- Published : 2001.11.08
Abstract
Etching behaviors of ferroelectric